Position-measuring device

1. A position-measuring device for measuring a position of two objects movable relative to one another, comprising:

a measuring graduation connected to one of the two objects; and

at least one scanning system adapted to scan the measuring graduation and connected to the other of the two objects, the scanning system adapted to form a first scanning beam path and a second scanning beam path, the scanning system adapted to generate a group of phase-shifted signals from two interfering partial beams of rays in each of the scanning beam paths, the scanning system adapted to permit a simultaneous determination of position values along at least one lateral shift direction of the objects and along a vertical shift direction of the objects from the groups of phase-shifted signals, the two partial beams of rays of each scanning beam path arranged asymmetrically with respect to a plane perpendicular to the lateral shift direction.

2. The position-measuring device according to claim 1 , wherein the scanning system is adapted to form a first scanning beam path and a second scanning beam path to determine the position in the lateral shift direction and the vertical shift direction, the scanning system adapted to generate a group of phase-shifted signals from two interfering partial beams of rays in each of the scanning beam paths.

3. The position-measuring device according to claim 2 , wherein the second scanning beam path is arranged in mirror symmetry with respect to the first scanning beam path relative to the plane perpendicular to the lateral shift direction, the two partial beams of rays of each scanning beam path diffracted in different orders of diffraction at the measuring graduation.

4. The position-measuring device according to claim 3 , further comprising an evaluation device adapted to determine primary position values from interpolated, phase-shifted signals of both groups, a lateral position value and a vertical position value ascertainable from the primary position values.

5. The position-measuring device according to claim 4 , further comprising a compensation device adapted to compensate for possible interpolation errors of the primary position values.

6. The position-measuring device according to claim 3 , wherein the two partial beams of rays of each scanning beam path are diffracted in one of (a) +1st and (b) −1st order of diffraction at the measuring graduation.

7. The position-measuring device according to claim 3 , further comprising means for determining primary position values from interpolated, phase-shifted signals of both groups, a lateral position value and a vertical position value ascertainable from the primary position values.

8. The position-measuring device according to claim 7 , further comprising means for compensating for possible interpolation errors of the primary position values.

9. The position-measuring device according to claim 2 , further comprising means, arranged in at least one of the scanning beam paths, for providing identical optical path lengths for the interfering partial beams of rays.

10. The position-measuring device according to claim 2 , further comprising an optical device arranged in at least one of the scanning beam paths adapted to provide identical optical path lengths for the interfering partial beams of rays.

11. The position-measuring device according to claim 1 , wherein the measuring graduation includes a two-dimensional cross grating, the at least one scanning system including three scanning systems arranged in a non-collinear configuration relative to each other and adapted to determine the movement of the objects in six spatial degrees of freedom from linked position values of the three scanning systems.

12. The position-measuring device according to claim 11 , wherein the two objects are components of a semiconductor manufacturing device.

13. A position-measuring device for measuring a position of two objects movable relative to one another, comprising:

a measuring graduation connected to one of the two objects; and

at least one scanning system adapted to scan the measuring graduation and connected to the other of the two objects, the scanning system adapted to permit a simultaneous determination of position values along at least one lateral shift direction of the objects and along a vertical shift direction of the objects, the scanning system adapted to form a first scanning beam path and a second scanning beam path to determine the position in the lateral shift direction and the vertical shift direction, the scanning system adapted to generate a group of phase-shifted signals from two interfering partial beams of rays in each of the scanning beam paths;

wherein the two partial beams of rays of each scanning beam path are arranged asymmetrically with respect to a plane perpendicular to the lateral shift direction, the second scanning beam path arranged in mirror symmetry with respect to the first scanning beam path relative to the plane perpendicular to the lateral shift direction, the two partial beams of rays of each scanning beam path diffracted in different orders of diffraction at the measuring graduation.

14. The position-measuring device according to claim 13 , further comprising an evaluation device adapted to determine primary position values from interpolated, phase-shifted signals of both groups, a lateral position value and a vertical position value ascertainable from the primary position values.

15. The position-measuring device according to claim 14 , further comprising a compensation device adapted to compensate for possible interpolation errors of the primary position values.

16. The position-measuring device according to claim 13 , wherein the two partial beams of rays of each scanning beam path are diffracted in one of (a) +1st and (b) −1st order of diffraction at the measuring graduation.

