IP Library › Granted Patent US 7,980,119
Granted Patent B2
US 7,980,119 · App. 11/942,516 · Granted Jul 19, 2011

Auto-sampler cleaning mechanism

Assignee: Shimadzu Corporation
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Quick Facts
Patent No.
US 7,980,119
App. No.
11/942,516
Granted
Jul 19, 2011
Kind
B2
Abstract

An auto-sampler cleaning mechanism is provided, which is capable of maintaining the supply of a liquid in a non-time-consuming manner when a cleaning solution is supplied. The auto-sampler cleaning mechanism of the present invention includes: a sample-metering sample loop 14 having a sample-injecting needle 15 at a front end thereof, a metering pump 24 , a multi-ported valve 11 a , a multi-position valve 11 b , and a liquid-supply valve 11 c . A diaphragm pump 25 is disposed between the port of the multi-position valve 11 a and the port of the liquid-supply valve 11 b , and used to supply a cleaning solution 26 or a mobile phase 20 to the sample loop 14.

Claims (12)

1. A cleaning method with an auto-sampler cleaning mechanism, the auto-sampler cleaning mechanism at least comprising:

a sample-metering sample loop, having a sample-injecting needle at a front end thereof;

a multi-ported valve;

a multi-position valve;

a liquid-supply valve;

a diaphragm pump; and

a pressure sensor and a control portion connected to the diaphragm pump for controlling the liquid supply of the diaphragm pump,

the cleaning method comprising:

connecting the sample-metering sample loop, the multi-ported valve, the multi-position valve, the diaphragm pump and the liquid-supply valve, so that a cleaning solution can be flowed through the liquid-supply valve, the diaphragm pump, the multi-position valve and the multi-ported valve to the sample-metering sample loop, and

pumping the cleaning solution to the sample-metering sample loop by the diaphragm pump, wherein the control portion stops the liquid supply when a voltage applied to the diaphragm pump is raised but the pressure of the pressure sensor is not increased, or stops the liquid supply when a voltage applied to the diaphragm pump is dropped but the pressure is not reduced.

2. The cleaning method as claimed in claim 1 , wherein the liquid-supply valve has a plurality of ports for supplying different cleaning solutions.

3. The cleaning method as claimed in claim 1 , wherein the control portion monitors the pressure applied to the flow path and maintains the pressure within such a range that the diaphragm pump is capable of supplying the liquid, so that the liquid is maintained to be continuously supplied.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 19, 2007
From: MAEDA, YOSHIAKI; TATSUMI, NOBUYUKI
To: SHIMADZU CORPORATION
Reel/Frame 020141/0373 →
Priority Claims (1)
JP 2006-328979 · Dec 6, 2006 · national
Continuity (1)
Related Publication 20080134804A1 · Jun 12, 2008