Manufacturing method of a semiconductor device to suppress generation of whiskers
View Patent ↗It is suppressed that a whisker occurs on a lead for external connection. A lead for external connection is formed of the alloy (42Alloy) of Fe and Ni, and a plating film which includes alloy of Sn and Cu is formed on the surface. Next, using a heat-treat furnace, the heat treatment at the temperature beyond melting-point T 0 of the plating film is performed, and the plating film is melted. At this time, the temperature beyond T 0 is held for 20 seconds or more. The grain boundary of the plating film can be vanished by the above-mentioned heat treatment. Hereby, the internal stress of the plating film can be eased, and the generation of the whisker can be suppressed.
1. A manufacturing method of a semiconductor device, comprising the steps of:
forming a plating film including Sn over a surface of a lead for external connection; and
performing heat treatment which melts the plating film without mounting the lead for external connection on a mounting substrate;
wherein in the step of performing heat treatment, a temperature more than or equal to a melting-point of the plating film is held for 20 seconds or more.
2. A manufacturing method of a semiconductor device according to claim 1 , wherein
a maximum temperature of the step of performing heat treatment is less than a heat-resistant guarantee temperature of the semiconductor device.
3. A manufacturing method of a semiconductor device according to claim 1 , wherein
the step of performing heat treatment is performed in a condition that a surface for connection to a mounting substrate of the lead for external connection is downward.
4. A manufacturing method of a semiconductor device according to claim 1 , wherein
the step of performing heat treatment is performed in an inert atmosphere.
5. A manufacturing method of a semiconductor device according to claim 1 , wherein the lead for external connection is made of an alloy including Fe and Ni.
6. A manufacturing method of a semiconductor device according to claim 1 , further comprising the steps of:
preparing a leadframe having a die pad, a plurality of leads and a tie bar connecting the plurality of leads, each lead being for external connection;
mounting a semiconductor chip on the die pad of the leadframe;
electrically connecting the semiconductor chip to the plurality of leads for external connection;
sealing the semiconductor chip with a resin; and
cutting the tie bar after the step of sealing the semiconductor chip;
wherein the step of forming the plating film is performed after the step of cutting the tie bar.
7. A manufacturing method of a semiconductor device according to claim 6 , further comprising the step of bending the lead for external connection after the step of forming the plating film and before the step of performing the heat treatment.
8. The manufacturing method according to claim 1 , wherein the plating film is a lead-free plating film.
9. The manufacturing method according to claim 1 , wherein the heat treatment is performed without removing the plating film from any part of the lead for external connection.
10. A manufacturing method of a semiconductor device, comprising the steps of:
forming a plating film including Sn over a surface of a lead for external connection; and
performing heat treatment which melts the plating film without mounting the lead for external connection on a mounting substrate;
wherein in the step of performing heat treatment, a molten state is maintained for 20 seconds or more until an oxide film formed over a surface of the plating film is destroyed.
11. The manufacturing method according to claim 10 , wherein the plating film is a lead-free plating film.
12. The manufacturing method according to claim 10 , wherein the heat treatment is performed without removing the plating film from any part of the lead for external connection.
13. A manufacturing method of a semiconductor device, comprising the steps of:
forming a plating film including Sn over a surface of a lead for external connection; and
performing heat treatment which melts the plating film without mounting the lead for external connection on a mounting substrate,
wherein
the performing heat treatment includes applying a temperature more than or equal to a melting-point of the plating film for 20 seconds or more, and
after the step of forming the plating film, and before the step of performing heat treatment, a forming step of the lead is performed.
14. A manufacturing method of a semiconductor device according to claim 13 , wherein
after the step of performing heat treatment, an electrical property test is done by contacting a terminal over the plating film.
15. A manufacturing method of a semiconductor device according to claim 13 , wherein
after the forming step of the lead, and before the step of performing heat treatment, an electrical property test is done by contacting a terminal over the plating film.
16. The manufacturing method according to claim 13 , wherein the plating film is a lead-free plating film.
17. The manufacturing method according to claim 13 , wherein the heat treatment is performed without removing the plating film from any part of the lead for external connection.