Antireflective transparent zeolite hardcoat, method for fabricating the same
View Patent ↗An antireflective transparent zeolite hardcoat and fabrication method thereof. The transparent zeolite hardcoat comprises a zeolite nanostructure made of zeolite nanocrystals vertically stacked into a porous structure on a substrate, wherein the porosity increases with structure height, thereby providing a smooth refractive index transition.
1. A method for fabricating antireflective transparent zeolite hardcoat, comprising:
(a) providing a solution capable of forming an antireflective transparent zeolite hardcoat, comprising the reaction products of a mixture via a two-stage thermal condensation process, wherein the mixture comprises silica source, water, and zeolite structure directing agent (SDA),
(b) modifying the concentration of the solution;
(c) forming a coating of the modified solution on a substrate; and
(d) heating the substrate to transform the coating into a transparent zeolite hardcoat, under a less than saturated humidity condition.
2. The method as claimed in claim 1 , wherein the transparent zeolite hardcoat comprises a zeolite nanostructure made of nanocrystals vertically stacked into a porous structure, and the porosity increases with structure height, thereby providing a smooth transition of refractive index.
3. The method as claimed in claim 1 , after modifying the concentration of the solution in the step (b), wherein the weight concentration of silica source is 0.01-6 wt %, based on the weight of the modified solution.
4. The method as claimed in claim 1 , wherein the step (b) further comprises adding a surfactant to the solution and wherein the substrate is silicon wafer, glass, plastic sheet, or plastic optical film.
5. The method as claimed in claim 4 , wherein the surfactant is nonionic surfactant of diblock copolymer of polyethylene oxide and polypropylene oxide, cationic surfactant of quaternary ammonium salt, or anionic surfactant of organic sulfonate.
6. The method as claimed in claim 4 , wherein the amount of surfactant is present in an amount of less than 10 grams per liter of the solution volume.
7. The method as claimed in claim 1 , wherein the substrate comprises silicon wafer, glass, plastic sheet, or plastic optical film.
8. The method as claimed in claim 1 , in the step (c), wherein the coating is formed by spin coating, dip coating, slot die coating, roll coating, blade coating, spray coating, micro-gravure, meniscus, or web tension.
9. The method as claimed in claim 1 , wherein the process of the step (d) comprises: performing a first heating treatment at 70-140° C. under more than 70% relative humidity for 3-30 minutes, and an optional second heating treatment at 70-80° C. under 30-98% relative humidity for 2-3 hours.