Polishing method and polishing apparatus
The polishing method of a disk-shaped substrate for polishing an outer circumference 13 of a disk-shaped substrate using slurry is provided with in this sequence: a first polishing process for polishing the outer circumference 13 using an abrasive-grain inclusion brush 50 made of a resin in which polishing abrasive grains are included; and a second polishing process for polishing the outer circumference 13 using a resin brush 60 made of a resin in which the polishing abrasive grains are not included.
1. A polishing method of a disk-shaped substrate for polishing an edge face of a disk-shaped substrate using polishing liquid, comprising in this sequence:
a first polishing process for polishing the edge face using a first brush made of a resin in which polishing abrasive grains are included; and
a second polishing process for polishing the edge face using a second brush made of a resin in which the polishing abrasive grains are not included, wherein
in the first polishing process and the second polishing process, the disk-shaped substrates are piled so that the outer circumferential edge faces of the piled disk-shaped substrates are opposed to the first or second brush, and a side wall portion and a chamfered portion provided on the outer circumferential edge face are polished at the same time, and
in the first polishing process, the piled disk-shaped substrates are opposed to the first brush and polished, and the piled disk-shaped substrates are inverted, opposed to the first brush and polished.
2. The polishing method of a disk-shaped substrate according to claim 1 , wherein the polishing abrasive grains are formed from aluminum oxide or diamond.
3. The polishing method of a disk-shaped substrate according to claim 1 , wherein the resin as a material of the first brush is polyamide resin or polyester resin.
4. The polishing method of a disk-shaped substrate according to claim 1 , wherein the disk-shaped substrates are piled with a spacer interposed between the disk-shaped substrates adjacent to each other, the spacer having an outer diameter smaller than a diameter of the disk-shaped substrate.
5. The polishing method of a disk-shaped substrate according to claim 1 , wherein, in the first polishing process, a plurality of the first brushes are provided, a plurality of the piled disk-shaped substrates are set at different positions, each of the plurality of piled disk-shaped substrates is polished while being in contact with the plurality of first brushes, and then, each of the plurality of piled disk-shaped substrates is moved to one of the positions of the piled disk-shaped substrates and polished while being in contact with the plurality of first brushes.
6. The polishing method of a disk-shaped substrate according to claim 1 , wherein, in the second polishing process, a plurality of the second brushes are provided, a plurality of the piled disk-shaped substrates are set at different positions, each of the plurality of piled disk-shaped substrates is polished while being in contact with the plurality of second brushes, and then, each of the plurality of piled disk-shaped substrates is moved to one of the positions of the piled disk-shaped substrates and polished while being in contact with the plurality of second brushes.
7. A polishing method of a disk-shaped substrate for polishing an edge face of a disk-shaped substrate using polishing liquid, comprising in this sequence:
a first polishing process for polishing the edge face using a first brush made of a resin in which polishing abrasive grains are included; and
a second polishing process for polishing the edge face using a second brush made of a resin in which the polishing abrasive grains are not included, wherein
in the first polishing process and the second polishing process, the disk-shaped substrates are piled so that the outer circumferential edge faces of the piled disk-shaped substrates are opposed to the first or second brush, and a side wall portion and a chamfered portion provided on the outer circumferential edge face are polished at the same time, and
in the second polishing process, the piled disk-shaped substrates are opposed to the second brush and polished, and the piled disk-shaped substrates are inverted, opposed to the second brush and polished.