IP Library Granted Patent US 7,670,745
Granted Patent B2
US 7,670,745 · App. 11/979,466 · Granted Mar 2, 2010

Alkali soluble polymer and positive working photosensitive resin composition using the same

Assignee: Chisso Corporation
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Quick Facts
Patent No.
US 7,670,745
App. No.
11/979,466
Granted
Mar 2, 2010
Kind
B2
Abstract

The invention provides an alkali soluble polymer including a specific vinylketone phenol and a derivative thereof as radical polymerizable monomers and a positive working photosensitive resin composition containing the alkali soluble polymer and a photosensitizing agent. According to the invention, there can be provided an alkali soluble resin having high solvent resistance, high water resistance, high acid resistance, high alkali resistance, high thermal resistance, high transparency, excellent adhesiveness with a substrate, and the like and useful for the formation of a patterned resin film obtained by developing in an aqueous alkali solution and a positive working photosensitive resin composition including such an alkali soluble resin.

Claims (45)

1. An alkali soluble polymer, which is obtained by polymerization of a monomer (A) represented by formula (1) with a radical polymerizable monomer (B) other than the monomer (A):

where: R 1 , R 2 , and R 3 each represent a hydrogen or an alkyl group having 1 to 3 carbon atoms in which any hydrogen may be replaced by a fluorine; and R 4 , R 5 , R 6 , R 7 , and R 8 each represent a hydrogen, a halogen, —CN, —CF 3 , —OCF 3 , or —OH, an alkyl group having 1 to 5 carbon atoms in which any —CH 2 — may be replaced by —COO—, —OCO—, or —CO—, and any hydrogen may be replaced by a halogen, or an alkoxy group having 1 to 5 carbon atoms in which any hydrogen may be replaced by a halogen, provided that at least one of R 4 to R 8 is —OH,

wherein the radical polymerizable monomer (B) includes one or more selected from the group consisting of a radical polymerizable monomer (b1) having an oxiranyl group; a radical polymerizable monomer (b2) having an oxetanyl group; a radical polymerizable monomer (b3) having an N-substituted maleimide: and a radical polymerizable monomer (b4) having a tricycle [5.2.1.0 2.6 ]decanyl group.

2. The alkali soluble polymer according to claim 1 , wherein the R 1 to R 5 , R 7 , and R 8 each represent a hydrogen and the R 6 represents —OH.

3. The alkali soluble polymer according to claim 1 , wherein the radical polymerizable monomer (B) includes one or both of the radical polymerizable monomer (b1) and the radical polymerizable monomer (b2).

4. The alkali soluble polymer according to claim 3 , wherein the radical polymerizable monomer (B) consists of the radical polymerizable monomer (b1), the radical polymerizable monomer (b2), and a radical polymerizable monomer (b5) other than the radical polymerizable monomers (b1) to (b4).

5. The alkali soluble polymer according to claim 4 , wherein:

the radical polymerizable monomer (b1) is one or two or more selected from the group of glycidyl acrylate, glycidyl methacrylate, and methyl glycidyl methacrylate;

the radical polymerizable monomer (b2) is one or two or more selected from the group of (3-ethyl-3-oxetanyl)methyl acrylate, (3-ethyl-3-oxetanyl)methyl methacrylate, (2-ethyl-2-oxetanyl) methyl acrylate, and (2-ethyl-2-oxetanyl)methyl methacrylate;

the radical polymerizable monomer (b3) is one or both of N-phenyl maleimide and N-cyclohexyl maleimide; and

the radical polymerizable monomer (b4) is tricyclo [5.2.1.0 2,6 ] decanyl methacrylate.

6. The alkali soluble polymer according to claim 4 , wherein the radical polymerizable monomer (b5) is one or both of benzyl methacrylate and styrene.

7. The alkali soluble polymer according to claim 3 , wherein the radical polymerizable monomer (B) consists of the radical polymerizable monomers (b1), (b2), and (b3).

8. The alkali soluble polymer according to claim 7 , wherein:

the radical polymerizable monomer (b1) is one or two or more selected from the group of glycidyl acrylate, glycidyl methacrylate, and methyl glycidyl methacrylate;

the radical polymerizable monomer (b2) is one or two or more selected from the group of (3-ethyl-3-oxetanyl)methyl acrylate, (3-ethyl-3-oxetanyl)methyl methacrylate, (2-ethyl-2-oxetanyl)methyl acrylate, and (2-ethyl-2-oxetanyl)methyl methacrylate;

the radical polymerizable monomer (b3) is one or both of N-phenyl maleimide and N-cyclohexyl maleimide; and

the radical polymerizable monomer (b4) is tricyclol[5.2.1.0 2,6 ]decanyl methacrylate.

