Pad conditioner and method
View Patent ↗A polishing pad conditioning apparatus includes a laser beam generating unit for providing a laser beam, a fluid delivery system for providing a fluid stream and a vacuum line for removing debris. The laser beam may directly impinge on a surface of a polishing pad thereby creating cutting action, while an atomized fluid stream provides cooling and pad debris along with fluid are removed thru the vacuum line. Alternatively, the laser beam may be combined with the atomized fluid stream in a region above the pad surface to substantially impart part of its energy to the fluid stream, generating high energy droplets which provide “cool” cutting action on the pad surface.
1. A polishing pad conditioning head, comprising:
a laser beam delivery unit; and
a fluid delivery unit and a vacuum line, each mounted on a pad conditioning arm that is adjacent a polishing table, the pad conditioning arm configured to traverse a radius of a polishing pad mounted on the polishing table;
wherein the laser beam delivery unit and the fluid delivery unit are mounted so that a laser beam produced by the laser beam delivery unit and a fluid stream produced by the fluid delivery unit are combined within the conditioning head prior to impinging upon a surface of the polishing pad.
2. The polishing pad conditioning head of claim 1 , wherein the laser beam delivery unit and the fluid delivery unit are mounted separately from each other.
3. The polishing pad conditioning system of claim 1 , wherein the fluid delivery line is coupled to a fluid delivery system that uses compressed air.
4. The polishing pad conditioning system of claim 1 , wherein the laser beam generation unit includes a laser source comprising an Er, Cr:YSGG laser or CO 2 laser and the fluid delivery line is coupled to a fluid delivery system configured to deliver deionized water.
5. The polishing pad conditioning system of claim 1 , wherein the fluid delivery line is coupled to a fluid delivery system configured to deliver a pad cleaning solution.
6. The polishing pad conditioning system of claim 1 , wherein the fluid delivery line is coupled to a fluid delivery system configured to deliver an acidic solution.
7. The polishing pad conditioning system of claim 1 , wherein the fluid delivery line is coupled to a fluid delivery system configured to deliver a basic solution.
8. The polishing pad conditioning system of claim 1 , wherein the fluid delivery line is coupled to a fluid delivery system configured to deliver a film polish solution.