Method for fabricating liquid crystal display device
A thin film transistor including: an active layer on a substrate, the active layer having at least two unit channels; and source and drain electrodes on the active layer, wherein an interval D between each of the channels is larger than a unit channel width W.
1. A method for fabricating a liquid crystal display device comprising:
forming a liquid crystal display panel; and
forming a liquid crystal driving device including first and second multi-channel thin film transistors respectively having an interval D between unit channels, a unit channel width W, and a unit channel length L,
wherein a W/L ratio of the first multi-channel thin film transistor is larger than a W/L ratio of the second multi-channel thin film transistor and the interval between the unit channels of the first multi-channel thin film transistor is larger than the interval between the unit channels of the second multi-channel thin film transistor.
2. The method of claim 1 , wherein forming a liquid crystal display panel includes:
forming an active layer on a substrate, the active layer having at least two unit channels; and
forming source and drain electrodes on the active layer.
3. The method of claim 1 , wherein 0.5 μm≦W≦1000 μm and 0.5 μm≦D≦500 μm.
4. The method of claim 1 , wherein 0.5 μm≦W≦500 μm and 0.5 μm≦D≦250 μm.
5. The method of claim 1 , wherein 0.25 μm≦W≦500 μm and 1 μm≦D≦1000 μm.
6. The method of claim 1 , wherein the number of the unit channel of the first multi-channel thin film transistor is more than the number of the unit channel of the second multi-channel thin film transistor.