System and method for removing organic residue from a charged particle beam system
A system and method for removing an organic residue from a charged particle beam system includes a conduit that is coupled to the column and is for adding oxygen to the column. A heater is coupled to the column and is for increasing the temperature in the column. A pump is coupled to the column and is for removing a gas from the chamber, wherein the gas is a byproduct of a chemical reaction of the organic residue and the oxygen.
1. An apparatus for removing an organic residue from a particle beam system comprising:
a conduit, coupled to a column of the charged particle beam system inside a chamber, for adding oxygen to react with the organic residue on a surface of a lens and a deflector inside the column, wherein a charged particle beam from a beam source travels down the column and is focused by the deflector and lens;
at least one deflector coupled to the column:
a heater, inside said conduit, being extended into the column and in close proximity to the lens and the deflector, said heater for heating the organic residue; and
a pump, coupled to the chamber column, for pumping removing a gas from a the chamber, wherein the gas is a byproduct of a chemical reaction of the organic residue and the oxygen.
2. The system of claim 1 , wherein the heater is positionable near the organic residue.
3. The system of claim 1 , the conduit further for increasing pressure in the chamber with nitrogen.
4. The system of claim 1 , the conduit mounted near the heater for directing the oxygen to an area of increased temperature.
5. The system of claim 3 , the oxygen being ozone, wherein the ozone dissociates into a stable oxygen molecule and an oxygen free radical in the area of increased temperature, the oxygen free radical bonding with the organic residue to form the gas.
6. A charged particle beam system comprising:
a column including a charged particle source, a lens and deflectors, wherein a charged particle beam is directed by the lens and the deflectors and strikes on a sample;
at least one deflector and a lens coupled to the column;
a conduit coupled to and below the column for adding oxygen to react with an organic residue on surfaces of the lens and deflectors;
a heater, inside the conduit, being extended into the column and close to proximity to the lens and deflectors, said heater for increasing the temperature to the organic residue; and
a pump for removing a gas from a chamber, said column being inside the chamber, wherein the gas is a byproduct of a chemical reaction of the organic residue and the oxygen.
7. The charged particle beam system of claim 6 , the heater retractably coupled to the column, wherein the heater is positionable near the lens and the deflector.
8. The charged particle beam system of claim 6 , the conduit further for increasing pressure in the chamber with nitrogen.
9. The charged particle beam system of claim 6 , the conduit mounted near the heater for directing the oxygen to an area of increased temperature.
10. The charged particle beam system of claim 6 , the oxygen being ozone, wherein the ozone dissociates into a stable oxygen molecule and an oxygen free radical in the area of increased temperature, the oxygen free radical bonding with the organic residue to form the gas.