Photonic crystal semiconductor device and production method thereof
View Patent ↗To provide a photonic crystal semiconductor device which enables various kinds of optical devices having a photonic crystal structure which is readily formed using a semiconductor and a semiconductor manufacturing process, and a manufacturing method thereof. The object can be achieved by a photonic crystal structure, including a lower DBR layer 1 , a core layer 2 , an upper DBR layer 3 , and a dielectric multilayer film 6 which are sequentially laminated from an n-InP substrate 11 side, a plurality of holes 9 formed in the direction of a film thickness in the core layer 2 and the upper DBR layer 3 , and a line defect portion 10 with none of the plurality of holes formed therein and disposed between the plurality of holes 9 , wherein the line defect portion 10 serves as an optical waveguide.
1. A photonic crystal semiconductor device comprising:
a semiconductor substrate;
a lower semiconductor distributed Bragg reflector multilayer film laminated on said semiconductor substrate;
a semiconductor core layer laminated on said lower semiconductor distributed Bragg reflector multilayer film;
an upper semiconductor distributed Bragg reflector multilayer film laminated on said semiconductor core layer;
a dielectric multilayer film laminated on said upper semiconductor distributed Bragg reflector multilayer film; and
a plurality of holes passing through said upper semiconductor distributed Bragg reflector multilayer film and said semiconductor core layer to form a photonic crystal structure with a two-dimensional periodic structure of refractive index in the semiconductor core layer, the period of the two-dimensional periodic structure being near a wavelength of light to be propagated in said semiconductor core layer,
wherein said lower semiconductor distributed Bragg reflector multilayer film, said upper semiconductor distributed Bragg reflection multilayer film, and said dielectric multilayer film are configured to prevent light in a wavelength of specific band from leaking in a lamination direction.
2. The photonic crystal semiconductor device according to claim 1 , wherein said two-dimensional periodic structure of refractive index has a line defect portion with none of said plurality of holes formed therein, the line defect portion being disposed between said holes.
3. The photonic crystal semiconductor device according to claim 1 , wherein said two-dimensional periodic structure of refractive index has a point defect portion with none of said plurality of holes formed therein, the point defect portion being disposed among said holes.
4. The photonic crystal semiconductor device according to claim 1 , further comprising:
a lower cladding layer laminated between said lower semiconductor distributed Bragg reflector multilayer film and said semiconductor core layer; and
an upper cladding layer laminated between said semiconductor core layer and said upper semiconductor distributed Bragg reflector multilayer film,
wherein said plurality of holes pass through said upper cladding layer and said lower cladding layer.
5. The photonic crystal semiconductor device according to claim 1 , wherein said plurality of holes pass through at least a part of said lower semiconductor distributed Bragg reflector multilayer film.
6. The photonic crystal semiconductor device according to claim 1 , further comprising an electrode configured to apply a current or a voltage to the photonic crystal structure.
7. The photonic crystal semiconductor device according to claim 2 , further comprising an electrode configured to apply a current or a voltage to the photonic crystal structure.
8. The photonic crystal semiconductor device according to claim 3 , further comprising an electrode configured to apply a current or a voltage to the photonic crystal structure.
9. The photonic crystal semiconductor device according to claim 2 , further comprising a selective oxidation layer containing Al for current constriction, said selective oxidation layer disposed in a vicinity of said semiconductor core layer.
10. The photonic crystal semiconductor device according to claim 3 , further comprising a selective oxidation layer containing Al for current constriction, said selective oxidation layer disposed in a vicinity of said semiconductor core layer.
11. The photonic crystal semiconductor device according to claim 2 , wherein said semiconductor core layer has an active layer.
12. The photonic crystal semiconductor device according to claim 3 , wherein said semiconductor core layer has an active layer.
13. The photonic crystal semiconductor device according to claim 1 , wherein said semiconductor core layer has a multiple quantum well structure.
14. The photonic crystal semiconductor device according to claim 11 , wherein said semiconductor core layer has a multiple quantum well structure.
15. The photonic crystal semiconductor device according to claim 12 , wherein said semiconductor core layer has a multiple quantum well structure.
16. The photonic crystal semiconductor device according to claim 1 , wherein said semiconductor core layer contains InGaAsP.
17. The photonic crystal semiconductor device according to claim 1 , wherein said semiconductor core layer contains GaInNAsSb.
18. The photonic crystal semiconductor device according to claim 1 , wherein said semiconductor core layer contains AlGaInAs.
19. A variable wavelength filter comprising:
a photonic crystal semiconductor device including
a semiconductor substrate,
a lower semiconductor distributed Bragg reflector multilayer film laminated on said semiconductor substrate,
a semiconductor core layer laminated on said lower semiconductor distributed Bragg reflector multilayer film,
an upper semiconductor distributed Bragg reflector multilayer film laminated on said semiconductor core layer,
a dielectric multilayer film laminated on said upper semiconductor distributed Bragg reflector multilayer film, and
a plurality of holes passing through said upper semiconductor distributed Bragg reflector multilayer film and said semiconductor core layer to form a photonic crystal structure with a two-dimensional periodic structure of refractive index in the semiconductor core layer, the period of the two-dimensional periodic structure being near a wavelength of light to be propagated in said semiconductor core layer,
wherein said two-dimensional periodic structure of refractive index has a line defect portion with none of said plurality of holes formed therein, the line defect portion being disposed between said holes,
said lower semiconductor distributed Bragg reflector multilayer film, said upper semiconductor distributed Bragg reflector multilayer film, and said dielectric multilayer film are configured to prevent light in a wavelength of specific band from leaking in a lamination direction;
an electrode configured to apply a current or a voltage to the photonic crystal structure portion; and
a variable power source connected to said electrode, such that light propagating through said defect portion is filtered.
20. The photonic crystal semiconductor device according to claim 1 , further comprising a semiconductor laser element formed on said semiconductor substrate, said semiconductor laser element having an active layer optically connected with said semiconductor core layer.
21. The photonic crystal semiconductor device according to claim 20 , wherein said two-dimensional periodic structure of refractive index has a line defect portion with none of said plurality of holes formed therein, said line defect portion being disposed between said holes, and said active layer of said semiconductor laser element is optically connected with said line defect portion of said semiconductor core layer.