IP Library Granted Patent US 7,709,661
Granted Patent B2
US 7,709,661 · App. 11/872,193 · Granted May 4, 2010

Synthetic methodology for the reductive alkylation at the C-3 position of indoles

Assignee: Wyeth LLC
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Quick Facts
Patent No.
US 7,709,661
App. No.
11/872,193
Granted
May 4, 2010
Kind
B2
Abstract

A process for the reductive alkylation at the C-3 position of an indole compound in which the indole is treated with an aldehyde in the presence of a Lewis acid and a silicon hydride reducing agent. The process is useful for alkylating the C-3 position of indoles that contain acid-sensitive substituents at the N-1 position.

Claims (2)

1. A compound having the formula below:

made by a method for the reductive alkylation at the C-3 position of an indole, said method comprising treating the indole with an aldehyde in the presence of a silicon hydride reducing agent selected from the group consisting of tri(C 1 -C 4 alkyl)silane, triphenylsilane, diphenylsilane and phenylmethylsilane, and a Lewis acid selected from the group consisting of salts of boron, aluminum, antimony or a rare earth metal and a halogen or triflate anion, and pentafluorophenylmetallic acids in which the metal is boron, aluminum, antimony or a rare earth metal.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 11, 2013
From: WYETH LLC
To: ZIARCO INC.
Reel/Frame 030585/0151 →
CHANGE OF NAME Recorded Sep 27, 2012
From: WYETH
To: WYETH LLC
Reel/Frame 029045/0705 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 28, 2009
From: MICHALAK, RONALD S.; RAVEENDRANATH, PANOLIL
To: WYETH
Reel/Frame 023289/0449 →
Continuity (3)
Continuation 1101465700 · Dec 16, 2004
Provisional Application 6052979700 · Dec 16, 2003
Related Publication 20080161581A1 · Jul 3, 2008