Methods for three-dimensional nanofocusing of light and systems thereof

1. A nanofocusing system comprising:

a dielectric waveguide having two opposing ends; and

a three-dimensional metal-dielectric-metal layered waveguide having two opposing ends optically aligned at one end with one end of the dielectric waveguide, wherein the three-dimensional metal-dielectric-metal waveguide tapers in at least two dimensions from the aligned end of the three-dimensional metal-dielectric-metal waveguide towards the opposing end, wherein light travelling through the dielectric waveguide is funneled in a first dimension of the at least two dimensions into the dielectric layer of the three-dimensional metal-dielectric-metal waveguide, squeezed in a second dimension of the at least two dimensions by the metal-dielectric-metal waveguide taper, and exits the three-dimensional metal-dielectric-metal waveguide as nanofocused light.

2. The system as set forth in claim 1 , wherein the metal-dielectric-metal waveguide tapers in two dimensions from the aligned end of the metal-dielectric-metal waveguide towards the opposing end.

3. The system as set forth in claim 1 , wherein the dielectric waveguide and the metal-dielectric-metal waveguide are optically aligned substantially along the center.

4. The system as set forth in claim 1 , wherein the dielectric waveguide is a dielectric slab waveguide.

5. The system as set forth in claim 1 , wherein the metal-dielectric-metal waveguide is a three-dimensional plasmonic waveguide.

6. The system as set forth in claim 1 , wherein the metal-dielectric-metal waveguide comprises a dielectric layer between at least two substantially low loss metals.

7. The system as set forth in claim 6 , wherein the at least two substantially low loss metals comprise one or more of silver and gold.

8. The method as set forth in claim 1 , wherein the dimension of the nanofocused light is from about 5 nm to about 100 nm.

9. The method as set forth in claim 1 , wherein the dimension of the nanofocused light is from about 10 nm to about 20 nm.

10. The system as set forth in claim 1 , further comprising an optical writing/reading apparatus optically aligned with the nanofocused light exiting the metal-dielectric-metal waveguide.

11. A method for nanofocusing light comprising:

passing light through a dielectric waveguide;

confining the light in a first of at least two dimensions by coupling the light from the dielectric waveguide into a three-dimensional metal-dielectric-metal waveguide that tapers in the at least two dimensions from one end of the three-dimensional metal-dielectric-metal waveguide adjacent the dielectric waveguide towards an opposing end of the three-dimensional metal-dielectric-metal waveguide;

squeezing in a second dimension of the at least two dimensions the light confined in the first dimension by passing the light through a taper in the three-dimensional metal-dielectric-metal waveguide;

wherein the light is three-dimensionally reduced to a nanoscale spot.

12. The method as set forth in claim 11 , wherein the light passing through the dielectric waveguide is in the ultra violet to near infrared range.

13. The method as set forth in claim 11 , wherein the light passing through the dielectric waveguide is in the visible to near infrared range.

14. The method as set forth in claim 11 , wherein the nanoscale spot is from about 5 nm to about 100 nm.

15. The method as set forth in claim 11 , wherein the first dimension is in the vertical direction and the second dimension is in the horizontal direction.

16. A method for making a nanofocusing system comprising:

fabricating a dielectric waveguide;

separately fabricating a three-dimensional metal-dielectric-metal waveguide;

aligning one end of the dielectric waveguide with one end of the three-dimensional metal-dielectric-metal waveguide, wherein the three-dimensional metal-dielectric-metal waveguide tapers in at least two dimensions from the aligned one end of the three-dimensional metal-dielectric-metal waveguide towards an opposing end; and

bonding the aligned one end of the dielectric waveguide with one end of the three-dimensional metal-dielectric-metal waveguide.

17. The method as set forth in claim 16 , further comprising polishing at least one of the one end of the dielectric waveguide with one end of the metal-dielectric-metal waveguide.

18. The method as set forth in claim 16 , wherein the aligning further comprises aligning one end of the dielectric waveguide with one end of the metal-dielectric-metal waveguide substantially along the center.

19. The method as set forth in claim 16 , wherein the metal-dielectric-metal waveguide tapers in one dimension from the aligned end of the metal-dielectric-metal waveguide towards the opposing end.

20. The method as set forth in claim 16 , wherein the cross-sectional dimension of the metal-dielectric-metal waveguide at the metal-dielectric-metal waveguide/dielectric waveguide interface is greater than the cross-sectional dimension of the dielectric waveguide.