Multi-gas mixer and device for supplying gas mixture to plasma torch

1. A multi-gas mixer, comprising:

a mixer chamber, comprising:

a plurality of gas inlets, respectively coupled to pipelines to various gas containers for providing gas to produce a gas mixture; at least one clockwise or counter-clockwise gas rotating and mixing unit or a combination of clockwise and counter-clockwise gas rotating and mixing units, disposed in the mixer chamber, so that a plurality of gas rotating and mixing channels, disposed on the periphery of each clockwise or counter-clockwise gas rotating and mixing unit or disposed on the periphery of each of the combination of clockwise and counter-clockwise gas rotating and mixing units, are oriented to produce a spiral gas flow with axial motion along a symmetric axis of the mixer chamber and enclosed by the inner wall of the mixer chamber to achieve an uniform gas mixture with an arbitrary percentage of each gas; and a gas mixture outlet along the symmetric axis of the mixer chamber to provide a high-speed gas flow after the gas mixture is exhausted from the mixer chamber.

2. The multi-gas mixer as recited in claim 1 , wherein the gas rotating and mixing channels is of each gas rotating and mixing unit are oriented to have the same inclined angle between a tangential line passing through the channel and a center axis of the mixer chamber, the inclined angle being a negative polar angle.

3. The multi-gas mixer as recited in claim 2 , wherein the absolute value of the negative polar angle is larger than 25° and smaller than 45°.

4. The multi-gas mixer as recited in claim 1 , wherein the gas rotating and mixing channels of each gas rotating and mixing unit are oriented to have the same inclined angle between a tangential line passing through the channel and a center axis of the mixer chamber, the inclined angle being a positive polar angle.

5. The multi-gas mixer as recited in claim 4 , wherein the absolute value of the positive polar angle is larger than 25° and smaller than 45°.

6. The multi-gas mixer as recited in claim 1 , wherein the at least one gas rotating and mixing unit is disposed in at least one gas rotating and mixing unit region, the at least one gas rotating and mixing unit region comprising at least one gas rotating and mixing unit, the at least one gas rotating and mixing unit in the gas rotating and mixing unit region comprising gas rotating and mixing channels being identically orientated, and neighboring gas rotating and mixing unit regions comprising gas rotating and mixing channels differently orientated.

7. The multi-gas mixer as recited in claim 1 , wherein a mass flow rate controller is coupled between each of the gas inlets and a gas container therewith so as to control and monitor the gas flow through each of the gas inlets.

8. The multi-gas mixer as recited in claim 1 , wherein the at least one gas rotating and mixing unit is fixedly coupled to the inner wall of the mixer chamber.

9. The multi-gas mixer as recited in claim 1 , further comprising a plurality of gap washers and a gas outlet screw nut for positioning the at least one gas rotating and mixing unit.

10. The multi-gas mixer as recited in claim 9 , wherein the at least one gas rotating and mixing unit is provided with a central through-hole for positioning the gap washer or the gas outlet screw nut.

11. A multi-gas mixing apparatus, comprising:

a plurality of multi-gas mixers, each of the multi-gas mixers further comprising:

a plurality of gas inlets, respectively coupled to pipelines to various gas containers for providing gas to produce a gas mixture;

at least one clockwise or counter-clockwise gas rotating and mixing unit or a combination of clockwise and counter-clockwise gas rotating and mixing units, disposed in the mixer chamber, so that a plurality of gas rotating and mixing channels, disposed on the periphery of each clockwise or counter-clockwise gas rotating and mixing unit or disposed on the periphery of each of the combination of clockwise and counter-clockwise gas rotating and mixing units, are oriented to produce a spiral gas flow with axial motion along a symmetric axis of the mixer chamber and enclosed by the inner wall of the mixer chamber to achieve an uniform gas mixture with an arbitrary percentage of each gas; and a gas mixture outlet along the symmetric axis of the mixer chamber to provide a high-speed gas flow after the gas mixture is exhausted from the mixer chamber; and

at least one flexible pipeline for coupling two of the plurality of multi-gas mixers.

12. The multi-gas mixing apparatus as recited in claim 11 , wherein the at least one gas rotating and mixing unit is fixedly coupled to the inner wall of the mixer chamber.

