IP Library Granted Patent US 7,516,545
Granted Patent B2
US 7,516,545 · App. 11/591,586 · Granted Apr 14, 2009

Method of manufacturing printed circuit board having landless via hole

Assignee: Samsung Electro-Mechanics Co., Ltd.
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Quick Facts
Patent No.
US 7,516,545
App. No.
11/591,586
Granted
Apr 14, 2009
Kind
B2
Abstract

Disclosed is a method of manufacturing a printed circuit board having a landless via hole. Specifically, this invention provides a method of manufacturing a printed circuit board having a landless via hole without the upper land of a via hole using a photoresist (P-LPR) which is loaded in the via hole. Therefore, in this invention, since a circuit pattern is formed using only copper of a copper clad laminate, the width thereof is minimized, thus easily realizing a fine circuit pattern. Further, the landless via hole structure is applied, resulting in a highly dense circuit pattern.

Claims (30)

1. A method of manufacturing a printed circuit board having a landless via hole, comprising:

providing a base substrate composed of a copper clad laminate;

etching part of a copper foil of the copper clad laminate, to thus form a circuit pattern including a through hole;

sequentially forming a seed layer, a second metal layer having etching conditions different from those of copper, and a copper plating layer on an entire surface of the base substrate having the circuit pattern;

filling the through hole with a photoresist;

sequentially removing the copper plating layer, the second metal layer, and the seed layer; and

removing the photoresist from the through hole,

wherein the circuit pattern has a predetermined thickness corresponding to that of the copper foil.

2. The method as set forth in claim 1 , wherein the predetermined thickness of the circuit pattern is about 12˜18 μm.

3. The method as set forth in claim 2 , wherein the circuit pattern has a width of about 20 μm.

4. The method as set forth in claim 1 , wherein filling the through hole with the photoresist comprises:

applying the photoresist on the entire surface of the base substrate and in the through hole; and

exposing the photoresist to a depth corresponding to a thickness thereof, and performing development, to thus remove the photoresist from the surface of the base substrate.

5. The method as set forth in claim 4 , wherein the exposing of the photoresist is performed by controlling an exposure amount such that the photoresist is exposed to a depth corresponding to the thickness thereof.

6. The method as set forth in claim 1 , wherein the second metal layer is a nickel layer.

7. A method of manufacturing a printed circuit board having a landless via hole, comprising:

providing a base substrate including an inner layer circuit and composed of a copper clad laminate;

forming a circuit pattern, having a blind hole which is connected to the inner layer circuit, on a surface of the base substrate;

sequentially forming a seed layer, a second metal layer having etching conditions different from those of copper, and a copper plating layer on an entire surface of the base substrate having the circuit pattern;

filling the blind hole with a photoresist;

sequentially removing the copper plating layer, the second metal layer, and the seed layer; and

removing the photoresist from the blind hole,

wherein the circuit pattern has a predetermined thickness corresponding to that of a copper foil of the copper clad laminate.

8. The method as set forth in claim 7 , wherein the predetermined thickness of the circuit pattern is about 12˜18 μm.

9. The method as set forth in claim 8 , wherein the circuit pattern has a width of about 20 μm.

10. The method as set forth in claim 7 , wherein filling the blind hole with the photoresist (D) comprises:

applying the photoresist on the entire surface of the base substrate and in the blind hole; and

exposing the photoresist to a depth corresponding to a thickness thereof, and performing development, to thus remove the photoresist from the surface of the base substrate.

11. The method as set forth in claim 10 , wherein the exposing of the photoresist is performed by controlling an exposure amount such that the photoresist is exposed to a depth corresponding to the thickness thereof.

12. The method as set forth in claim 7 , wherein the second metal layer is a nickel layer.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 2, 2006
From: KANG, MYUNG SAM; OKABE, SHUHICHI; PARK, JUNG HYUN; JUNG, HOE KU; KIM, JI EUN
To: SAMSUNG ELECTRO-MECHANICS CO., LTD.
Reel/Frame 018496/0698 →
Priority Claims (1)
KR 10-2005-0123206 · Dec 14, 2005 · national
Continuity (1)
Related Publication 20070130761A1 · Jun 14, 2007