Method of manufacturing substrate
A method of manufacturing a substrate, includes: (a) forming the through hole by etching the silicon substrate from a first surface of the silicon substrate by a Bosch process; (b) forming a thermal oxide film such that the thermal oxide film covers the first surface of the silicon substrate, a second surface of the silicon substrate opposite to the first surface, and a surface of the silicon substrate corresponding to a side surface of the through hole, by thermally oxidizing the silicon substrate where the through hole is formed; (c) removing the thermal oxide film; (d) forming an insulating film such that the insulating film covers the first and second surfaces of the silicon substrate and the surface of the silicon substrate corresponding to the side surface of the through hole; and (e) forming the through electrode in the through hole on which the insulating film is formed.
1. A method of manufacturing a substrate that includes a silicon substrate, a through hole formed in the silicon substrate, and a through electrode formed in the through hole and being insulated from the silicon substrate, the method comprising:
(a) forming the through hole by etching the silicon substrate from a first surface of the silicon substrate by a Bosch process;
(b) forming a thermal oxide film such that the thermal oxide film covers the first surface of the silicon substrate, a second surface of the silicon substrate opposite to the first surface, and a surface of the silicon substrate corresponding to a side surface of the through hole, by thermally oxidizing the silicon substrate where the through hole is formed;
(c) removing the thermal oxide film;
(d) forming an insulating film such that the insulating film covers the first and second surfaces of the silicon substrate and the surface of the silicon substrate corresponding to the side surface of the through hole; and
(e) forming the through electrode in the through hole on which the insulating film is formed.
2. The method according to claim 1 , further comprising:
(f) removing a notch by grinding a portion of the silicon substrate where the notch is formed, from the second surface side, if the notch is formed at the end of the through hole positioned on the second surface side of the silicon substrate in step (a).
3. The method according to claim 2 , wherein step (f) is performed before step (b).
4. The method according to claim 2 , wherein step (f) is performed after step (b).
5. The method according to claim 1 , wherein the thermal oxide film is removed by wet etching in step (c).
6. The method according to claim 1 , further comprising:
(g) forming a wiring connected to the through electrode, on the insulating film formed on the second surface of the silicon substrate.
7. A method of manufacturing a substrate that includes a silicon substrate, a through hole formed in the silicon substrate, and a through electrode formed in the through hole and being insulated from the silicon substrate, the method comprising:
(a) forming a hole by etching the silicon substrate from a first surface of the silicon substrate by a Bosch process;
(b) grinding the silicon substrate from a second surface of the silicon substrate opposite to the first surface such that the hole is the through hole passing through the silicon substrate;
(c) forming a thermal oxide film such that the thermal oxide film covers the first surface of the silicon substrate, the second surface of the silicon substrate and a surface of the silicon substrate corresponding to a side surface of the through hole, by thermally oxidizing the silicon substrate where the through hole is formed;
(d) removing the thermal oxide film;
(e) forming an insulating film such that the insulating film covers the first and second surfaces of the silicon substrate and the surface of the silicon substrate corresponding to the side surface of the through hole; and
(f) forming the through electrode in the through hole on which the insulating film is formed.
8. A method of manufacturing a substrate that includes a silicon substrate, a through hole formed in the silicon substrate, and a through electrode formed in the through hole and being insulated from the silicon substrate, the method comprising:
(a) forming a hole by etching the silicon substrate from a first surface of the silicon substrate by a Bosch process;
(b) forming a thermal oxide film such that the thermal oxide film covers the first surface of the silicon substrate, a second surface of the silicon substrate opposite to the first surface, and surfaces of the silicon substrate corresponding to a side surface and a bottom surface of the hole, by thermally oxidizing the silicon substrate where the hole is formed;
(c) grinding the silicon substrate from the second surface such that the hole is the through hole passing through the silicon substrate;
(d) removing the thermal oxide film;
(e) forming an insulating film such that the insulating film covers the first and second surfaces of the silicon substrate and a surface of the silicon substrate corresponding to a side surface of the through hole; and
(f) forming the through electrode in the through hole on which the insulating film is formed.
9. The method according to claim 7 , wherein the thermal oxide film is removed by wet etching in step (d).
10. The method according to claim 7 , further comprising:
(g) forming a wiring connected to the through electrode, on the insulating film formed on the second surface of the silicon substrate.
11. The method according to claim 8 , wherein the thermal oxide film is removed by wet etching in step (d).
12. The method according to claim 8 , further comprising:
(g) forming a wiring connected to the through electrode, on the insulating film formed on the second surface of the silicon substrate.