9. The alkali soluble polymer according to claim 3 , wherein the radical polymerizable monomer (B) consists of the radical polymerizable monomers (b1), (b2), and (b4).

10. The alkali soluble polymer according to claim 9 , wherein:

the radical polymerizable monomer (b1) is one or two or more selected from the group of glycidyl acrylate, glycidyl methacrylate, and methyl glycidyl methacrylate;

the radical polymerizable monomer (b2) is one or two or more selected from the group of (3-ethyl-3-oxetanyl)methyl acrylate, (3-ethyl-3-oxetanyl)methyl methacrylate, (2-ethyl-2-oxetanyl)methyl acrylate, and (2-ethyl-2-oxetanyl)methyl methacrylate;

the radical polymerizable monomer (b3) is one or both of N-phenyl maleimide and N-cyclohexyl maleimide; and

the radical polymerizable monomer (b4) is tricycle[5.2.1.0 2,6 ]decanyl methacrylate.

11. The alkali soluble polymer according to claim 3 , wherein the radical polymerizable monomer (B) consists of the radical polymerizable monomers (b1), (b3), and (b4).

12. The alkali soluble polymer according to claim 11 , wherein:

the radical polymerizable monomer (b1) is one or two or more selected from the group of glycidyl acrylate, glycidyl methacrylate, and methyl glycidyl methacrylate;

the radical polymerizable monomer (b2) is one or two or more selected from the group of (3-ethyl-3-oxetanyl)methyl acrylate, (3-ethyl-3-oxetanyl)methyl methacrylate, (2-ethyl-2-oxetanyl)methyl acrylate, and (2-ethyl-2-oxetanyl)methyl methacrylate;

the radical polymerizable monomer (b3) is one or both of N-phenyl maleimide and N-cyclohexyl maleimide; and

the radical polymerizable monomer (b4) is tricycle[5.2.1.0 2,6 ]decanyl methacrylate.

13. The alkali soluble polymer according to claim 3 , wherein the radical polymerizable monomer (B) consists of the radical polymerizable monomers (b1).

14. The alkali soluble polymer according to claim 13 , wherein:

the radical polymerizable monomer (b1) is one or two or more selected from the group of glycidyl acrylate, glycidyl methacrylate, and methyl glycidyl methacrylate;

the radical polymerizable monomer (b2) is one or two or more selected from the group of (3-ethyl-3-oxetanyl)methyl acrylate, (3-ethyl-3-oxetanyl)methyl methacrylate, (2-ethyl-2-oxetanyl)methyl acrylate, and (2-ethyl-2-oxetanyl)methyl methacrylate;

the radical polymerizable monomer (b3) is one or both of N-phenyl maleimide and N-cyclohexyl maleimide; and

the radical polymerizable monomer (b4) is tricyclo[5.2.1.0 2,6 ]decanyl methacrylate.

15. The alkali soluble polymer according to claim 3 , wherein the radical polymerizable monomer (B) consists of the radical polymerizable monomers (b1) and (b4).

16. The alkali soluble polymer according to claim 15 , wherein:

the radical polymerizable monomer (b1) is one or two or more selected from the group of glycidyl acrylate, glycidyl methacrylate, and methyl glycidyl methacrylate;

the radical polymerizable monomer (b2) is one or two or more selected from the group of (3-ethyl-3-oxetanyl)meythyl acrylate, (3-ethyl-3-oxetanyl)methyl methacrylate, (2-ethyl-2-oxetanyl)methyl acrylate, and (2-ethyl-2-oxetanyl)methyl methacrylate;

the radical polymerizable monomer (b3) is one or both of N-phenyl maleimide and N-cyclohexyl maleimide; and

the radical polymerizable monomer (b4) is tricyclo[5.2.1.0 2,6 ]decanyl methacrylate.

17. A positive working photosensitive resin composition comprising the alkali soluble polymer according to claim 1 and a photosensitizing agent (C).

18. The positive working photosensitive resin composition according to claim 17 , wherein the photosensitizing agent (C) is an acid generator compound.

19. The positive working photosensitive resin composition according to claim 17 , wherein the photosensitizing agent (C) is a 1,2-quinone diazide compound.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 27, 2011
From: CHISSO CORPORATION
To: JNC CORPORATION
Reel/Frame 026187/0940 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 23, 2008
From: ETOU, TOMOHIRO; WATANABE, EIJI; MINEO, RYOUTA,
To: CHISSO CORPORATION
Reel/Frame 020430/0111 →
Priority Claims (1)
JP 2006-299052 · Nov 2, 2006 · national
Continuity (1)
Related Publication 20080131813A1 · Jun 5, 2008