Spinous-process implants and methods of using the same
Devices and methods for performing a procedure within a spine are disclosed herein. In one embodiment, a method includes coupling a first implant to a pedicle of a first vertebra of a spinal column such that at least a portion of the first implant is disposed between a first spinous process and a second spinous process of the spinal column. A second implant is coupled to a pedicle of a second vertebra of the spinal column. At least a portion of an outer surface of the first implant is configured to contact at least a portion of an outer surface of the second implant when the spinal column is in extension. The outer surface of the first implant and the outer surface of the second implant being at a spaced distance from each other when the spinal column is in flexion.
1. An apparatus, comprising:
an implant having an arcuate shaped surface configured to contour at least one spinous process of a vertebrae including a first portion, a second portion and a third portion disposed in a longitudinal series and connected in a fixed configuration;
the first, second, and third portions of the implant configured relative to each other such that, when the implant is disposed between first and second adjacent vertebrae of a human spinal column, the implant is configured to be disposed with:
the first portion disposed adjacent to a pedicle of a first vertebra of a spinal column and extending superiorly from an interspinous process gap formed by adjacent upper and lower spinous processes, associated with the first and second vertebrae on a first lateral side of the vertebrae; the first portion extending more superiorly than any other portion of the implant;
the second portion of the implant disposed through the interspinous process gap;
the third portion pivotally coupled to a pedicle of the second vertebra and extending inferiorly from the interspinous process gap on a second lateral side of the vertebrae;
the implant configured to transfer asymmetrically to the second vertebra at least a portion of a force exerted on the implant from one of the spinous processes.
2. The apparatus of claim 1 , wherein the third portion of the implant is configured to be fixedly coupled to the pedicle of the second vertebra.
3. The apparatus of claim 1 , wherein the implant is formed of a flexible material, the implant configured to flex when a force is exerted on the implant from one of the spinous processes.
4. The apparatus of claim 1 , wherein the third portion of the implant is pivotally coupled to the pedicle of the second vertebra.
5. The apparatus of claim 1 wherein the implant includes an outer surface, at least a portion of the outer surface configured to move in and out of contact with the spinous process of the first vertebra during movement of the spinal column between flexion and extension.
6. The apparatus of claim 1 wherein the implant includes a first surface and a second surface, the first surface configured to move in and out of contact with the spinous process of the first vertebra and a second surface configured to move in and out of contact with the spinous process of the second vertebra during movement of the spinal column between flexion and extension.
7. The apparatus of claim 1 wherein the third portion includes at least one opening configured to receive a coupling member therethrough to couple the implant to the pedicle of the second vertebra.
8. The apparatus of claim 1 wherein the first portion curves superiorly relative to the second portion.
9. The apparatus of claim 8 wherein the third portion is substantially straight and extends inferiorly at a non-orthogonal angle relative to the second portion.
10. The apparatus of claim 1 wherein when the implant is disposed between first and second adjacent vertebrae, the implant is configured such that no portion of the implant overlaps the upper spinous process on the second lateral side.
11. The apparatus of claim 1 wherein a centerline extends through the first, second, and third portions, wherein the centerline curves in a first direction proximate the intersection of the first and second portions and curves in an opposite second direction proximate the intersection of the second and third portions.
12. An apparatus, comprising:
an implant having an arcuate shaped surface configured to contour at least one spinous process of a vertebrae including a first portion, a second portion and a third portion disposed in a longitudinal series and connected in a fixed configuration;
the first, second, and third portions of the implant configured relative to each other such that, when the implant is disposed between first and second adjacent vertebrae of a human spinal column, the implant is configured to be disposed with:
the first portion disposed adjacent to a first pedicle of a first vertebra of a spinal column;
the second portion of the implant disposed through the interspinous process gap;
the third portion pivotally coupled to a second pedicle of the first vertebra and;
the implant configured to transfer asymmetrically to the second vertebra at least a portion of a force exerted on the implant from one of the spinous processes.