IP Library › Granted Patent US 7,955,432
Granted Patent B2
US 7,955,432 · App. 11/523,567 · Granted Jun 7, 2011

Phase modulation device, phase modulation device fabrication method, crystallization apparatus, and crystallization method

Assignee: Advanced LCD Technologies Development Center Co., Ltd.
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Quick Facts
Patent No.
US 7,955,432
App. No.
11/523,567
Granted
Jun 7, 2011
Kind
B2
Abstract

A phase shifter which modulates the phase of incident light has a light-transmitting substrate such as a glass substrate, and a phase modulator such as a concavity and convexity pattern which is formed on the laser beam incident surface of the light-transmitting substrate and modules the phase of incident light. A light-shielding portion which shields light in the peripheral portion where the optical intensity distribution decreases of the phase modulator is formed on the laser beam incident surface or exit surface of the phase shifter, thereby shielding the peripheral light in the irradiation surface of the incident laser beam.

Claims (7)

1. A crystallization method in which a laser beam from a laser source irradiates a substrate to be processed on a suscepter via a homogenizing optical system, a phase modulation device, and an image formation optical lens system, thereby crystallizing an irradiated surface, comprising:

forming a laser beam by shielding low-optical-intensity peripheral light of the laser beam on an exit surface of the homogenizing optical system by means of a light-shielding portion provided on the phase modulation device, in an optical path between the exit surface of the homogenizing optical system and an incident surface of the image formation optical lens system.

2. A crystallization method in which a laser beam from a laser source irradiates a substrate to be processed on a suscepter via a homogenizing optical system, a phase modulation device, and an image formation optical lens system, thereby crystallizing an irradiated surface, comprising:

forming a laser beam by shielding low-optical-intensity peripheral light of the laser beam on an exit surface of the homogenizing optical system by means of a light-shielding portion, in an optical path between the exit surface of the homogenizing optical system and an incident surface of the image formation optical lens system,

wherein the laser beam which has passed through the phase modulation device and the light-shielding portion has an optical intensity having a triangular section and being substantially the same at each end of the laser beam.

3. The crystallization method of claim 2 , wherein the optical intensity of the each end of the laser beam is a maximum value of an optical intensity distribution of the triangular section.

4. The crystallization method of claim 2 , wherein the optical intensity of the each end of the laser beam is a minimum value of an optical intensity distribution of the triangular section.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 6, 2011
From: ADVANCED LCD TECHNOLOGIES DEVELOPMENT CENTER CO., LTD.
To: SHARP KABUSHIKI KAISHA
Reel/Frame 026858/0705 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 20, 2006
From: OGAWA, HIROYUKI; HIRAMATSU, MASATO
To: ADVANCED LCD TECHNOLOGIES DEVELOPMENT CENTER CO., LTD.
Reel/Frame 018324/0377 →
Priority Claims (1)
JP 2005-275867 · Sep 22, 2005 · national
Continuity (1)
Related Publication 20070063184A1 · Mar 22, 2007