Materials and methods for creating imaging layers
The present invention provides patterned features of dimensions of less than 50 nm on a substrate. According to various embodiments, the features may be “Manhattan” style structures, have high aspect ratios, and/or have atomically smooth surfaces. The patterned features are made from polymer brushes grafted to a substrate. In some embodiments, the dimensions of the features may be determined by adjusting the grafting density and/or the molecular weight of the brushes. Once the brushes are patterned, the features can be shaped and reshaped with thermal or solvent treatments to achieve the desired profiles. The chemical nature of the polymer brush is thus independent of the patterning process, which allows for optimization of the polymer brush used for specific applications. Applications include masks for pattern transfer techniques such as reactive ion etching.
1. A pattern on a substrate comprising a feature having an aspect ratio of at least 1:100, the feature comprising a plurality of polymer brushes attached to the substrate and having a height of at least 2.5 nm and wherein the width of the feature is no more than about 50 nm.
2. The pattern of claim 1 , wherein the aspect ratio is at least 1:10.
3. The pattern of claim 1 , wherein the aspect ratio is at least 1:1.
4. The pattern of claim 1 , wherein the aspect ratio is at least 2:1.
5. The pattern of claim 1 , wherein the height is at least 5 nm.
6. The pattern of claim 1 , wherein the height is at least 10 nm.
7. The pattern of claim 1 , wherein the width of the feature is no more than about 25 nm.
8. The pattern of claim 1 , wherein the width of the feature is no more than about 10 nm.
9. The pattern of claim 1 , wherein the feature has a size of about 50 nm and a grafting density of less than about 0.7 chains/nm 2 and the equivalent polystyrene molecular weight of the polymer brush is less than about 25,000 g/mole.
10. The pattern of claim 1 , wherein the feature has substantially vertical sidewalls.
11. The pattern of claim 1 , wherein the feature has a line edge roughness of no more than 10 nm.
12. The pattern of claim 1 , further comprising at least one additional feature having an aspect ratio of at least 1:2.
13. An array of patterned features on a substrate; wherein the features comprise polymer brushes and have a line edge roughness of no more than 10 nm an aspect ratio of at least 1:100, a height of at least 2.5 nm, and a width of no more than about 50 nm.
14. The array of patterned features of claim 13 , wherein the features have a line edge roughness of no more than 2 nm.
15. The array of patterned features of claim 13 , wherein the features have a surface roughness of no more than 5 nm.
16. The array of patterned features of claim 13 , wherein the features have a surface roughness of no more than 2 nm.
17. The array of patterned features of claim 13 wherein the features have substantially vertical sidewalls.
18. The array of patterned features of claim 13 , wherein the features have aspect ratios of at least 1:10.
19. The array of patterned features of claim 13 , wherein the features have widths of no more than 25 nm.