IP Library › Granted Patent US 8,216,768
Granted Patent B2
US 8,216,768 · App. 12/741,325 · Granted Jul 10, 2012

Photoacid generator and photoreactive composition

Assignee: Sumitomo Seika Chemicals Co., Ltd.
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Quick Facts
Patent No.
US 8,216,768
App. No.
12/741,325
Granted
Jul 10, 2012
Kind
B2
Abstract

A photoacid generator, which shows very high sensitivity in the near ultraviolet range of about 300 to 400 nm, and also can remarkably increase a reaction rate of a photoreactive composition using the same, and a photoreactive composition which can initiate the reaction even by irradiation with near ultraviolet light within a short time and also can obtain a desired reaction product. A dithienyl sulfide disulfonium salt represented by the formula (A1): a dithienyl sulfide sulfonium salt represented by the formula (B1): and a phenylthiothiophene sulfonium salt represented by the formula (C1):

Claims (12)

1. A dithienyl sulfide disulfonium salt represented by the formula (A1):

wherein R 1a to R 4a each independently represents an optionally substituted monocyclic carbon ring group, an optionally substituted condensed polycyclic carbon ring group or an optionally substituted monocyclic heterocyclic group, and X − represents an inorganic acid ion or an organic acid ion.

2. A photoacid generator comprising the dithienyl sulfide disulfonium salt according to claim 1 .

3. A photoreactive composition comprising the photoacid generator according to claim 2 and an acid reactive compound.

4. A dithienyl sulfide sulfonium salt represented by the formula (B1):

wherein R 1b and R 2b each independently represents an optionally substituted monocyclic carbon ring group, an optionally substituted condensed polycyclic carbon ring group or an optionally substituted monocyclic heterocyclic group, R 3b to R 5b each independently represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, an acyl group or a hydroxyl group, and X − represents an inorganic acid ion or an organic acid ion.

5. A photoacid generator comprising the dithienyl sulfide sulfonium salt according to claim 4 .

6. A photoreactive composition comprising the photoacid generator according to claim 5 and an acid reactive compound.

7. A phenylthiothiophene sulfonium salt represented by the formula (C1):

wherein R 1c and R 2c each independently represents an optionally substituted monocyclic carbon ring group, an optionally substituted condensed polycyclic carbon ring group or an optionally substituted monocyclic heterocyclic group, an R 3c to R 7c each independently represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, an acyl group or a hydroxyl group, and X − represents an inorganic acid ion or an organic acid ion.

8. A photoacid generator comprising the phenylthiothiophene sulfonium salt according to claim 7 .

9. A photoreactive composition comprising the photoacid generator according to claim 8 and an acid reactive compound.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 13, 2010
From: YAMAMOTO, KATSUMASA; YAMAGUCHI, HIROFUMI; SUZUKI, MICHIO
To: SUMITOMO SEIKA CHEMICALS CO., LTD.
Reel/Frame 024377/0990 →
Priority Claims (3)
JP 2007-307632 · Nov 28, 2007 · national
JP 2007-307633 · Nov 28, 2007 · national
JP 2007-307634 · Nov 28, 2007 · national
Continuity (1)
Related Publication 20100233621A1 · Sep 16, 2010