Method for measuring flow rates in liquid melts
View Patent ↗The invention relates to a method for measuring flow rates in liquid melts in a temperature range above 200 DEG C. using an ultrasonic generator and to an associated ultrasonic waveguide according to the ultrasonic Doppler method. The aim of the invention is to provide good signal incoupling and outcoupling. This is achieved by the preparation of the wettability of the end face of the ultrasonic waveguide before the measuring operation, subsequent direct incoupling of ultrasonic measuring signals into the melt at an angle that is not equal to 90 DEG, achieved by the immersion of the end face of the ultrasonic waveguide into the melt, outcoupling of the ultrasonic signals reflected in the melt via the end face of the ultrasonic waveguide and routing of said signals to an evaluation circuit. To prepare the wettability of the end face, the latter is mechanically and chemically cleaned and subsequently coated with a suitable material.
1. A method for measuring the local flow rate in liquid melts in a temperature range above 200° C. using an ultrasound generator and an associated low-dispersion ultrasonic waveguide based on the ultrasonic Doppler method, characterized by
producing the wettability of the end face of the low-dispersion ultrasonic waveguide before the measuring operation,
directly injecting ultrasonic measurement signals into the melt at an angle which is different from 90° by immersing at least the end face of the low-dispersion ultrasonic waveguide in the melt, and
outputting the ultrasonic signals reflected in the melt via the end face of the low-dispersion ultrasonic waveguide and forwarding said signals to an evaluation circuit.
2. The method as claimed in claim 1 , characterized in that at least the low-dispersion ultrasonic waveguide is cooled during the measuring operation.
3. The method as claimed in claim 1 , characterized in that that end face of the low-dispersion ultrasonic waveguide which faces the melt is mechanically and/or chemically freed of dirt and oxides before being immersed in the melt.
4. The method as claimed in claim 3 , characterized in that the end face is cleaned by means of organic acids.
5. The method as claimed in claim 1 , characterized in that the end face of the low-dispersion ultrasonic waveguide is provided with a smooth protective layer.
6. The method as claimed in claim 5 , characterized in that the smooth protective layer is applied in the form of a film or cover plate.
7. The method as claimed in claim 1 , characterized in that that end face of the low-dispersion ultrasonic transducer which faces the melt is protected from re-oxidation by applying a protective layer in the meantime.
8. The method as claimed in claim 7 , characterized in that a protective layer made of a material corresponding to the melt to be measured is applied to the end face of the low-dispersion ultrasonic transducer.
9. The method as claimed in claim 7 , characterized in that a metal protective layer is applied to the end face.
10. The method as claimed in claim 5 , characterized in that the protective layer is dissolved in the melt at the beginning of or during the measuring operation.
11. The method as claimed in claim 5 , characterized in that the protective layer is applied by means of ion implantation or electrochemical or physical methods.