IP Library Granted Patent US 8,089,998
Granted Patent B2
US 8,089,998 · App. 12/471,844 · Granted Jan 3, 2012

Ultra-short pulse laser system and method for producing femtosecond or picosecond pulses

Assignee: High Q Technologies GmbH
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Quick Facts
Patent No.
US 8,089,998
App. No.
12/471,844
Granted
Jan 3, 2012
Kind
B2
Abstract

An ultra-short pulse laser system comprising an amplifying laser medium for producing a laser emission, a laser resonator having at least one resonator mirror and a pump source has a gas-filled section with a filling gas, the latter consisting of a single gas or a filling gas mixture differing from the composition of air, whose nonlinear refractive index n 2 substantially corresponds to that of air and which has a rotational Raman effect which is smaller in comparison with air.

Claims (29)

1. An ultra-short pulse laser system for producing femtosecond or picosecond pulses, comprising at least

an amplifying laser medium for producing a laser emission,

a laser resonator having at least one resonator mirror and at least one gas-filled section and

a pump source, in particular a laser diode source, for pumping the laser medium, in particular having a pulse energy of at least 1 microjoule within the laser resonator and/or a repetition rate below 50 MHz,

wherein the gas-filled section is filled with a filling gas comprising a single gas or a filling gas mixture differing from the composition of air,

the nonlinear refractive index n 2 of the gas-filled section substantially corresponding to that of air and

the filling gas having a rotational Raman effect which is smaller in comparison with air.

2. The ultra-short pulse laser system as claimed in claim 1 , wherein the filling gas comprises at least 20 percent by volume, of a gas which has no rotational Raman bands.

3. The ultra-short pulse laser system as claimed in claim 2 , wherein the filling gas has no vibrational Raman bands.

4. The ultra-short pulse laser system as claimed in claim 1 , wherein the filling gas is composed exclusively of gases having an atomic or molecular weight equal to or greater than twenty times the atomic mass unit.

5. The ultra-short pulse laser system as claimed in claim 1 , wherein the filling gas comprises argon, xenon, krypton, methane, carbon tetrachloride or sulfur hexafluoride.

6. The ultra-short pulse laser system as claimed in claim 1 , wherein more than half of the molecules of the filling gas have the property of a spherical gyroscope.

7. The ultra-short pulse laser system as claimed in claim 1 , wherein the gas-filled section is in the form of a pressure vessel with adjustable, in particular controllable, pressure.

8. The ultra-short pulse laser system as claimed in claim 7 , wherein the pressure can be regulated by a control unit so that a predetermined pulse length can be produced.

9. The ultra-short pulse laser system as claimed in claim 7 , comprising a storage component for the filling gas or its constituents.

10. The ultra-short pulse laser system as claimed in claim 1 , wherein the gas-filled section is in the form of a Herriot cell.

11. The ultra-short pulse laser system as claimed in claim 1 , comprising a component for producing mode-locking, in particular a saturable absorber mirror.

12. The ultra-short pulse laser system as claimed in claim 1 , wherein the laser medium comprises Yb:KYW, Yb:KGW, Yb:YAG, Yb:KLuW, Nd:YAG or Nd:vanadate.

13. The ultra-short pulse laser system as claimed in claim 1 , wherein a peak intensity within the laser resonator of more than 2, in particular more than 5, GW/cm 2 can be produced.

14. The ultra-short pulse laser system as claimed in claim 1 , comprising an electro-optical or acousto-optical pulse output coupler component in the laser resonator.

15. A method for producing femtosecond or picosecond pulses in an ultra-short pulse laser system, comprising at least

an amplifying laser medium for producing a laser emission (AS),

a laser resonator having at least one resonator mirror and

a pump source, in particular a laser diode source, for pumping the laser medium, and

guidance of the beam path of the laser emission to be produced through a gas-filled section within the laser resonator, in particular having a pulse energy of 1 microjoule within the laser resonator and/or a repetition rate below 50 MHz,

wherein the gas-filled section is filled with a filling gas comprising a single gas or a filling gas mixture differing from the composition of air,

the nonlinear refractive index n 2 of the gas-filled section substantially corresponding to that of air and

the filling gas having a rotational Raman effect which is smaller in comparison with air.

16. The ultra-short pulse laser system as claimed in claim 1 , wherein the filling gas comprises at least 50 percent by volume of a gas which has no rotational Raman bands.

Assignments (4)
CORRECTIVE ASSIGNMENT TO CORRECT THE ASSIGNEE NAME PREVIOUSLY RECORDED ON REEL 028312 FRAME 0719. ASSIGNOR(S) HEREBY CONFIRMS THE CORRECT HIGH Q LASER GMBH FROM HIGH Q LASER QMBH. Recorded Apr 21, 2014
From: HIGH Q TECHNOLOGIES GMBH
To: HIGH Q LASER GMBH
Reel/Frame 032722/0911 →
CHANGE OF NAME Recorded Jun 4, 2012
From: HIGH Q TECHNOLOGIES GMBH
To: HIGH Q LASER QMBH
Reel/Frame 028312/0719 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 27, 2011
From: KOPF, DANIEL
To: HIGH Q TECHNOLOGIES GMBH
Reel/Frame 026659/0470 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 21, 2009
From: KOPF, DANIEL
To: HIGH Q TECHNOLOGIES GMBH; KOPF, DANIEL
Reel/Frame 022982/0811 →
Continuity (1)
Related Publication 20100303106A1 · Dec 2, 2010