Shower head and film-forming device using the same
The present invention relates to a showerhead that supplies a source gas and a supporting gas for depositing a film into a processing vessel of a film deposition apparatus. The showerhead includes a body which is provided with a gas jetting surface ( 8 ). In the showerhead body, there are defined a first diffusion chamber ( 60 ) that receives the source gas and diffuses the same, and a second diffusion chamber ( 62 ) that receives the supporting gas and diffuses the same. The gas jetting surface has source-gas jetting orifices ( 10 A) that are in communication with the first diffusion chamber, and first supporting-gas jetting orifices ( 10 B) that are in communication with the second diffusion chamber. Each of the first supporting-gas jetting orifices ( 10 B) are formed into a ring shape that adjacently surrounds a corresponding one of the source-gas jetting orifices ( 10 A).
1. A showerhead that supplies a source gas and a supporting gas into a vacuum atmosphere in a processing vessel, so as to deposit a film on a surface of an object to be processed in the processing vessel, comprising:
a showerhead body provided with a gas jetting surface facing an inside of the processing vessel;
a first diffusion chamber formed in the showerhead body to receive the source gas and diffuse the same;
a second diffusion chamber formed in the showerhead body to receive the supporting gas and diffuse the same;
a plurality of source-gas jetting orifices formed in the gas jetting surface to be communicated with the first diffusion chamber;
a plurality of first supporting-gas jetting orifices formed in the gas jetting surface to be communicated with the second diffusion chamber; and
a plurality of second supporting-gas jetting orifices formed in the gas jetting surface to be communicated with the second diffusion chamber,
wherein each of the first supporting-gas jetting orifices has a ring shape that adjacently surrounds a corresponding one of the source-gas jetting orifices, and each of the source-gas jetting orifices is positioned inside the ring of the first supporting-gas jetting orifice, and
each of the second supporting-gas jetting orifices is arranged between adjacent two of the source-gas jetting orifices.
2. The showerhead according to claim 1 , wherein the source gas contains a high melting point metal.
3. The showerhead according to claim 2 , wherein the source gas is an organic metal material gas.
4. A showerhead that supplies a source gas and a supporting gas into a vacuum atmosphere in a processing vessel, so as to deposit a film on a surface of an object to be processed in the processing vessel, comprising:
a showerhead body provided with a gas jetting surface facing an inside of the processing vessel;
a first diffusion chamber formed in the showerhead body to receive the source gas and diffuse the same;
a second diffusion chamber formed in the showerhead body to receive the supporting gas and diffuse the same;
a plurality of source-gas jetting orifices formed in the gas jetting surface to be communicated with the first diffusion chamber; and
a plurality of first supporting-gas jetting orifices formed in the gas jetting surface to be communicated with the second diffusion chamber, and
a plurality of second supporting-gas jetting orifices formed in the gas jetting surface to be communicated with the second diffusion chamber;
wherein each of the source-gas jetting orifices is adjacently surrounded by at least four of the first supporting-gas jetting orifices so that the at least four of the first supporting-gas jetting orifices are arranged around the corresponding source-gas jetting orifice at equally spaced intervals about the corresponding source-gas jetting orifice,
a combination of the corresponding source-gas jetting orifice and the at least four of the first supporting-gas jetting orifices forms a jetting orifice unit, and
each of the second supporting-gas jetting orifices is arranged between adjacent two of the jetting orifice units.
5. The showerhead according to claim 4 , wherein the source gas contains a high melting point metal.
6. The showerhead according to claim 5 , wherein the source gas is an organic metal material gas.
7. A film deposition apparatus that deposits a film on a surface of an object to be processed, by using a source gas and a supporting gas, comprising:
a processing vessel;
an evacuation system that evacuates an inside of the processing vessel to form therein a vacuum;
a table provided in the processing vessel to dispose thereon the object;
a heater that heats the object disposed on the table; and
a showerhead provided on a top part of the processing vessel; the showerhead including:
a showerhead body provided with a gas jetting surface facing an inside of the processing vessel;
a first diffusion chamber formed in the showerhead body to receive the source gas and diffuse the same;
a second diffusion chamber formed in the showerhead body to receive the supporting gas and diffuse the same;
a plurality of source-gas jetting orifices formed in the gas jetting surface to be communicated with the first diffusion chamber;
a plurality of first supporting-gas jetting orifices formed in the gas jetting surface to be communicated with the second diffusion chamber; and
a plurality of second supporting-gas jetting orifices formed in the gas jetting surface to be communicated with the second diffusion chamber,
wherein each of the first supporting-gas jetting orifices has a ring shape that adjacently surrounds a corresponding one of the source-gas jetting orifices, and each of the source-gas jetting orifices is positioned inside the ring of the first supporting-gas jetting orifice, and
each of the second supporting-gas jetting orifices is arranged between adjacent two of the source-gas jetting orifices.
8. A film deposition apparatus that deposits a film on a surface of an object to be processed, by using a source gas and a supporting gas, comprising:
a processing vessel;
an evacuation system that evacuates an inside of the processing vessel to form therein a vacuum;
a table provided in the processing vessel to dispose thereon the object;
a heater that heats the object disposed on the table; and
a showerhead provided on a top part of the processing vessel; the showerhead including:
a showerhead body provided with a gas jetting surface facing an inside of the processing vessel;
a first diffusion chamber formed in the showerhead body to receive the source gas and diffuse the same;
a second diffusion chamber formed in the showerhead body to receive the supporting gas and diffuse the same;
a plurality of source-gas jetting orifices formed in the gas jetting surface to be communicated with the first diffusion chamber; and
a plurality of first supporting-gas jetting orifices formed in the gas jetting surface to be communicated with the second diffusion chamber, and
a plurality of second supporting-gas jetting orifices formed in the gas jetting surface to be communicated with the second diffusion chamber;
wherein each of the source-gas jetting orifices is adjacently surrounded by at least four of the first supporting-gas jetting orifices so that the at least four of the first supporting-gas jetting orifices are arranged around the corresponding source-gas jetting orifice at equally spaced intervals about the corresponding source-gas jetting orifice,
a combination of the corresponding source-gas jetting orifice and the at least four of the first supporting-gas jetting orifices forms a jetting orifice unit, and
each of the second supporting-gas jetting orifices is arranged between adjacent two of the jetting orifice units.