Thin layer substrate coating and method of forming same
Embodiments of the present invention relate to coating deposition and coatings for dental and orthopedic devices that provide prevention or reduction of ion leakage and, in some situations, improved aesthetic appearances.
1. A method of coating a substrate, comprising:
applying a plurality of pigment particles to a surface of the substrate; and
after applying the pigment particles, forming at least one thin film layer on the substrate by atomic layer deposition to form a coating layer including the pigment particles dispersed therein to coat at least a portion of the surface of the substrate.
2. The method of claim 1 , wherein said substrate comprises at least one of titanium, titanium-aluminum-vanadium, stainless steel, cobalt-chromium, nickel-chromium, and nickel-titanium.
3. The method of claim 1 , wherein said at least one thin film layer comprises an oxide or a nitride.
4. The method of claim 1 , wherein said at least one thin film layer comprises silicon dioxide, aluminum oxide, titanium dioxide, zirconium dioxide, tantalum oxide, titanium nitride, or aluminum nitride.
5. The method of claim 1 , wherein said substrate is at least a portion of a dental device.
6. The method of claim 5 , wherein said dental device comprises a crown, wire, plate, bridge, orthodontic bracket, brace, denture clasp, denture framework, implant, inlay, or onlay.
7. The method of claim 1 , wherein said substrate is at least a portion of an orthopedic device.
8. The method of claim 7 , wherein said orthopedic device comprises a wire, pin, screw, disk, plate, bracket, or splint.
9. The method of claim 1 , wherein said substrate comprises an alloy and wherein said coating provides a reduction of ion leakage from said alloy in an amount of at least 60% in comparison to said alloy without said coating.
10. The method of claim 1 , wherein said substrate comprises an alloy and wherein said coating provides a reduction of ion leakage from said alloy in an amount of at least 80% in comparison to said alloy without said coating.
11. The method of claim 1 , wherein providing a substrate comprises providing a biocompatible substrate.
12. The method of claim 1 , wherein said at least one thin film layer forms a coating having a thickness of approximately 15-250 nm.
13. The method of claim 1 , wherein said at least one thin film layer forms a coating having a thickness of approximately 40-90 nm.
14. The method of claim 1 , wherein dispersing pigment particles within the at least one thin film layer comprises dispersing an alumina or zirconia powder within the at least one thin film layer.
15. The method of claim 1 , wherein dispersing pigment particles within the at least one thin film layer comprises dispersing rare earth pigment particles within the at least one thin film layer.
16. The method of claim 1 , wherein dispersing pigment particles within the at least one thin film layer comprises dispersing pigment particles in combination with a binder within the at least one thin film layer.
17. The method of claim 16 , further comprising burning off the binder.
18. The method of claim 17 , wherein burning off the binder forms a porous matrix of pigment particles, the method further comprising applying at least one additional thin film layer to at least partially fill pores of the porous matrix.
19. The method of claim 17 , wherein burning off the binder comprises burning off the binder at a temperature of approximately 200° C.
20. A method of coating a substrate, comprising:
applying a plurality of pigment particles in combination with a binder to a surface of a substrate;
burning off the binder to form a porous matrix of pigment particles; and
depositing at least one thin film layer to further coat the substrate and at least partially fill pores of the porous matrix and form a dispersion matrix of pigment particles,
wherein depositing at least one thin film layer comprises depositing at least one thin film layer by atomic layer deposition.
21. The method of claim 20 , wherein depositing at least one thin film layer comprises depositing at least one thin film layer of an oxide or nitride.