IP Library › Granted Patent US 7,514,772
Granted Patent B2
US 7,514,772 · App. 11/380,128 · Granted Apr 7, 2009

Method of manufacturing a semiconductor apparatus

Assignee: Shinko Electric Industries Co., Ltd.
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Quick Facts
Patent No.
US 7,514,772
App. No.
11/380,128
Granted
Apr 7, 2009
Kind
B2
Abstract

A resin layer in which adhesion to a conductive film is higher than that of a sealing resin to the conductive film is disposed on the sealing resin in which it is difficult to form the conductive film, and wiring patterns electrically connected to electronic components are disposed on the resin layer.

Claims (17)

1. A semiconductor apparatus comprising:

a substrate;

an electronic component mounted on said substrate;

a sealing resin for sealing said electronic component;

a resin layer disposed directly on the sealing resin, said resin layer having an adhesion to a conductive film which is higher than an adhesion of said sealing resin to the conductive film; and

a conductive pattern electrically connected to the electronic component and disposed on the resin layer,

wherein the substrate has an electrode, which electrically connects the conductive pattern and the electronic component, and wherein at least a part of the resin layer is in contact with the electrode.

2. The semiconductor apparatus as claimed in claim 1 , wherein the conductive pattern has a connection part for connecting other electronic component.

3. The semiconductor apparatus as claimed in claim 2 , further comprising: a protective film for covering the conductive pattern with the connection part exposed.

4. A semiconductor apparatus comprising:

a substrate;

an electronic component mounted on said substrate;

a sealing resin for sealing said electronic component;

a resin layer disposed directly on the sealing resin, said resin layer having an adhesion to a conductive film which is higher than an adhesion of said sealing resin to the conductive film; and

a conductive pattern electrically connected to the electronic component and disposed on the resin layer,

wherein the substrate has an electrode, which electrically connects the conductive pattern and the electronic component, and wherein the electrode is electrically connected to the conductive pattern through a via, which is provided in the resin layer and passes through the resin layer.

5. The semiconductor apparatus as claimed in claim 4 , wherein the conductive pattern has a connection part for connecting other electronic component.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 26, 2006
From: KOBAYASHI, TOMOKI; SHIMADA, TOSHIJI; INOUE, AKINOBU; KAJIKI, ATSUNORI; KATO, HIROYUKI; SHIMIZU, HIROSHI
To: SHINKO ELECTRIC INDUSTRIES CO., LTD.
Reel/Frame 017530/0271 →
Priority Claims (1)
JP 2005-132539 · Apr 28, 2005 · national
Continuity (1)
Related Publication 20060244131A1 · Nov 2, 2006