Method for the production of a blank mold for optical fibers
In a known method for the production of a blank mold for optical fibers, a fluorine-doped SiO 2 enveloping glass is produced on a core glass cylinder that rotates about its longitudinal axis, wherein a silicon-containing starting substance is fed to a plasma burner, said substance is then oxidized in a plasma flame assigned to the plasma burner to obtain SiO 2 particles, the SiO 2 particles are deposited by layers on the enveloping surface of the cylinder of the core glass cylinder in the presence of fluorine and sintered into the enveloping glass. The invention aims at providing an economical method, which builds upon the above-mentioned method, in order to produce a blank mold from which optical multi-mode fibers ( 52 ) can be obtained. In comparison with fibers ( 51 ) produced according to standard methods, said optical multi-mode fibers are characterized by high initial transmission in the UV wavelength range and good resistance with respect to brief UV radiation, more particularly in the 210-300 nm wavelength range. According to the invention, a plasma flame that irradiates an ultraviolet light having a wavelength of 214 nm with an intensity of at least 0.9 ?W—determined on the basis of plasma flame intensity measurement—is used for the formation and deposition of the SiO 2 particles on the core glass.
1. A method for producing a preform for optical fibers, said method comprising: providing a core glass cylinder having a longitudinal axis, producing a fluorine-doped SiO 2 cladding glass on the core glass cylinder rotating about the longitudinal axis thereof, said producing including feeding a plasma burner with a silicon-containing starter substance, said starter substance being oxidized in a plasma flame of the plasma burner so as to obtain SiO 2 particles, and depositing the SiO 2 particles in layers on a cylindrical outer surface of the core glass cylinder in the presence of fluorine and sintering said SiO 2 particles deposited into the cladding glass, wherein said plasma flame emits ultraviolet light in one or more wavelengths of about 214 nm at an intensity of at least 0.9 μW, determined on the basis of a plasma flame intensity measurement, during the forming and depositing of the SiO 2 particles on the core glass cylinder.
2. The method according to claim 1 , wherein the plasma flame emits said ultraviolet light at an intensity ranging from 1.0 μW to 1.4 μW.
3. The method according to claim 1 , wherein the cylindrical outer surface of the core glass cylinder is kept at a surface temperature ranging from 1550° C. to 2000° C. during deposition of the SiO 2 particles, and wherein the core glass cylinder has an outer diameter of at least 40 mm.
4. The method according to claim 3 , wherein the cylindrical outer surface of the core glass cylinder is kept at a surface temperature ranging from 1700° C. to 1900° C. during deposition of the SiO 2 particles, and wherein the core glass cylinder has an outer diameter of at least 60 mm.
5. The method according to claim 1 , wherein the SiO 2 particles are deposited on the cylindrical outer surface in layers having a layer thickness such that optical fibers derived from the preform have optical fiber layers yielded by the layers of the deposited SiO 2 particles, and said optical fiber layers have respective layer thicknesses of not more than 0.05 μm in the optical fibers.
6. A method for producing a preform for optical fibers, said method comprising:
providing a core glass cylinder having a longitudinal axis; and
producing a fluorine-doped SiO 2 cladding glass on the core glass cylinder rotating about the longitudinal axis thereof;
said producing including
feeding a plasma burner with a silicon-containing starter substance, said starter substance being oxidized in a plasma flame of the plasma burner so as to obtain SiO 2 particles; and
depositing the SiO 2 particles in layers on a cylindrical outer surface of the core glass cylinder in the presence of fluorine; and
sintering said SiO 2 particles deposited into the cladding glass;
wherein, during the forming and depositing of the SiO 2 particles on the core glass cylinder, said plasma flame emits UV radiation having a wavelength of 214 nm at an intensity such that the UV radiation of the cylindrical outer surface of the core glass cylinder produces a damage layer in an area of contact between the core glass cylinder and the layers of SiO 2 particles applied to the cylindrical outer surface, said damage layer blocking the passage of the UV radiation therethrough so that the core glass cylinder is shielded thereby from damaging effects of further UV radiation as the SiO 2 particles are formed in the plasma flame and deposited.
7. The method according to claim 6 , wherein said UV radiation has an intensity of at least 0.9 μW, determined on the basis of a plasma flame intensity measurement, during the forming and depositing of the SiO 2 particles on the core glass cylinder.
8. The method according to claim 6 , wherein said UV radiation has an intensity ranging from 1.0 μW to 1.4 μW, determined on the basis of a plasma flame intensity measurement, during the forming and depositing of the SiO 2 particles on the core glass cylinder.
9. The method according to claim 6 , wherein the cylindrical outer surface of the core glass cylinder is kept at a surface temperature ranging from 1550° C. to 2000° C. during deposition of the SiO 2 particles, and wherein the core glass cylinder has an outer diameter of at least 40 mm.
10. The method according to claim 6 , wherein the cylindrical outer surface of the core glass cylinder is kept at a surface temperature ranging from 1700° C. to 1900° C. during deposition of the SiO 2 particles, and wherein the core glass cylinder has an outer diameter of at least 60 mm.
11. The method according to claim 6 , wherein the SiO 2 particles are deposited on the cylindrical outer surface in layers having a layer thickness such that optical fibers derived from the preform have optical fiber layers yielded by the layers of the deposited SiO 2 particles, and said optical fiber layers have respective layer thicknesses of not more than 0.05 μm in the optical fibers.