IP Library Granted Patent US 8,101,021
Granted Patent B2
US 8,101,021 · App. 11/955,774 · Granted Jan 24, 2012

Flow method and reactor for manufacturing nanocrystals

Assignee: Massachusetts Institute of Technology
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Quick Facts
Patent No.
US 8,101,021
App. No.
11/955,774
Granted
Jan 24, 2012
Kind
B2
Abstract

A population of nanocrystals having a narrow and controllable size distribution and can be prepared by a segmented-flow method.

Claims (22)

1. A segmented-flow reactor for producing a population of nanocrystals, comprising:

a liquid introduction port;

a gas introduction port; and

a flow path fluidly connected to liquid introduction port and the gas introduction port, the flow path including a first region configured to generate recirculation in a liquid volume, a second region associated with a thermal source, and a third region configured to cool a material within the flow path,

wherein the first region and the second region are thermally insulated from each other,

wherein the third region and the second region are thermally insulated from each other,

wherein the flow path is microfabricated on a substrate, and

wherein the flow path includes a meandering path.

2. A segmented-flow reactor for producing a population of nanocrystals comprising:

a liquid introduction port;

a gas introduction port; and

a flow path fluidly connected to the liquid introduction port and the gas introduction port, the flow path including a first region configured to generate recirculation in a liquid volume, a second region associated with a thermal source, and a third region configured to cool a material within the flow path,

wherein the first region and the second region are thermally insulated from each other;

and wherein the third region and the second region are thermally insulated from each other.

3. The reactor of claim 2 , wherein the flow path is microfabricated on a substrate.

4. A segmented-flow reactor for producing a population of nanocrystals comprising:

a liquid introduction port;

a gas introduction port; and

a flow path fluidly connected to the liquid introduction port and the gas introduction port, the flow path including a first region configured to generate recirculation in a liquid volume, a second region associated with a thermal source, and a third region configured to cool a material within the flow path,

wherein the first region and the second region are thermally insulated from each other;

and wherein the flow path includes a meandering path.

5. The reactor of claim 4 , wherein the flow path is microfabricated on a substrate.

Assignments (1)
CONFIRMATORY LICENSE Recorded Aug 6, 2012
From: MASSACHUSETTS INSTITUTE OF TECHNOLOGY
To: NATIONAL SCIENCE FOUNDATION
Reel/Frame 028726/0827 →
Continuity (3)
Division 11232022 · Sep 22, 2005
Provisional Application 60612613 · Sep 24, 2004
Related Publication 20080115722A1 · May 22, 2008