Semiconductor substrate, method for manufacturing semiconductor substrate, semiconductor device, and electronic device
A single crystal semiconductor layer is formed over a substrate having an insulating surface by the following steps: forming an ion doped layer at a given depth from a surface of a single crystal semiconductor substrate; performing plasma treatment to the surface of the single crystal semiconductor substrate; forming an insulating layer on the single crystal semiconductor substrate to which the plasma treatment is performed; bonding the single crystal semiconductor substrate to the substrate having the insulating surface with an insulating layer interposed therebetween; and separating the single crystal semiconductor substrate using the ion doped layer as a separation surface. As a result, a semiconductor substrate in which a defect in an interface between the single crystal semiconductor layer and the insulating layer is reduced can be provided.
1. A method for manufacturing a semiconductor substrate comprising the steps of:
forming a damaged region at a given depth from a surface of a single crystal semiconductor substrate;
performing a plasma treatment to the surface of the single crystal semiconductor substrate after forming the damaged region;
forming an insulating layer over the surface of the single crystal semiconductor substrate to which the plasma treatment is performed;
bonding a second substrate having an insulating surface to the single crystal semiconductor substrate with at least the insulating layer interposed between the second substrate and the single crystal semiconductor substrate; and
performing a heat treatment to the single crystal semiconductor substrate to separate the single crystal semiconductor substrate in the damaged region and to form a single crystal semiconductor layer over the second substrate.
2. The method for manufacturing a semiconductor substrate according to claim 1 , wherein the insulating layer is formed by a chemical vapor deposition method using an organic silane gas.
3. The method for manufacturing a semiconductor substrate according to claim 1 further comprising the steps of:
forming a protective film over the surface of the single crystal semiconductor substrate before forming the damaged region; and
removing the protective film after forming the damaged region.
4. The method for manufacturing a semiconductor substrate according to claim 1 , wherein the plasma treatment is performed under conditions of an electron density of 1×10 11 cm −3 to 1×10 13 cm −3 and an electron temperature of 0.2 eV to 2.0 eV.
5. The method for manufacturing a semiconductor substrate according to claim 1 , wherein the plasma treatment is performed under a hydrogen atmosphere, an oxygen atmosphere, or a mixed atmosphere of hydrogen and oxygen.
6. A method for manufacturing a semiconductor substrate comprising the steps of:
forming a damaged region at a given depth from a surface of a single crystal semiconductor substrate;
performing a plasma treatment to the surface of the single crystal semiconductor substrate after forming the damaged region;
forming a first insulating layer over the surface of the single crystal semiconductor substrate to which the plasma treatment is performed;
forming a second insulating layer over and in contact with the first insulating layer;
bonding a second substrate having an insulating surface to the single crystal semiconductor substrate with at least the first insulating layer and the second insulating layer interposed between the second substrate and the single crystal semiconductor substrate; and
performing a heat treatment to the single crystal semiconductor substrate to separate the single crystal semiconductor substrate in the damaged region and to form a single crystal semiconductor layer over the second substrate.
7. The method for manufacturing a semiconductor substrate according to claim 6 , wherein the first insulating layer is formed to have a stacked-layer structure.
8. The method for manufacturing a semiconductor substrate according to claim 6 , wherein the first insulating layer is formed to have a stacked-layer structure of a silicon oxynitride layer and a silicon nitride oxide layer, and the silicon oxynitride layer is formed in contact with the single crystal semiconductor substrate.
9. The method for manufacturing a semiconductor substrate according to claim 6 , wherein the second insulating layer is formed by a chemical vapor deposition method using an organic silane gas.
10. The method for manufacturing a semiconductor substrate according to claim 6 further comprising the steps of:
forming a protective film over the surface of the single crystal semiconductor substrate before forming the damaged region; and
removing the protective film after forming the damaged region.
11. The method for manufacturing a semiconductor substrate according to claim 6 , wherein the plasma treatment is performed under conditions of an electron density of 1×10 11 cm −3 to 1×10 13 cm −3 and an electron temperature of 0.2 eV to 2.0 eV.
12. The method for manufacturing a semiconductor substrate according to claim 6 , wherein the plasma treatment is performed under a hydrogen atmosphere, an oxygen atmosphere, or a mixed atmosphere of hydrogen and oxygen.