Fabricating method for flat display device
A fabricating method of a flat panel display device can reduce manufacturing costs of the flat panel display device. A fabricating method of a flat panel display device includes providing a conductive nanopowder thin film material having a first conductive nanopowder and a second conductive nanopowder, spreading the conductive nanopowder thin film material over a substrate, forming a conductive thin film pattern by patterning the conductive nanopowder thin film material, and forming a conductive thin film by baking the conductive thin film pattern, wherein the first conductive nanopowder is located in a middle of the conductive thin film and the second conductive nanopowder is located in an outer part of the conductive thin film.
1. A fabricating method of a flat panel display device, comprising:
providing a conductive nanopowder thin film material, by dissolving a first conductive nanopowder including first conductive nanoparticles which have a first oxidation enthalpy and a second conductive nanopowder including second conductive nanoparticles which have a second oxidation enthalpy higher than the first oxidation enthalpy in a solvent, wherein the first conductive nanoparticles are higher in mass or volume than the second conductive nanoparticles, and wherein the second conductive nanopowder has stronger oxidation characteristics than the first conductive nanopowder, and wherein the first conductive nanopowder has a better conductivity than the second conductive nanopowder;
spreading the conductive nanopowder thin film material over a substrate;
forming a conductive thin film pattern by patterning the conductive nanopowder thin film material, including: aligning a soft mold, wherein the soft mold has a groove in an area where the conductive thin film pattern is to be formed on the substrate over which the conductive nanopowder thin film material is spread and wherein the soft mold has a projected part in other areas; and applying pressure to the soft mold such that the soft mold is in contact with the substrate, thereby causing the projected part of the soft mold to contact the substrate; and
forming a conductive thin film by baking the conductive thin film pattern, including vaporizing the solvent where the first conductive nanoparticles and the second conductive nanoparticles are dissolved, wherein the second conductive nanoparticles move to an outer part of the conductive thin film by a force that occurs as the solvent is vaporized,
wherein the first conductive nanopowder is located at a middle of the conductive thin film and the second conductive nanopowder is located in the outer part of the conductive thin film after forming the conductive thin film, and
wherein the first conductive nanopowder includes at least one of silver or copper and the second conductive nanopowder includes at least one of copper or chromium, and wherein the first conductive nanopowder includes a different element than the second conductive nanopowder.