Extended pad life for ECMP and barrier removal
A method and apparatus for extending a polishing article lifetime on a polishing tool with multiple platens is described. The apparatus includes an advanceable roll to roll platen with multiple embodiments of a polishing article to be used thereon. The polishing article is adapted to perform a polishing process by removing conductive and dielectric material from a substrate while minimizing downtime of the polishing tool. In some embodiments, the polishing article may be a dielectric material or a conductive material and is configured to include a longer usable lifetime to minimize replacement and downtime of the tool.
1. A polishing article for a roll to roll polishing system, comprising:
a linear strip wound on a supply roll, the linear strip comprising a first conductive layer disposed on a second conductive layer with a dielectric layer therebetween, wherein the first conductive layer comprises a metal foam, a metal mesh, metal fibers, a metal/polymer composite, or combinations thereof.
2. The article of claim 1 , wherein the first conductive layer and the dielectric layer include a plurality of perforations formed therein that are substantially aligned.
3. The article of claim 1 , wherein the first conductive layer comprises a plurality of grooves formed therein.
4. The article of claim 3 , wherein the dielectric layer comprises a plurality of grooves.
5. The article of claim 3 , wherein the first conductive layer includes a plurality of perforations disposed between the plurality of grooves.
6. The article of claim 1 , wherein the first conductive layer and the second conductive layer are bound to the dielectric layer by an adhesive.
7. The article of claim 1 , wherein the first conductive layer comprises tin, copper, or a combination thereof.
8. The article of claim 1 , wherein the second conductive layer comprises stainless steel or a copper material.
9. The article of claim 1 , wherein the second conductive layer comprises a copper material in the form of a mesh.
10. A polishing article for a roll to roll polishing system, comprising:
a plurality of conductive strips disposed on an insulating layer, the insulating layer disposed on a conductive base layer, wherein the conductive strips comprise a metal foam.
11. The article of claim 10 , wherein the conductive strips are separated by a plurality of grooves.
12. The article of claim 10 , wherein the polishing article includes a plurality of perforations formed through the conductive strips and the insulating layer.
13. The article of claim 10 , wherein the metal foam comprises a tin material, a copper material, or combinations thereof.
14. The article of claim 10 , wherein the conductive base layer comprises stainless steel.
15. A replacement supply roll for an electrochemical mechanical polishing process, comprising:
a shaft having a polishing article wound thereon, the polishing article comprising:
a linear strip having a first conductive layer disposed on a second conductive layer with a dielectric layer therebetween.
16. The supply roll of claim 15 , wherein the first conductive layer and the dielectric layer include a plurality of perforations formed therein that are substantially aligned.
17. The supply roll of claim 15 , wherein the first conductive layer comprises a plurality of strips separated by a plurality of grooves.
18. The supply roll of claim 15 , wherein the first conductive layer and the second conductive layer are bound to the dielectric layer by an adhesive.
19. The supply roll of claim 15 , wherein the first conductive layer comprises a foam made of a tin material, a copper material, or combinations thereof.
20. The supply roll of claim 15 , wherein the second conductive layer comprises stainless steel or a copper material.