Extreme ultra violet light source apparatus
View Patent ↗An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained uses a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.
1. A laser produced plasma type extreme ultra violet light source apparatus for generating extreme ultra violet light by applying a laser beam to a target, said apparatus comprising:
a chamber in which extreme ultra violet light is generated;
a target supply unit which supplies a liquid or solid metal target to a predetermined position within said chamber;
a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate one of a single pulse laser beam and a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by said target supply unit to generate plasma; and
a collector mirror which collects the extreme ultra violet light radiated from said plasma and outputs the extreme ultra violet light,
wherein said laser beam generating unit includes a plurality of oscillation and amplification laser arrangements which respectively generate pulse laser beams having delays different from one another, and each of said oscillation and amplification laser arrangements has an oscillation laser device which outputs a pulse laser beam and an amplification device including at least one amplifier which amplifies the pulse laser beam outputted from said oscillation laser device.
2. The extreme ultra violet light source apparatus according to claim 1 , wherein said laser beam generating unit further includes beam synthesizing means for synthesizing the pulse laser beams respectively outputted from said oscillation and amplification laser arrangements.
3. The extreme ultra violet light source apparatus according to claim 1 , wherein the pulse laser beams respectively outputted from said oscillation and amplification laser arrangements are synthesized in a plasma generation position.
4. The extreme ultra violet light source apparatus according to claim 1 , wherein said laser beam generating unit further includes a beam synthesizer which synthesizes the pulse laser beams respectively outputted from said oscillation and amplification laser arrangements.
5. A laser produced plasma type extreme ultra violet light source apparatus for generating extreme ultra violet light by applying a laser beam to a target, said apparatus comprising:
a chamber in which extreme ultra violet light is generated;
a target supply unit which supplies a liquid or solid metal target to a predetermined position within said chamber;
a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate one of a single pulse laser beam and a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by said target supply unit to generate plasma; and
a collector mirror which collects the extreme ultra violet light radiated from said plasma and outputs the extreme ultra violet light,
wherein said laser beam generating unit includes an oscillation laser device which outputs a pulse laser beam, beam dividing means which divides the pulse laser beam outputted from said oscillation laser device into plural optical paths, and plural amplification devices which respectively amplify the divided pulse laser beams.
6. The extreme ultra violet light source apparatus according to claim 5 , wherein said laser beam generating unit further includes beam synthesizing means for synthesizing the pulse laser beams respectively outputted from said plural amplification devices.
7. The extreme ultra violet light source apparatus according to claim 5 , wherein the pulse laser beams respectively outputted from said plural amplification devices are synthesized in a plasma generation position.
8. The extreme ultra violet light source apparatus according to claim 5 , wherein said laser beam generating unit further includes a beam synthesizer which synthesizes the pulse laser beams respectively outputted from said plural amplification devices.
9. A laser produced plasma type extreme ultra violet light source apparatus for generating extreme ultra violet light by applying a laser beam to a target, said apparatus comprising:
a chamber in which extreme ultra violet light is generated;
a target supply unit which supplies a liquid or solid metal target to a predetermined position within said chamber;
a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate one of a single pulse laser beam and a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by said target supply unit to generate plasma; and
a collector mirror which collects the extreme ultra violet light radiated from said plasma and outputs the extreme ultra violet light,
wherein said laser beam generating unit includes plural oscillation laser devices which respectively output pulse laser beams having delays different from one another, beam synthesizing means for synthesizing the pulse laser beams respectively outputted from said plural oscillation laser devices, and an amplification device including at least one amplifier which amplifies one of a single pulse laser beam and a pulse train laser beam outputted from said beam synthesizing means.
10. The extreme ultra violet light source apparatus according to claim 9 , wherein said plural oscillation laser devices respectively output pulse laser beams having delays different from one another and intensity increasing with time, and said at least one amplifier amplifies said one of the single pulse laser beam and the pulse train laser beam outputted from said beam synthesizing means with an amplification factor decreasing with time.
11. A laser produced plasma type extreme ultra violet light source apparatus for generating extreme ultra violet light by applying a laser beam to a target, said apparatus comprising:
a chamber in which extreme ultra violet light is generated;
a target supply unit which supplies a liquid or solid metal target to a predetermined position within said chamber;
a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate one of a single pulse laser beam and a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by said target supply unit to generate plasma; and
a collector mirror which collects the extreme ultra violet light radiated from said plasma and outputs the extreme ultra violet light,
wherein said laser beam generating unit includes an oscillation laser device which outputs a pulse laser beam, beam dividing means for dividing the pulse laser beam outputted from said oscillation laser device into plural optical paths, beam synthesizing means for synthesizing the pulse laser beams having delays different from one another depending on the respective optical paths, and an amplification device including at least one amplifier which amplifies one of a single pulse laser beam and a pulse train laser beam outputted from said beam synthesizing means.
12. The extreme ultra violet light source apparatus according to claim 11 , wherein said beam dividing means divides the pulse laser beam outputted from said oscillation laser device into pulse laser beams such that the pulse laser beams have delays different from one another and intensity increasing with time at said beam synthesizing means, and said at least one amplifier amplifies said one of the single pulse laser beam and the pulse train laser beam outputted from said beam synthesizing means with an amplification factor decreasing with time.