Method of manufacturing ferroelectric memory device
A method of manufacturing a ferroelectric memory device includes: forming an active element on a substrate; forming an interlayer insulating layer on the substrate; forming an opening on the interlayer insulating layer and forming a contact plug inside the opening; forming a foundation layer above the substrate; and laminating, on the foundation layer, a first electrode, a ferroelectric layer, and a second electrode. In this method, the forming of the foundation layer includes: forming a first titanium layer having a thickness less than a depth of a recess; nitriding the first titanium layer into a first titanium nitride layer; forming a second titanium layer on the first titanium nitride layer so as to at least partially fill the recess remaining on the contact plug; nitriding the second titanium layer into a second titanium nitride layer, and polishing a surface of the second titanium nitride layer.
1. A method of manufacturing a ferroelectric memory device, comprising:
forming an insulating layer having an opening above a substrate;
forming a plug in the opening, an upper surface of the plug being lower than an upper surface of the insulating layer;
forming a first layer including titanium on the insulating layer and the plug, the first layer having a recess;
forming a second layer including titanium on the first layer;
polishing the second layer,
forming a first electrode layer above the second layer;
forming a ferroelectric layer on the first electrode layer; and
forming a second electrode layer on the ferroelectric layer, wherein the forming of the first layer includes:
forming a first titanium layer with surface orientation on the plug and the insulating layer; and
converting the first titanium layer into a first nitride titanium layer with surface orientation (111) by nitriding the first titanium layer.
2. The method according to claim 1 , further comprising:
performing an ammonium plasma process to the insulating layer before the forming of the first layer.
3. The method according to claim 2 , wherein the performing of the ammonium plasma process includes:
exciting ammonium gas plasma; and
radiating the ammonium gas plasma onto the insulating layer.
4. The method according to claim 1 , wherein
the first layer is formed with a first thickness, and the first thickness is less than a distance from the upper surface of the plug to the upper surface of the insulating layer.
5. The method according to claim 1 , wherein
the second layer is formed so that the recess is filled with the second layer.
6. The method according to claim 1 , further comprising:
forming a barrier layer above the part of the first layer and the second layer after the polishing of the second layer.
7. The method according to claim 6 , further comprising:
forming a ferroelectric capacitor by etching the second electrode layer, the ferroelectric layer, the first electrode, the barrier layer, and the first layer.
8. The method according to claim 6 , wherein the barrier layer includes TiAIN.
9. The method according to claim 1 , further comprising:
forming a ferroelectric capacitor by etching the second electrode layer, the ferroelectric layer, the first electrode layer and the first layer.
10. The method according to claim 1 , wherein the substrate includes a transistor having a source and a drain.
11. The method according to claim 10 , wherein the plug is electrically connected to the source or the drain.
12. The method according to claim 1 , wherein the second layer includes a third nitride titanium layer, and the third nitride titanium layer is formed by a reactive sputtering method.
13. A method of manufacturing a ferroelectric memory device, comprising:
forming an insulating layer having an opening above a substrate;
forming a plug in the opening, an upper surface of the plug being lower than an upper surface of the insulating layer;
forming a first layer including titanium on the insulating layer and the plug, the first layer having a recess;
forming a second layer including titanium on the first layer;
polishing the second layer;
forming a first electrode layer above the second layer;
forming a ferroelectric layer on the first electrode layer; and
forming a second electrode layer on the ferroelectric layer, wherein
the forming of the second layer includes:
forming a second titanium layer with surface orientation (001) on the first layer; and
converting the second titanium layer into a second nitride titanium layer with surface orientation (111) by nitriding the second titanium layer.
14. The method according to claim 13 , further comprising:
performing an ammonium plasma process to the insulating layer before the forming of the first layer.
15. The method according to claim 14 , wherein the performing of the ammonium plasma process includes:
exciting ammonium gas plasma; and
radiating the ammonium gas plasma onto the insulating layer.
16. The method according to claim 13 , wherein the first layer is formed with a first thickness, and the first thickness is less than a distance from the upper surface of the plug to the upper surface of the insulating layer.
17. The method according to claim 13 , wherein the second layer is formed so that the recess is filled with the second layer.
18. The method according to claim 13 , further comprising:
forming a barrier layer above the part of the first layer and the second layer after the polishing of the second layer.
19. The method according to claim 18 , further comprising:
forming a ferroelectric capacitor by etching the second electrode layer, the ferroelectric layer, the first electrode layer, the barrier layer, and the first layer.
20. The method according to claim 18 , wherein the barrier layer includes TiAIN.
21. The method according to claim 13 , further comprising:
forming a ferroelectric capacitor by etching the second electrode layer, the ferroelectric layer, the first electrode layer, and the first layer.
22. The method according to claim 13 , wherein the substrate includes a transistor having a source and a drain.
23. The method according to claim 22 , wherein the plug is electrically connected to the source or the drain.
24. The method according to claim 13 , wherein the second layer includes a third nitride titanium layer, and the third nitride titanium layer is formed by a reactive sputtering method.