13. The multi-gas mixing apparatus as recited in claim 11 , wherein each of the multi-gas mixers further comprises a plurality of gap washers and a gas outlet screw nut for positioning the at least one gas rotating and mixing unit.

14. The multi-gas mixer as recited in claim 13 , wherein the at least one gas rotating and mixing unit is provided with a central through-hole for positioning the gap washer or the gas outlet screw nut.

15. The multi-gas mixing apparatus as recited in claim 11 , wherein the at least one gas rotating and mixing unit in the multi-gas mixer comprising the gas rotating and mixing channels being identically orientated, and neighboring multi-gas mixers comprising the gas rotating and mixing channels differently orientated.

16. A plasma torch system, comprising:

a plasma torch;

a high-frequency high-voltage lighting device with DC power, connected with a cathode and an anode of the plasma torch;

a multi-gas mixer coupled to the plasma torch to provide the plasma torch with a gas mixture to generate a plasma flame, comprising:

a mixer chamber, comprising:

a plurality of gas inlets, respectively coupled to pipelines to various gas containers for providing gas to produce a gas mixture;

at least one clockwise or counter-clockwise gas rotating and mixing unit or a combination of clockwise and counter-clockwise gas rotating and mixing units, disposed in the mixer chamber, so that a plurality of gas rotating and mixing channels, disposed on the periphery of each clockwise or counter-clockwise gas rotating and mixing unit or disposed on the periphery of each of the combination of clockwise and counter-clockwise gas rotating and mixing units, are oriented to produce a spiral gas flow with axial motion along a symmetric axis of the mixer chamber and enclosed by the inner wall of the mixer chamber to achieve an uniform gas mixture with an arbitrary percentage of each gas; and a gas mixture outlet along the symmetric axis of the mixer chamber to provide a high-speed gas flow after the gas mixture is exhausted from the mixer chamber.

17. The plasma torch system as recited in claim 16 , wherein the gas rotating and mixing channels of each gas rotating and mixing unit are oriented to have the same inclined angle between a tangential line passing through the channel and a center axis of the mixer chamber, the inclined angle being a negative polar angle.

18. The plasma torch system as recited in claim 17 , wherein the absolute value of the negative polar angle is larger than 25° and smaller than 45°.

19. The plasma torch system as recited in claim 16 , wherein the gas rotating and mixing channels of each gas rotating and mixing unit are oriented to have the same inclined angle between a tangential line passing through the channel and a center axis of the mixer chamber, the inclined angle being a positive polar angle.

20. The plasma torch system as recited in claim 19 , wherein the absolute value of the positive polar angle is larger than 25° and smaller than 45°.

21. The plasma torch system as recited in claim 16 , wherein the at least one gas rotating and mixing unit is disposed in at least one gas rotating and mixing unit region, the at least one gas rotating and mixing unit region comprising at least one gas rotating and mixing unit, the at least one gas rotating and mixing unit in the at least one gas rotating and mixing unit region comprising gas rotating and mixing channels being identically orientated, and neighboring gas rotating and mixing unit regions comprising gas rotating and mixing channels differently orientated.

22. The plasma torch system as recited in claim 16 , wherein a mass flow rate controller is coupled between each of the gas inlets and a gas container therewith so as to control and monitor the gas flow through each of the gas inlets.

23. The plasma torch system as recited in claim 16 , wherein the plasma torch is capable of generating a high-temperature, high-speed and long-arc plasma flame under high-voltage (>85V) and medium-current (<650 A).

24. The plasma torch system as recited in claim 16 , wherein the plasma torch achieves optimum plasma torch performances and optimum plasma flame characteristics by changing components and/or percentages in the gas mixture.

25. The plasma torch system as recited in claim 16 , wherein the at least one gas rotating and mixing unit is fixedly coupled to the inner wall of the mixer chamber.

26. The plasma torch system as recited in claim 16 , wherein the multi-gas mixer further comprises a plurality of gap washers and a gas outlet screw nut for positioning the at least one gas rotating and mixing unit.

27. The plasma torch system as recited in claim 26 , wherein the at least one gas rotating and mixing unit is provided with a central through-hole for positioning the gap washer or the gas outlet screw nut.