Electro-optical device, electronic apparatus, and method of manufacturing electro-optical device having particular capacitive elements
An electro-optical device includes: an electro-optical device substrate; step portions having a concave shape that are formed on a predetermined insulating film of the electro-optical device substrate; side wall portions each of which is formed on a side surface of the concave step portion between the surface of the insulating layer and the bottom of the step portion and has an upward convex curved surface, the surface of the curved surface being continuously formed with the surface of the insulating film at the top of the concave step portion; and capacitive elements each of which is formed on the step portion and the side wall portion and has a lower electrode layer, an upper electrode layer, and a dielectric layer interposed between the lower electrode layer and the upper electrode layer.
1. An electro-optical device comprising:
an electro-optical device substrate;
step portions having a concave shape that are formed on a predetermined insulating film of the electro-optical device substrate;
side wall portions each of which is formed on a side surface of the concave step portion between the surface of the insulating layer and the bottom of the step portion and has an upward convex curved surface, the surface of the curved surface being continuously formed with the surface of the insulating film at the top of the concave step portion; and
capacitive elements each of which is formed on the step portion and the side wall portion and has a lower electrode layer, an upper electrode layer, and a dielectric layer interposed between the lower electrode layer and the upper electrode layer.
2. The electro-optical device according to claim 1 ,
wherein, in a cross-sectional view of a plane that is orthogonal to the surface of the insulating layer and includes a normal line with respect to the side surface, a tangent line of the surface of the side wall portion is substantially parallel to a tangent line of the surface of the insulating film, at the top of the side wall portion of the concave step portion, and
the inclination of the tangent line of the surface of the side wall portion with respect to the surface of the insulating film continuously increases toward a lower side.
3. The electro-optical device according to claim 1 ,
wherein the concave step portions are contact holes formed in the insulating film.
4. The electro-optical device according to claim 1 ,
wherein the side wall portion is composed of a plasma TEOS film, a low pressure TEOS film, or a BPSG film.
5. The electro-optical device according to claim 1 ,
wherein the side wall portion is composed of a metal film.
6. An electronic apparatus comprising the electro-optical device according to claim 1 .
7. An electro-optical device comprising:
an electro-optical device substrate;
step portions having a convex shape that are formed on a predetermined insulating film of the electro-optical device substrate;
side wall portions each of which is formed on a side surface of the convex step portion between the surface of the insulating layer and an upper surface of the step portion and has an upward convex curved surface, the surface of the curved surface being continuously formed with the upper surface of the convex step portion at the top of the side wall portion; and
capacitive elements each of which is formed on the step portion and the side wall portion and has a lower electrode layer, an upper electrode layer, and a dielectric layer interposed between the lower electrode layer and the upper electrode layer.
8. The electro-optical device according to claim 7 ,
wherein, in a cross-sectional view of a plane that is orthogonal to the surface of the insulating layer and includes a normal line with respect to the side surface, a tangent line of the surface of the side wall portion is substantially parallel to a tangent line of the upper surface of the convex step portion, at the top of the side wall portion, and
the inclination of the tangent line of the surface of the side wall portion with respect to the surface of the insulating film continuously increases toward a lower side.
9. A method of manufacturing an electro-optical device having capacitive elements formed on a substrate, comprising:
forming step portions having a concave or convex shape on a predetermined insulating layer;
forming a film to be etched on a side surface of each of the step portions;
performing anisotropic etching on the surface of the film to be etched; and
forming, on a region including the step portion, a portion of the capacitive element having a lower electrode layer, an upper electrode layer, and a dielectric layer interposed between the lower electrode layer and the upper electrode layer.
10. A method of manufacturing an electro-optical device having capacitive elements formed on a substrate, comprising:
forming step portions having a concave or convex shape on a predetermined insulating layer;
forming a film to be etched on a side surface of each of the step portions;
performing etching including isotropic etching and anisotropic etching on the surface of the film to be etched; and
forming, on a region including the step portion, a portion of the capacitive element having a lower electrode layer, an upper electrode layer, and a dielectric layer interposed between the lower electrode layer and the upper electrode layer.