Image sensor with decreased optical interference between adjacent pixels

1. An image sensor, that is divided into a pixel region and a peripheral region, the image sensor comprising:

a photodiode formed in a substrate in the pixel region;

first to Mth metal lines formed over the substrate in the pixel region, where M is a natural number greater than approximately 1;

first to Nth metal lines formed over a substrate in the peripheral region, where N is a natural number greater than M;

at least one layer of dummy metal lines formed over the Mth metal lines but formed not to overlap with the photodiode; and

a microlens formed over the at least one layer of the dummy metal lines to overlap with the photodiode.

2. The image sensor of claim 1 , wherein the dummy metal lines are formed in at least one layer to K number of layers, where K is a value of (N−M)+1, wherein the K number of the layers are formed to be flush with the N number of the metal lines and with via contacts formed between the N number of the metal lines.

3. The image sensor of claim 2 , wherein the dummy metal lines are formed simultaneously as metal lines are formed above the Mth metal lines in the peripheral region, the dummy metal lines being flush with the metal lines.

4. The image sensor of claim 2 , wherein the photodiode is arranged in a central portion of each unit pixel, and each of the dummy metal lines is arranged symmetrically such that a central point of each of the dummy metal lines is positioned at a point where four corner portions of adjacent unit pixels commonly meet.

5. The image sensor of claim 4 , wherein each of the dummy metal lines is formed in one shape selected from a group consisting of quadrangles, cross-shapes, and rhombuses.

6. The image sensor of claim 2 , wherein the photodiode is arranged in a central portion of each unit pixel, and each of the dummy metal lines is arranged in a portion where four corners of adjacent unit pixels commonly meet and is formed in one shape selected from a group of polygons and irregularly-shaped figures.

7. An image sensor, that is divided into a pixel region and a peripheral region, the image sensor comprising:

a photodiode formed in a substrate in the pixel region;

first to Mth metal lines formed over the substrate in the pixel region, where M is a natural number greater than approximately 1;

first to Nth metal lines formed over a substrate in the peripheral region, where N is a natural number greater than M;

at least one layer of dummy metal lines formed over the Mth metal lines to cover a portion that is not overlapped with the photodiode; and

a microlens formed over the at least one layer of dummy metal lines to overlap with the photodiode.

8. The image sensor of claim 7 , wherein the dummy metal lines are formed in at least one layer to K numbers of layers, where K is a value of (N−M)+1, wherein the K number of the layers are formed to be flush with the N number of the metal lines and with via contacts formed between the N number of the metal lines.

9. The image sensor of claim 8 , wherein the dummy metal lines are formed simultaneously as metal lines are formed above the Mth metal lines in the peripheral region, the dummy metal lines being flush with the metal lines.

10. An image sensor, that is divided into a pixel region and a peripheral region, the image sensor comprising:

a photodiode formed in a substrate in the pixel region;

first to Mth metal lines formed over the substrate in the pixel region, where M is a natural number greater than approximately 1;

first to Nth metal lines formed over a substrate in the peripheral region, where N is a natural number greater than M;

at least one layer of dummy metal lines formed over the Mth metal lines by having an insulation layer between the dummy metal lines and the Mth metal lines but formed not to overlap with the photodiode; and

a microlens formed over the at least one layer of dummy metal lines to overlap with the photodiode.

11. The image sensor of claim 10 , wherein the at least one layer of the dummy metal lines and the insulation layer are formed simultaneously as an electrode and a dielectric layer of a capacitor are formed in the peripheral region, respectively.

12. The image sensor of claim 10 , wherein the at least one layer of the dummy metal lines, the insulation layer and the Mth metal lines serve as a capacitor in the peripheral region.

13. An image sensor, that is divided into a pixel region and a peripheral region, the image sensor comprising:

a photodiode formed in a substrate in the pixel region;

first to Mth metal lines formed over the substrate in the pixel region, where M is a natural number greater than approximately 1;

first to Nth metal lines formed over a substrate in the peripheral region, where N is a natural number greater than M;

at least one layer of dummy metal lines formed in contact with the Mth metal lines but not to overlap with the photodiode, the dummy metal line used as a via contact and including a metal; and

a microlens formed over the at least one layer of dummy metal lines to overlap with the photodiode.

14. The image sensor of claim 13 , wherein the dummy metal lines are formed simultaneously as via contacts are formed in the peripheral region, the metal lines being flush with the via contacts.

15. An image sensor is divided into a pixel region and a peripheral region, the image sensor comprising:

a photodiode formed in a substrate in the pixel region;

first to Mth metal lines formed over the substrate in the pixel region, where M is a natural number greater than approximately 1;

first to Nth metal lines formed over a substrate in the peripheral region, where N is a natural number greater than M;

at least one layer of first dummy metal lines formed over the Mth metal lines not to overlap with the photodiode;

at least one layer of second dummy metal lines formed to contact with the at least one layer of the first dummy metal line; and

a microlens formed over the at least one layer of second dummy metal lines to overlap with the photodiode.

16. The image sensor of claim 15 , wherein the first dummy metal lines are formed simultaneously as metal lines are formed in the peripheral region, the first dummy metal lines being flush with the metal lines; and the second dummy metal lines are formed simultaneously as via contacts are formed in the peripheral region, the second dummy metal lines being flush with the via contacts.