Linear-carrier phase-mask interferometer
A phase-difference sensor measures the spatially resolved difference in phase between orthogonally polarized reference and test wavefronts. The sensor is constructed as a linear-carrier phase-mask aligned to and imaged on a linear-carrier detector array. Mireau and Fizeau polarization interferometric objectives are implemented with a thin conductive wire grid optically coupled to the objective beam splitter.
1. A polarization Mireau interferometer comprising:
means for producing a light beam;
a reference surface;
a sample surface; and
an objective with a polarization beam splitter that reflects a polarization component of said light beam toward said reference surface and transmits an orthogonal component thereof toward said sample surface, said beam splitter including an array of conducting wires optically coupled to a glass substrate, said beam splitter being capable of reflecting said polarization component when the light beam is incident upon the beam splitter at a substantially zero angle of incidence.
2. The Mireau interferometer of claim 1 , wherein said interferometer is included in an interferometric measurement system that comprises:
a pixelated phase-mask adapted to receive orthogonally polarized test and reference beams produced by the interferometer as a combined beam, said phase-mask including a plurality of sets of phase-mask pixels, each set being adapted to produce a predetermined phase shift between the test and reference beams, wherein said combined beam impinges in undivided form upon each of said sets of phase-mask elements along a single optical axis;
a light detector in optical alignment with the phase-mask, each of said plurality of sets of phase-mask pixels being aligned with a corresponding set of detector pixels; and
means for performing an interferometric measurement based on said predetermined phase shift between the test and reference beams.
3. The Mireau interferometer of claim 2 , wherein said interferometric measurement system further includes relaying optics to form an image of an input pupil plane at a location substantially coincident with the linear-carrier phase-mask.
4. An interferometric measurement system that comprises:
an interferometer including an objective with a polarization beam splitter that reflects a polarization component of an incident light beam and transmits an orthogonal component thereof, said beam splitter including an array of conducting wires optically coupled to a glass substrate;
a linear-carrier phase-mask adapted to receive orthogonally polarized test and reference beams produced by the interferometer as a combined beam, said phase-mask including a plurality of linear sets of phase-mask elements, each set being adapted to produce a predetermined phase shift between the test and reference beams, wherein said combined beam impinges in undivided form upon each of said sets of phase-mask elements along a single optical axis;
a light detector in optical alignment with the phase-mask, each of said plurality of sets of phase-mask elements being aligned with a corresponding set of detector pixels; and
means for performing an interferometric measurement based on said predetermined phase shift between the test and reference beams.
5. The Mireau interferometer of claim 4 , wherein said interferometric measurement system further includes relaying optics to form an image of an input pupil plane at a location substantially coincident with the linear-carrier phase-mask.
6. A polarization Fizeau interferometer comprising:
means for producing a light beam;
a reference surface;
a sample surface;
an objective; and
a polarization beam splitter that reflects a polarization component of said light beam toward said reference surface and transmits an orthogonal component thereof toward said sample surface, said beam splitter including an array of conducting wires optically coupled to a glass substrate, said beam splitter being capable of reflecting said polarization component when the light beam is incident upon the beam splitter at a substantially zero angle of incidence.
7. The Fizeau interferometer of claim 6 , wherein said interferometer is included in an interferometric measurement system that comprises:
a pixelated phase-mask adapted to receive orthogonally polarized test and reference beams produced by the interferometer as a combined beam, said phase-mask including a plurality of sets of phase-mask pixels, each set being adapted to produce a predetermined phase shift between the test and reference beams, wherein said combined beam impinges in undivided form upon each of said sets of phase-mask elements along a single optical axis;
a light detector in optical alignment with the phase-mask, each of said plurality of sets of phase-mask pixels being aligned with a corresponding set of detector pixels; and
means for performing an interferometric measurement based on said predetermined phase shift between the test and reference beams.
8. A Fizeau interferometric measurement system that comprises:
an interferometer including a polarization beam splitter that reflects a polarization component of an incident light beam and transmits an orthogonal component thereof, said beam splitter including an array of conducting wires optically coupled to a glass substrate;
a phase-mask adapted to receive orthogonally polarized test and reference beams produced by the interferometer as a combined beam, said phase-mask including a plurality of linear sets of phase-mask elements, each set being adapted to produce a predetermined phase shift between the test and reference beams, wherein said combined beam impinges in undivided form upon each of said sets of phase-mask elements along a single optical axis;
a light detector in optical alignment with the phase-mask, each of said plurality of sets of phase-mask elements being aligned with a corresponding set of detector pixels; and
means for performing an interferometric measurement based on said predetermined phase shift between the test and reference beams.