LPP type extreme ultra violet light source apparatus and driver laser for the same
View Patent ↗A driver laser for EUV light source apparatus which driver laser simultaneously achieves short-pulsing and multi-line oscillation. The driver laser includes: a short-pulse multi-line oscillated CO 2 laser oscillator having a device that shortens width of pulses included in a laser beam to be output and a device that suppresses amplitude of an oscillation spectrum exhibiting an energy peak value; and at least one amplifier that inputs the laser beam output from the short-pulse multi-line oscillated CO 2 laser oscillator and amplifies the input laser beam to output the amplified laser beam.
1. An LPP (laser produced plasma) type extreme ultra violet light source apparatus comprising:
a driver laser for said extreme ultra violet light source apparatus, said driver laser including (i) a short-pulse multi-line oscillated CO 2 laser oscillator including a device having a wavelength-dependent transmittance that suppresses amplitude of an oscillation spectrum exhibiting an energy peak value and does not suppress intensity of spectrum components with low peak intensity and a device that shortens width of pulses included in a laser beam to be output by cutting the laser beam into a desired pulse width, and (ii) at least one amplifier that inputs the laser beam output from said short-pulse multi-line oscillated CO 2 laser oscillator and amplifies the input laser beam to output the amplified laser beam;
a target supplier that supplies a target material; and
an optical system that guides the laser beam output from said driver laser such that the target material supplied from said target supplier is irradiated with the laser beam.
2. An LPP (laser produced plasma) type extreme ultra violet light source apparatus comprising:
a driver laser for said extreme ultra violet light source apparatus, said driver laser including (i) a short-pulse multi-line oscillated laser oscillator having a laser that outputs a short-pulsed laser beam and an optical parametric oscillation device that causes optical parametric oscillation based on the short-pulsed laser beam output from said laser such that the short-pulsed laser beam has a wider bandwidth, (ii) at least one amplifier that inputs the laser beam output from said short-pulse multi-line oscillated laser oscillator and amplifies the input laser beam to output the amplified laser beam, and (iii) a spectrum matching box using a regenerative amplifier of a CO 2 laser, said spectrum matching box matching the laser beam having the wider bandwidth due to said optical parametric oscillation device with an oscillation spectrum of said at least one amplifier by converting the laser beam into a light pulse having a comb-like spectrum waveform;
a target supplier that supplies a target material; and
an optical system that guides the laser beam output from said driver laser such that the target material supplied from said target supplier is irradiated with the laser beam.
3. An LPP (laser produced plasma) type extreme ultra violet light source apparatus according to claim 1 , wherein said device having a wavelength-dependent transmittance that suppresses amplitude of an oscillation spectrum exhibiting an energy peak value and does not suppress intensity of spectrum components with low peak intensity comprises an etalon.
4. An LPP (laser produced plasma) type extreme ultra violet light source apparatus according to claim 3 , wherein said device that shortens width of pulses included in a laser beam to be output by cutting the laser beam into a desired pulse width comprises a first polarizing beam splitter, a second polarizing beam splitter, and a Pockels cell.
5. An LPP (laser produced plasma) type extreme ultra violet light source apparatus according to claim 3 , wherein said device that shortens width of pulses included in a laser beam to be output by cutting the laser beam into a desired pulse width comprises a polarizing beam splitter, a quarter-wave plate, and a Pockels cell.
6. An LPP (laser produced plasma) type extreme ultra violet light source apparatus according to claim 3 , wherein said device that shortens width of pulses included in a laser beam to be output by cutting the laser beam into a desired pulse width comprises a germanium Brewster plate and a short-pulse laser device.
7. An LPP (laser produced plasma) type extreme ultra violet light source apparatus according to claim 1 , wherein said device that shortens width of pulses included in a laser beam to be output by cutting the laser beam into a desired pulse width comprises a first polarizing beam splitter, a second polarizing beam splitter, and a Pockels cell.
8. An LPP (laser produced plasma) type extreme ultra violet light source apparatus according to claim 1 , wherein said device that shortens width of pulses included in a laser beam to be output by cutting the laser beam into a desired pulse width comprises a polarizing beam splitter, a quarter-wave plate, and a Pockels cell.
9. An LPP (laser produced plasma) type extreme ultra violet light source apparatus according to claim 1 , wherein said device that shortens width of pulses included in a laser beam to be output by cutting the laser beam into a desired pulse width comprises a germanium Brewster plate and a short-pulse laser device.