Forming method of resist pattern and manufacturing method of thin-film magnetic head
It is therefore an object of the present invention to provide a forming method for a resist pattern to reduce a resist residue in forming the resist pattern on a step whose gradient angle is equal to 90 degrees or more. A forming method for a resist pattern to reduce a resist residue on a step is provided, the method comprising: forming resist film with coating resist containing photo-acid-generator on a step formed on a substrate, where gradient angle of the step is equal to 90 degrees or more, exposing said resist film and generating acid from said photo-acid-generator.
1. A manufacturing method of a thin-film magnetic head forming a side shield with a resist pattern, the method comprising steps of:
forming a resist film with coating resist containing photo-acid-generator on a main magnetic pole layer formed on a substrate, where gradient angle of the main magnetic pole layer is equal to 90 degrees or more;
exposing a portion where the main magnetic pole layer is formed along height direction and generating acid from said photo-acid-generator; and
forming the resist pattern to reduce a resist residue on the main magnetic pole layer,
wherein said exposure of the resist film is an extended exposure.
2. The manufacturing method as claimed in claim 1 , wherein said side shield is formed by forming a convex portion of magnetic metal material covering said main magnetic pole layer, eliminating said resist pattern, and then polishing said convex portion.
3. The manufacturing method as claimed in claim 1 , wherein a concentration of said photo-acid-generator is less than 1% by weight.
4. The manufacturing method as claimed in claim 1 , wherein said photo-acid-generator is either Triphenylsulfoniumhexafluoroantimonate photo-acid-generator, Triphenylsulfonium type photo-acid-generator, or Bisiodonium type photo-acid-generator.
5. The manufacturing method as claimed in claim 1 , wherein baking of said resist film is preformed from 60° C. to 70° C. after forming said resist film and before said exposure.
6. The manufacturing method as claimed in claim 1 , wherein baking of said resist film is preformed at 60° C. after forming said resist film and before said exposure.
7. A manufacturing method of a thin-film magnetic head forming a side shield with a resist pattern, the method comprising steps of:
forming a resist film with coating resist containing photo-acid-generator on a main magnetic pole layer formed on a substrate, where gradient angle of the main magnetic pole layer is equal to 90 degrees or more;
baking the resist film at temperature of loner than 80° C.;
exposing a portion where the main magnetic pole layer is formed along height direction and generating acid from said photo-acid-generator; and
forming the resist pattern to reduce a resist residue on the main magnetic pole layer,
wherein said exposure of the resist film is an extended exposure.
8. The manufacturing method as claimed in claim 7 , wherein said side shield is formed by forming a convex portion of magnetic metal material covering said main magnetic pole layer, eliminating said resist, pattern, and then polishing said convex portion.
9. The manufacturing method as claimed in claim 7 wherein a concentration of said photo-acid-generator is less than 1% by weight.
10. The manufacturing method as claimed in claim 7 , wherein said photo-acid-generator is either Triphenylsulfoniumhexafluoroantimonate photo-acid-generator, Triphenylsulfonium type photo-acid-generator, or Bisiodonium type photo-acid-generator.
11. The manufacturing method as claimed in claim 7 , wherein said temperature of lower than 80° C. is 60° C. to 70° C.
12. The manufacturing method as claimed in claim 7 , wherein said temperatures of lower an 80° C. is 60° C.