17. The position-measuring device according to claim 13 , further comprising means for determining primary position values from interpolated, phase-shifted signals of both groups, a lateral position value and a vertical position value ascertainable from the primary position values.

18. The position-measuring device according to claim 17 , further comprising means for compensating for possible interpolation errors of the primary position values.

19. The position-measuring device according to claim 13 , further comprising an optical device arranged in at least one of the scanning beam paths adapted to provide identical optical path lengths for the interfering partial beams of rays.

20. The position-measuring device according to claim 13 , wherein the measuring graduation includes a two-dimensional cross grating, the at least one scanning system including three scanning systems arranged in a non-collinear configuration relative to each other and adapted to determine the movement of the objects in six spatial degrees of freedom from linked position values of the three scanning systems.

21. The position-measuring device according to claim 20 , wherein the two objects are components of a semiconductor manufacturing device.

22. The position-measuring device according to claim 13 , further comprising means, arranged in at least one of the scanning beam paths, for providing identical optical path lengths for the interfering partial beams of rays.

23. A position-measuring device for measuring a position of two objects movable relative to one another, comprising:

a measuring graduation connected to one of the two objects; and

at least one scanning system adapted to scan the measuring graduation and connected to the other of the two objects, the scanning system adapted to permit a simultaneous determination of position values along at least one lateral shift direction of the objects and along a vertical shift direction of the objects;

wherein the measuring graduation includes a two-dimensional cross grating, the at least one scanning system including three scanning systems arranged in a non-collinear configuration relative to each other and adapted to determine the movement of the objects in six spatial degrees of freedom from linked position values of the three scanning systems.

24. The position-measuring device according to claim 23 , wherein the two objects are components of a semiconductor manufacturing device.

25. The position-measuring device according to claim 23 , wherein the scanning system is adapted to form a first scanning beam path and a second scanning beam path to determine the position in the lateral shift direction and the vertical shift direction, the scanning system adapted to generate a group of phase-shifted signals from two interfering partial beams of rays in each of the scanning beam paths.

26. The position-measuring device according to claim 25 , wherein the two partial beams of rays of each scanning beam path are arranged asymmetrically with respect to a plane perpendicular to the lateral shift direction, the second scanning beam path arranged in mirror symmetry with respect to the first scanning beam path relative to the plane perpendicular to the lateral shift direction, the two partial beams of rays of each scanning beam path diffracted in different orders of diffraction at the measuring graduation.

27. The position-measuring device according to claim 26 , further comprising an evaluation device adapted to determine primary position values from interpolated, phase-shifted signals of both groups, a lateral position value and a vertical position value ascertainable from the primary position values.

28. The position-measuring device according to claim 27 , further comprising a compensation device adapted to compensate for possible interpolation errors of the primary position values.

29. The position-measuring device according to claim 25 , further comprising an optical device arranged in at least one of the scanning beam paths adapted to provide identical optical path lengths for the interfering partial beams of rays.

30. The position-measuring device according to claim 26 , wherein the two partial beams of rays of each scanning beam path are diffracted in one of (a) +1st and (b) −1st order of diffraction at the measuring graduation.

31. The position-measuring device according to claim 23 , wherein the two objects are components of a semiconductor manufacturing device.

32. The position-measuring device according to claim 26 , further comprising means for determining primary position values from interpolated, phase-shifted signals of both groups, a lateral position value and a vertical position value ascertainable from the primary position values.

33. The position-measuring device according to claim 32 , further comprising means for compensating for possible interpolation errors of the primary position values.

34. The position-measuring device according to claim 25 , further comprising means, arranged in at least one of the scanning beam paths, for providing identical optical path lengths for the interfering partial beams of rays.

35. A position-measuring device for measuring a position of two objects movable relative to one another, comprising:

a measuring graduation connected to one of the two objects;

at least one scanning system adapted to scan the measuring graduation and connected to the other of the two objects, the scanning system adapted to permit a simultaneous determination of position values along at least one lateral shift direction of the objects and along a vertical shift direction of the objects, the scanning system adapted to form a first scanning beam path and a second scanning beam path to determine the position in the lateral shift direction and the vertical shift direction, the scanning system adapted to generate a group of phase-shifted signals from two interfering partial beams of rays in each of the scanning beam paths; and

means, arranged in at least one of the scanning beam paths, for providing identical optical path lengths for the interfering partial beams of rays.