IP Library › Granted Patent US 7,765,691
Granted Patent B2
US 7,765,691 · App. 11/320,922 · Granted Aug 3, 2010

Method and apparatus for a printed circuit board using laser assisted metallization and patterning of a substrate

Assignee: Intel Corporation
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Quick Facts
Patent No.
US 7,765,691
App. No.
11/320,922
Granted
Aug 3, 2010
Kind
B2
Abstract

A printed circuit is made by laser projection patterning a metal panel of a substrate, laminating a dielectric layer on the metal panel, laser irradiating the substrate to form vias in the substrate, laser activating a seed coat on the substrate, washing the seed coat from an unpatterned portion of the substrate, forming a patterned build-up layer on the substrate, and etching away a metal plating forming metal protrusions.

Claims (22)

1. A method comprising:

laser projection patterning a metal panel of a substrate;

laminating a dielectric layer on the metal panel;

laser irradiating the substrate to form a plurality of vias in the substrate;

laser activating a seed coat on the substrate to form activated seed coat portions and unactivated seed coat portions;

washing the unactivated seed coat portions from the substrate to yield a patterned build-up layer on the activated seed coat portions on the substrate; and

after washing the unactivated seed coat portions, forming a conductive layer on the activated seed coat portions.

2. The method of claim 1 , further comprising:

dip coating the substrate in a seeding solution to provide the seed coat.

3. The method of claim 1 , further comprising:

electrolytic plating a metal selectively on traces and the plurality of vias on the patterned build-up layer according to a predetermined interconnect pattern to yield interconnects, wherein a sacrificial copper plating is used to provide an electrical connection for the electrolytic plating.

4. The method of claim 3 , further comprising:

electrolytic metal plating the traces.

5. The method of claim 3 , further comprising:

palladium dry film resist lamination; and

dry film resist stripping the substrate.

6. The method of claim 1 , further comprising:

performing laser assisted metallization before the washing the seed coat, and

providing a patterned conductive layer on the patterned-build-up-layer-substrate combination according to the predetermined interconnect pattern by electrolessly plating the patterned-build-up-layer-substrate combination to yield an electrolessly plated substrate.

7. The method of claim 1 , wherein the seed coat comprises palladium acetate.

8. The method of claim 1 , wherein the build-up layer comprises a palladium seeded organic build-up layer.

9. The method of claim 1 , wherein laser projection patterning further comprises drilling a plurality of micro vias.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 28, 2005
From: SALAMA, ISIAM A.
To: INTEL CORPORATION
Reel/Frame 018504/0704 →
Continuity (1)
Related Publication 20070144769A1 · Jun 28, 2007