IP Library Granted Patent US 7,718,002
Granted Patent B2
US 7,718,002 · App. 12/042,964 · Granted May 18, 2010

Crystal manufacturing apparatus

Assignee: Ricoh Company, Ltd.
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Quick Facts
Patent No.
US 7,718,002
App. No.
12/042,964
Granted
May 18, 2010
Kind
B2
Abstract

A crystal manufacturing apparatus for manufacturing a group III nitride crystal includes a crucible that holds a mixed molten liquid including an alkali metal and a group III metal; a reaction vessel accommodating the crucible in the reaction vessel; a heating device that heats the crucible with the reaction vessel; a holding vessel having a lid that is capable of opening and closing, accommodating the reaction vessel and the heating device in the holding vessel; a sealed vessel accommodating the holding vessel in the sealed vessel, having an operating device that enables opening the lid of the holding vessel for supplying source materials into the crucible and taking out a manufactured GaN crystal under a sealed condition, and closing the lid of the holding vessel that is sealed in the sealed vessel, the sealed vessel including an inert gas atmosphere or a nitrogen atmosphere; and a gas supplying device for supplying a nitrogen gas to the mixed molten liquid through each of the vessels.

Claims (21)

1. A crystal manufacturing apparatus for manufacturing a group III nitride crystal, comprising:

a crucible that holds a mixed molten liquid including an alkali metal and a group III metal;

a reaction vessel accommodating the crucible in the reaction vessel;

a heating device that heats the crucible with the reaction vessel;

a holding vessel having a lid that is capable of opening and closing, accommodating the reaction vessel and the heating device in the holding vessel;

a sealed vessel accommodating the holding vessel in the sealed vessel, having an operating device that enables opening the lid of the holding vessel for supplying source materials into the crucible and taking out a manufactured group III nitride crystal under a sealed condition, and closing the lid of the holding vessel that is sealed in the sealed vessel, the sealed vessel including an inert gas atmosphere or a nitrogen atmosphere in the sealed vessel; and

a gas supplying device for supplying a nitrogen gas to the mixed molten liquid through each of the vessels.

2. A crystal manufacturing apparatus for manufacturing a group III nitride crystal, comprising:

a crucible that holds a mixed molten liquid that includes an alkali metal and a group III metal;

a reaction vessel accommodating the crucible in the reaction vessel;

a heating device that is positioned at a predetermined location relative to the crucible, and heats the crucible through the reaction vessel;

a sealed vessel accommodating the reaction vessel in the sealed vessel, having an operating device that enables opening a lid of the reaction vessel for supplying source materials into the crucible and taking out a manufactured group III nitride crystal under a sealed condition, and closing the lid of the reaction vessel that is sealed in the sealed vessel, the sealed vessel including an inert gas atmosphere or a nitrogen atmosphere in the sealed vessel;

a gas supplying device for supplying a nitrogen gas to the mixed molten liquid through each of the vessels; and

a transfer mechanism that allows for the sealed vessel to be transferred relative to the reaction vessel and the heating device, or the reaction vessel and the heating device to be transferred relative to the sealed vessel, wherein the relative position between the reaction vessel and the heating device is maintained, and the transfer mechanism provides for the reaction vessel in the sealed vessel to be positioned at a first position when crystal growth is performed, and the reaction vessel in the sealed vessel to be positioned at a second position which is different from the first position when the source materials are being supplied or the group III crystal is being taken out.

3. The crystal manufacturing apparatus according to claim 2 , further comprising:

a stage in the sealed vessel for loading the reaction vessel and the heating device, wherein the transfer mechanism provides for a position of the stage being changed relative to the sealed vessel during the transferring.

4. The crystal manufacturing apparatus according to claim 3 , wherein an inner space of the sealed vessel is separated into two inner spaces by the stage.

5. The crystal manufacturing apparatus according to claim 4 , further comprising a pressure control device for controlling the pressures in the two inner spaces to be equally balanced while the stage is being transferred.

6. The crystal manufacturing apparatus according to claims 1 , wherein the sealed vessel further comprises a source material storage chamber for storing the source materials and a crystal storage chamber for storing a manufactured group III nitride crystal.

7. The crystal manufacturing apparatus according to claim 6 , wherein the source material storage chamber further comprises a supplement mechanism that is capable of supplying source materials into the source material storage chamber from the outside of the sealed vessel without changing the atmosphere in the sealed vessel.

8. The crystal manufacturing apparatus according to claim 6 , further comprising a take-out mechanism that is capable of taking out a group III crystal stored in the crystal storage chamber to the outside of the sealed vessel without changing the atmosphere in the sealed vessel.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 18, 2020
From: SCIOCS COMPANY LIMITED
To: SUMITOMO CHEMICAL COMPANY, LIMITED
Reel/Frame 053526/0021 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 21, 2019
From: RICOH COMPANY, LTD.
To: SCIOCS COMPANY LIMITED
Reel/Frame 048391/0473 →
CORRECTIVE ASSIGNMENT TO CORRECT THE ADD SECOND INVENTOR PREVIOUSLY RECORDED ON REEL 020953 FRAME 0518. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNS THE ENTIRE RIGHT, TITLE AND INTEREST IN .... Recorded Jul 9, 2008
From: SARAYAMA, SEIJI; IWATA, HIROKAZU
To: RICOH COMPANY, LTD.
Reel/Frame 021210/0369 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 15, 2008
From: SARAYAMA, SEIJI
To: RICOH COMPANY, LTD.
Reel/Frame 020953/0518 →
Priority Claims (2)
JP 2007-056859 · Mar 7, 2007 · national
JP 2007-320289 · Dec 12, 2007 · national
Continuity (1)
Related Publication 20080216737A1 · Sep 11, 2008