Apparatus and method for regulating the output of a plasma electron beam source

1. An apparatus for controlling a flow of electrons within a plasma, comprising:

a cathode operatively connected to a plasma;

a first anode configured to receive a flow of electrons from the plasma;

a voltage source operatively connected to both the cathode and the first anode; and

a second anode configured to receive a flow of electrons from the plasma, the second anode being operatively connected to the plasma and operatively connected to the voltage source via a switch between the second anode and the first anode;

wherein when the switch is open the electrons from the plasma discharge flow to the first anode; and

wherein when the switch is closed the electrons from the plasma discharge flow to the second anode.

2. The apparatus according to claim 1 , wherein the voltage difference between the first and second anode is varied in time such that the flow of electrons to the one of the first and second anodes varies in time.

3. The apparatus according to claim 1 , further comprising a plurality of second anodes, each of the second anodes operatively connected to the voltage source via a corresponding switch, wherein the electron flow from the plasma discharge can be selectively directed to one of the plurality of second anodes by selectively opening and closing the corresponding switch.

4. The apparatus according to claim 1 , wherein the cathode comprises a hollow cavity cathode, the plasma being situated within the hollow cavity cathode;

wherein the first anode is situated outside the hollow cavity cathode and the second anode is situated within the hollow cavity cathode; and

wherein the electrons flow out of the hollow cavity cathode to the first anode when the switch is open and do not exit the hollow cavity cathode when the switch is closed.

5. An apparatus for the controlled production of an electron beam, comprising:

a plasma;

a cathode and an acceleration anode operatively connected to the plasma, the acceleration anode being partially transparent to electrons;

a first voltage source applied between the cathode and the acceleration anode;

a control anode operatively connected to the plasma and operatively connected to the acceleration anode by a switch; and

a second voltage source operatively connected to the acceleration anode, the second voltage source being configured to accelerate electrons away from the acceleration anode;

wherein if the switch is open, electrons from the plasma flow to the acceleration anode and are subsequently accelerated to form a beam and if the switch is closed, electrons from the plasma flow to the control anode, the redirection of the electron flow caused by the opening and closing of the switch comprising a controlled production of an electron beam.

6. The apparatus according to claim 5 , wherein the flow of electrons to the acceleration anode is turned on and off by the opening of the switch such that the electron beam comprises a controlled pulsed electron beam.

7. The apparatus according to claim 5 , wherein the voltage difference between the acceleration anode and the control anode is varied in time such that the electron beam current varies in time with the variation in voltage difference.

8. An apparatus for the controlled production of an electron beam, comprising:

a hollow cathode plasma source having an exit orifice at a first end of the cathode cavity;

an acceleration anode which is partially transparent to electrons situated outside the cavity opposite the exit orifice and operatively connected to a first voltage source providing a voltage between the cathode and acceleration anode;

a control anode situated at least partially within the cavity and operatively connected to the voltage source by a switch between the control anode and the acceleration anode; and

a second voltage source operatively connected to the acceleration anode, the second voltage source being configured to accelerate electrons away from the acceleration anode;

wherein if the switch is open when the plasma is present, electrons from the plasma flow out of the cavity through the exit orifice to the acceleration anode and are subsequently accelerated to form a beam, and if the switch is closed when the plasma is present, electrons from the plasma flow to the control anode; and

wherein the electron flow caused by the opening and closing of the switch comprises a controlled production of an electron beam.

9. The apparatus according to claim 8 , wherein the flow of electrons to the acceleration anode is turned on and off by the opening of the switch such that the electron beam comprises a controlled pulsed electron beam.

10. The apparatus according to claim 8 , wherein the voltage difference between the acceleration anode and the control anode is varied in time such that the electron beam current varies in time with the variation in voltage difference.

11. The apparatus according to claim 8 , wherein the control anode comprises a wire loop having an effective surface area approximately equal to an effective surface area of the exit orifice.

12. A method for controlling a flow of electrons within a plasma, comprising:

operatively connecting a cathode and a first anode to a plasma;

applying a voltage between the cathode and the first anode;

operatively connecting a second anode to the plasma, the second anode further being operatively connected to the first anode by a switch;

opening the switch to cause electrons from the plasma to flow to the first anode; and

closing the switch to cause electrons from the plasma to flow to the second anode.

13. A method for producing a controlled electron beam, comprising:

operatively connecting a cathode and an acceleration anode to a plasma, the acceleration anode being partially transparent;

operatively connecting a control anode to the plasma, the control anode being operatively connected to the acceleration anode by a switch;

operatively connecting the cathode and the acceleration anode to a first voltage source;

operatively connecting the acceleration anode to a second voltage source, the second voltage source being configured to accelerate electrons away from the acceleration anode;

applying a voltage from the first voltage source between the cathode and the first anode;

opening the switch to cause substantially all of the electrons from the plasma to flow from the plasma to the acceleration anode, the electrons further passing through the acceleration anode and being subsequently accelerated by the second voltage source to form an electron beam; and

closing the switch to cause substantially all of the electrons from the plasma to flow to the control anode, the electrons flowing to the control anode not forming an electron beam.

14. The method according to claim 13 , further comprising periodically opening and closing the switch to form a controlled pulsed electron beam.

15. The method according to claim 13 , wherein an energy of the controlled electron beam is dependent on the voltage applied to the acceleration anode from the second voltage source and the beam current is dependent on the density of the plasma.

16. The method according to claim 13 , wherein the voltage difference between the acceleration anode and control anode is varied in time such that the electron beam current varies in time with the variation in voltage difference.

17. The method according to claim 13 , wherein the plasma source comprises a hollow cathode plasma source.