Epitaxial growth system for fast heating and cooling
A system for crystal growth having rapid heating and cooling. A fluid-cooling jacket having a reflective shield contained therein is disposed around a heating cylinder in which crystal growth takes place. A heating coil is disposed round the cooling jacket. The invention also includes a method of crystal growth and semiconductor devices formed using the inventive methods and systems.
1. A system for crystal growth comprising:
a heating cylinder having a first end and a second end;
a first insulation unit disposed at the heating cylinder first end and secured thereon;
a second insulation unit disposed at the heating cylinder second end and secured thereon;
a reflective shield disposed around the heating cylinder;
an inner tube disposed between the heating cylinder and the reflective shield;
an outer tube disposed around the reflective shield;
one or more inlets through which fluid can be flowed into an area between the inner tube and outer tube, thus surrounding the reflective shield with the fluid;
a heating coil disposed around the outer tube; and
a susceptor apparatus disposed within the heating cylinder to hold a substrate onto which epitaxial growth will take place.
2. The system of claim 1 further comprising one or more inlets through which fluid can be flowed into an area between the inner tube and the heating cylinder.
3. The system of claim 1 further comprising one or more inlets through which fluid can be flowed into the heating cylinder.
4. The system of claim 1 comprising a gap between the heating cylinder and the inner tube in the range of about 1 mm to about 50 mm.
5. The system of claim 4 wherein the gap is in the range of about 5 mm to about 15 mm.
6. The system of claim 1 wherein the heating cylinder comprises a metal carbide.
7. The system of claim 1 wherein the outer tube is acrylic.