Image sensor with deep trench isolation structure

1. An apparatus comprising a back side illuminated (BSI) image sensor device that includes:

a substrate having a front side and a back side;

a radiation-detection device formed in the substrate, the radiation-detection device being operable to detect a radiation wave that enters the substrate through the back side;

an isolation structure formed in the substrate and adjacent to the radiation-detection device, the isolation structure including a deep trench isolation device and a doped trench liner that at least partially surrounds the deep trench isolation device

a first pinned implant layer formed over a front side of the radiation-detection device; and

a second pinned implant layer formed over a back side of the radiation-detection device;

wherein the first and second pinned implant layers are each electrically coupled to the doped trench liner and have the same doping polarity as the doped trench liner.

2. The apparatus of claim 1 , wherein the doped trench liner is formed conformal to the deep trench isolation and has a substantially uniform doping profile.

3. The apparatus of claim 1 , wherein the BSI image sensor device further includes an interconnect structure formed over the front side of the substrate, the interconnect structure having a contact formed on the doped trench liner.

4. The apparatus of claim 1 , wherein the BSI image sensor device further includes a re-crystallized silicon layer formed over the back side of the substrate.

5. The apparatus of claim 4 , wherein the BSI image sensor device has a pixel region and a periphery region, the radiation-detection device and the isolation structure being formed in the pixel region; and wherein the re-crystallized silicon layer is formed over both the pixel region and the periphery region and is electrically coupled to the doped trench liner.

6. The apparatus of claim 1 , wherein:

the radiation-detection device includes a photodiode doped with a first type dopant;

the deep trench isolation device includes an oxide material and has a depth in a range from approximately 1 micron to about 3 microns; and

the doped trench liner includes a second type dopant opposite the first type.

7. The apparatus of claim 1 , wherein the deep trench isolation device extends from the back side, wherein the isolation structure further includes a shallow trench isolation device that extends from the front side and is approximately aligned with the deep trench isolation device.

8. An image sensor device, comprising:

a substrate having a front surface and a back surface opposite the front surface;

a radiation-sensing region disposed in the substrate, the radiation-sensing region being operable to sense radiation projected toward the radiation-sensing region through the back surface;

a deep trench isolation feature disposed adjacent to the radiation-sensing region;

a shallow trench isolation feature disposed adjacent to the radiation-sensing region and being substantially aligned with the deep trench isolation feature; and

a doped layer that at least partially surrounds the deep trench isolation feature in a conformal manner.

9. The image sensor device of claim 8 , wherein:

a first portion of the doped layer disposed near the front surface has a first doping concentration level;

a second portion of the doped layer disposed near the back surface has a second doping concentration level; and

the first and second doping concentration levels are not substantially different from each another.

10. The image sensor device of claim 8 , further including a conductive via disposed on the doped layer, the via being electrically coupled to the doped layer.

11. The image sensor device of claim 8 , further including a re-crystallized silicon layer disposed over the back surface of the substrate.

12. The image sensor device of claim 8 , wherein the deep trench isolation feature extends from the back surface, and wherein the shallow trench isolation feature extends from the front surface and abuts the deep trench isolation feature.

13. The image sensor device of claim 8 , wherein the doped layer is a first doped layer, and further comprising:

a second doped layer formed over a front side of the radiation-sensing region; and

a third doped layer formed over a back side of the radiation-sensing region;

wherein the second and third doped layers are each electrically coupled to the first doped layer and have the same doping polarity as the first doped layer.

14. The image sensor device of claim 13 , wherein the radiation-sensing region is oppositely-doped from the first, second, and third doped layers.

15. A method of fabricating an image sensor device, comprising:

providing a substrate having a front side and a back side;

forming an isolation structure in the substrate, the isolation structure including a deep trench isolation device and a doped trench liner that at least partially surrounds the deep trench isolation device;

forming a radiation-detection device in the substrate, the radiation-detection device being adjacent to the isolation structure and being operable to detect a radiation wave that enters the substrate through the back side;

forming a first pinned implant layer over a front side of the radiation-detection device, the first pinned implant layer having the same doping polarity as the doped trench liner;

thereafter thinning the substrate from the back side; and

forming a second pinned implant layer over a back side of the radiation-detection device, the second pinned implant layer having the same doping polarity as the doped trench liner;

wherein the forming the first and second pinned implant layers are carried out in a manner so that the first and second pinned implant layers are each electrically coupled to the doped trench liner.

16. The method of claim 15 , wherein the forming the isolation structure includes:

etching the substrate to form an opening in the substrate, the opening having a depth that is greater than about 1 micron;

performing a plasma diffusion process to exposed surfaces of the opening to form the doped trench liner; and

thereafter filling the opening with a dielectric material to form the deep trench isolation device.

17. The method of claim 16 , wherein the performing the plasma diffusion process is carried out so that the doped trench liner has a substantially uniform doping profile.

18. The method of claim 16 , wherein the etching the substrate is carried out in a manner so that the opening is etched from the back side; and further including:

etching a shallow opening from the front side, the shallow opening being approximately aligned with the deep trench isolation device; and

thereafter filling the shallow opening with a dielectric material to form a shallow trench isolation device.

19. The method of claim 15 , further including forming an interconnect structure over the front side of the substrate, the forming the interconnect structure including forming a contact on the doped trench liner.

20. The method of claim 15 , further including:

forming an amorphous silicon layer over the back side of the substrate; and

forming a laser annealing process on the amorphous silicon layer to melt and re-crystallize the amorphous silicon layer.