IP Library Granted Patent US 7,683,355
Granted Patent B2
US 7,683,355 · App. 11/902,596 · Granted Mar 23, 2010

Extreme ultra violet light source apparatus

Assignee: Komatsu Ltd.
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Quick Facts
Patent No.
US 7,683,355
App. No.
11/902,596
Granted
Mar 23, 2010
Kind
B2
Abstract

An EUV light source apparatus capable of preventing the efficiency of generation of EUV light from decreasing due to deterioration of a window of an EUV light generation chamber. The EUV light source apparatus includes an EUV light generation chamber provided with a window, a driver laser which generates a laser beam, a concave lens which enlarges the laser beam, a convex lens which collimates the enlarged laser beam, a parabolic concave mirror which is arranged in the EUV light generation chamber and reflects the collimated laser beam to collect the laser beam to a target material, a parabolic concave mirror adjusting mechanism which adjusts position and angle of the parabolic concave mirror, an EUV light collector mirror which collects EUV light, and a purge gas supply unit which supplies a purge gas for protecting the window and the parabolic concave mirror.

Claims (47)

1. An extreme ultra violet light source apparatus which generates extreme ultra violet light by irradiating a target material with a laser beam and thereby turning said target material into plasma, said apparatus comprising:

an extreme ultra violet light generation chamber in which extreme ultra violet light is generated;

a target material supply unit which supplies a target material into said extreme ultra violet light generation chamber;

a driver laser which generates a laser beam;

a window which is provided in said extreme ultra violet light generation chamber and allows the laser beam to be transmitted into said extreme ultra violet light generation chamber, a surface of said window being disposed at an inner side of said extreme ultra violet light generation chamber;

a laser beam collecting optical device which collects the laser beam generated by said driver laser to a target material supplied into said extreme ultra violet light generation chamber so as to generate plasma, said laser beam collecting optical device including an optical surface arranged in said extreme ultra violet light generation chamber;

an extreme ultra violet light collecting optical device which collects the extreme ultra violet light generated from said plasma to output the extreme ultra violet light;

a purge gas supply unit which supplies a purge gas for protecting at least one of (i) said surface of said window and (ii) said optical surface of said laser beam collecting optical device;

a laser beam detector protection unit through which the laser beam passes after being collected by said laser beam collecting optical device;

a laser beam image forming optics which forms an image of the laser beam collected by said laser beam collecting optical device;

a laser beam detector which obtains information about a position at which the image of the laser beam is formed by said laser beam image forming optics; and

an adjusting mechanism which carries out alignment of said laser beam collecting optical device based on the information obtained by said laser beam detector.

2. An extreme ultra violet light source apparatus according to claim 1 , wherein said purge gas supply unit ejects the purge gas to at least one of (i) the surface of said window at the inner side of said extreme ultra violet light generation chamber and (ii) the optical surface of said at least one optical device arranged in said extreme ultra violet light generation chamber.

3. An extreme ultra violet light source apparatus according to claim 1 , further comprising:

at least one purge gas chamber arranged to surround at least one of (i) the surface of said window at the inner side of said extreme ultra violet light generation chamber and (ii) said at least one optical device arranged in said extreme ultra violet light generation chamber, said purge gas chamber having an opening which allows the laser beam to pass through.

4. An extreme ultra violet light source apparatus according to claim 1 , wherein:

said laser beam collecting optical device includes a plurality of optical devices; and

said laser beam collecting optical device has a back focus a length which is longer than a focal length of one of said plurality of optical devices arranged at a light output side.

5. An extreme ultra violet light source apparatus according to claim 4 , wherein said laser beam collecting optical device includes:

a first lens which is arranged outside said extreme ultra violet light generation chamber and enlarges the laser beam generated by said driver laser;

a second lens which is arranged outside said extreme ultra violet light generation chamber and collimates the laser beam enlarged by said first lens; and

one of a parabolic concave mirror and a spherical concave mirror which is arranged inside said extreme ultra violet light generation chamber and reflects the laser beam collimated by said second lens to collect the laser beam onto a path of the target material in said extreme ultra violet light generation chamber.

6. An extreme ultra violet light source apparatus according to claim 4 , wherein said laser beam collecting optical device includes:

a first lens which is arranged outside said extreme ultra violet light generation chamber and enlarges the laser beam generated by said driver laser;

a second lens which is arranged outside said extreme ultra violet light generation chamber and collimates the laser beam enlarged by said first lens; and

a third lens which is arranged outside said extreme ultra violet light generation chamber and collects the laser beam collimated by said second lens onto an orbit of the target material in said extreme ultra violet light generation chamber.

7. An extreme ultra violet light source apparatus according to claim 1 , wherein said laser beam collecting optical device includes:

(i) a first lens which is arranged outside said extreme ultra violet light generation chamber and enlarges the laser beam generated by said driver laser;

(ii) a second lens which is arranged outside said extreme ultra violet light generation chamber and collimates the laser beam enlarged by said first lens; and

(iii) a concave mirror which is arranged inside said extreme ultra violet light generation chamber and reflects the laser beam collimated by said second lens to collect the laser beam onto a path of the target material in said extreme ultra violet light generation chamber, and

wherein said purge gas supply unit is arranged to direct the purge gas at said concave mirror.

8. An extreme ultra violet light source apparatus according to claim 1 , wherein said laser beam collecting optical device includes:

(i) a first lens which is arranged outside said extreme ultra violet light generation chamber and enlarges the laser beam generated by said driver laser;

(ii) a second lens which is arranged outside said extreme ultra violet light generation chamber and collimates the laser beam enlarged by said first lens; and

(iii) a concave mirror which is arranged inside said extreme ultra violet light generation chamber and reflects the laser beam collimated by said second lens to collect the laser beam onto a path of the target material in said extreme ultra violet light generation chamber,

wherein said purge gas supply unit is arranged to direct the purge gas at said concave mirror, and

wherein an additional purge gas supply unit is arranged to direct purge gas at said surface of said window.

9. An extreme ultra violet light source apparatus which generates extreme ultra violet light by irradiating a target material with a laser beam and thereby turning said target material into plasma, said apparatus comprising:

an extreme ultra violet light generation chamber in which extreme ultra violet light is generated;

a target material supply unit which supplies a target material into said extreme ultra violet light generation chamber;

a driver laser which generates a laser beam;

a window which is provided in said extreme ultra violet light generation chamber and allows the laser beam to be transmitted into said extreme ultra violet light generation chamber;

a laser beam collecting optical device which collects the laser beam generated by said driver laser to a target material supplied into said extreme ultra violet light generation chamber so as to generate plasma;

an extreme ultra violet light collecting optical device which collects the extreme ultra violet light generated from said plasma to output the extreme ultra violet light;

a laser beam image forming optical device which forms an image of the laser beam collected by said laser beam collecting optical device;

a laser beam detector which obtains information about a position at which the image of the laser beam is formed by said laser beam image forming optical device; and

an adjusting mechanism which carries out alignment of said laser beam collecting optical device based on the information obtained by said laser beam detector.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 20, 2012
From: KOMATSU LTD.
To: GIGAPHOTON INC.
Reel/Frame 028601/0639 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 24, 2007
From: MORIYA, MASATO; ABE, TAMOTSU; SUGANUMA, TAKASHI; SOMEYA, HIROSHI; YABU, TAKAYUKI; SUMITANI, AKIRA
To: KOMATSU LTD.
Reel/Frame 019944/0043 →
Priority Claims (1)
JP 2006-263371 · Sep 27, 2006 · national
Continuity (1)
Related Publication 20080073598A1 · Mar 27, 2008