IP Library › Granted Patent US 7,648,729
Granted Patent B2
US 7,648,729 · App. 10/782,947 · Granted Jan 19, 2010

Mask, method of manufacturing mask, device for manufacturing mask, method of manufacturing layer of luminescent material, electro-optical device, and electronic device

Assignee: Seiko Epson Corporation
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Quick Facts
Patent No.
US 7,648,729
App. No.
10/782,947
Granted
Jan 19, 2010
Kind
B2
Abstract

This mask includes: a substrate in which an aperture is formed; a mask member which, along with being formed with a plurality of through holes, is joined to the substrate in correspondence to the aperture; and spacers which hold the substrate and the mask member with a predetermined gap between them.

Claims (12)

1. A mask, comprising:

a substrate in which an aperture is formed;

a mask member which, along with being formed with a plurality of through holes, is joined to said substrate in correspondence to said aperture; and

spacers which are sufficiently rigid not to deform when pressed so as to hold said substrate and said mask member with a predetermined gap between them, wherein:

said spacers consist of a plurality of spherical bodies having a diameter that is substantially the same as said predetermined gap, and

said spacers are provided between said substrate and said mask member, so that each of said spacers contacts both said substrate and said mask member.

2. A mask according to claim 1 , wherein said spacers are disposed along with an adhesive in a junction region between said substrate and said mask member.

3. A mask according to claim 2 , wherein said substrate includes a transparent material.

4. A mask according to claim 2 , wherein the adhesive is photo-curing.

5. A mask according to claim 2 , wherein the adhesive is disposed at an outer peripheral side of said mask member.

6. A method of manufacturing a layer of luminescent material, wherein, as a mask which is used when forming a layer of luminescent material by vapor deposition, there is used:

a mask according to claim 1 .

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 30, 2013
From: SEIKO EPSON CORPORATION
To: INTELLECTUAL KEYSTONE TECHNOLOGY LLC
Reel/Frame 030321/0510 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 10, 2004
From: NAKADATE, MAKOTO
To: SEIKO EPSON CORPORATION
Reel/Frame 015367/0028 →
Priority Claims (4)
JP 2003-061355 · Mar 7, 2003 · national
JP 2003-061356 · Mar 7, 2003 · national
JP 2003-061357 · Mar 7, 2003 · national
JP 2004-036621 · Feb 13, 2004 · national
Continuity (1)
Related Publication 20050053764A1 · Mar 10, 2005