Electron beam apparatus
View Patent ↗An electron beam emitted from an electron gun (G) forms a reduced image on a sample (S) through a non-dispersion Wien-filter ( 5 - 1 ), an electromagnetic deflector ( 11 - 1 ), a beam separator ( 12 - 1 ), and a tablet lens ( 17 - 1 ) as an objective lens. The beam separator ( 12 - 1 ) is configured such that a distance by which a secondary electron beam passes through the beam separator is approximately three times longer than a distance by which a primary electron beam passes through the beam separator. Therefore, even if a magnetic field in the beam separator is set to deflect the primary electron beam by a small angle equal to or less than approximately 10 degrees, the secondary electron beam can be deflected by approximately 30 degrees, so that the primary and secondary electron beams are sufficiently separated. Also, since the primary electron beam is deflected by a small angle, less aberration occurs in the primary electron beam. Accordingly, since a light path length of a primary electro-optical system, it is possible to reduce the influence of space charge and the occurrence of deflection aberration.
1. An electron beam apparatus comprising:
an electron gun for emitting a primary electron beam;
an electromagnetic deflector for deflecting the primary electron beam;
a beam separator for separating the primary beam and secondary electrons emitted from a sample when the sample is irradiated with the primary electron beam; and
a detector for detecting a secondary electron beam,
wherein the beam separator is configured such that a distance by which the secondary electron beam runs through the beam separator is three times longer than a distance by which the primary electron beam runs through the beam separator.
2. An electron beam apparatus according to claim 1 , wherein the electromagnetic deflector is configured such that the primary electron beam is deflected in a direction opposite to a deflection direction in which the beam separator deflects the primary electron beam, and deflection chromatic aberration occurring in the primary electron beam due to the deflection of the electromagnetic deflector is equal to the absolute value of deflection chromatic aberration occurring in the primary electron beam due to the deflection of the beam separator.
3. An electron beam apparatus according to claim 1 , wherein the beam separator comprises ferromagnetic material bodies and exciting coils wound around the ferromagnetic material bodies, respectively, and each of the bodies has two magnetic pole surfaces which are magnetically connected to the magnetic surfaces of another body.
4. An electron beam apparatus according to claim 1 , wherein the beam separator is adapted to deflect the primary electron beam by a first angle to direct the primary electron beam onto the sample at a second angle which is inclined from a normal of the sample surface, and deflect the second electrons by a third angle which is equal to zero, by rendering a length of an optical path in the beam separator through which the secondary electrons passes, substantially zero.