Projection optical system with rarefaction compensation

1. A projection optical system for projecting a pattern of an object plane onto an image plane, comprising:

a first lens whose refractive index increases by ultraviolet irradiation; and

a second lens whose refractive index decreases by the ultraviolet irradiation,

wherein letting TT be a distance between a first intersection as an intersection of the object plane and an optical axis of the projection optical system, and a second intersection as an intersection of the image plane and the optical axis,

a distance D 1 between a first central position as a central position of a thickness of the first lens on the optical axis and an intersection position of one of the first intersection and the second intersection which is closer to the first central position satisfies

D 1≦ TT/ 8, and

a distance D 2 between a second central position as a central position of a thickness of the second lens on the optical axis and the intersection position satisfies

D 2≦ TT/ 8.

2. The system according to claim 1 , wherein the second lens is made of a glass material containing a main component of the first lens.

3. The system according to claim 1 , wherein the first lens and the second lens are adjacent to each other.

4. The system according to claim 3 , wherein the first lens and the second lens are cemented.

5. The system according to claim 4 , wherein the first lens and the second lens are cemented by an optical contact.

6. The system according to claim 4 , wherein the first lens and the second lens are cemented by an adhesive.

7. The system according to claim 1 , wherein the first lens and the second lens are made of synthetic silica glass.

8. The system according to claim 1 , wherein the first lens and the second lens have different OH group densities.

9. The system according to claim 1 , wherein the first lens and the second lens have different hydrogen molecular densities.

10. A projection optical system for projecting a pattern of an object plane onto an image plane, comprising:

a first lens whose refractive index increases by ultraviolet irradiation; and

a second lens whose refractive index decreases by the ultraviolet irradiation,

wherein at least one intermediate image is formed between the object plane and the image plane, and

letting TT be a distance between a first intersection as an intersection of the object plane and an optical axis of the projection optical system, and a second intersection as an intersection of the image plane and the optical axis,

a distance DC 1 between a first central position as a central position of a thickness of the first lens on the optical axis and an intermediate image position of one of the at least one intermediate image which is closest to the first central position satisfies

DC 1≦ TT/ 6, and

a distance DC 2 between a second central position as a central position of a thickness of the second lens on the optical axis and the intermediate image position satisfies

DC 2≦ TT/ 6.

11. A projection optical system for projecting a pattern of an object plane onto an image plane, comprising:

a first lens whose refractive index increases by ultraviolet irradiation; and

a second lens whose refractive index decreases by the ultraviolet irradiation,

wherein at least one pupil is formed between the object plane and the image plane, and

letting TT be a distance between a first intersection as an intersection of the object plane and an optical axis of the projection optical system, and a second intersection as an intersection of the image plane and the optical axis,

a distance DP 1 between a first central position as a central position of a thickness of the first lens on the optical axis and a pupil position of one of the least one pupil which is closest to the first central position satisfies

DP 1≦ TT/ 8, and

a distance DP 2 between a second central position as a central position of a thickness of the second lens on the optical axis and the pupil position satisfies

DP 2≦ TT/ 8.

12. A projection optical system for projecting a pattern of an object plane onto an image plane, comprising:

a first lens whose refractive index increases by ultraviolet irradiation; and

a second lens whose refractive index decreases by the ultraviolet irradiation,

wherein letting TT be a distance between a first intersection as an intersection of the object plane and an optical axis of the projection optical system, and a second intersection as an intersection of the image plane and the optical axis,

a distance DW 1 between a first central position as a central position of a thickness of the first lens on the optical axis and a waist position of the projection optical system at a shortest distance from the first central position satisfies

DW 1≦ TT/ 11,

a distance DW 2 between a second central position as a central position of a thickness of the second lens on the optical axis of the projection optical system and the waist position satisfies

DW 2≦ TT/ 11, and

between a pupil of the projection optical system and a lens surface which is one of lens surfaces of a plurality of lenses forming the projection optical system and on which a distance between a most off-axis principal ray and the optical axis of the projection optical system is maximum, the waist position is a position of an intersection of a lens surface on which an effective region is minimum and the optical axis of the projection optical system.

13. An exposure apparatus comprising:

an illumination optical system configured to illuminates a reticle with light from a light source; and

a projection optical system configured to project a pattern of the reticle set on an object plane onto a substrate set on an image plane,

wherein the projection optical system includes:

a first lens whose refractive index increases by ultraviolet irradiation; and

a second lens whose refractive index decreases by the ultraviolet irradiation,

wherein letting TT be a distance between a first intersection as an intersection of the object plane and an optical axis of the projection optical system, and a second intersection as an intersection of the image plane and the optical axis,

a distance D 1 between a first central position as a central position of a thickness of the first lens on the optical axis and an intersection position of one of the first intersection and the second intersection which is closer to the first central position satisfies

D 1≦ TT/ 8, and

a distance D 2 between a second central position as a central position of a thickness of the second lens on the optical axis system and the intersection position satisfies

D 2≦ TT/ 8.

14. A method comprising:

exposing a substrate using an exposure apparatus; and

performing a development process for the substrate exposed,

wherein the exposure apparatus includes:

an illumination optical system configured to illuminates a reticle with light from a light source; and

a projection optical system configured to project a pattern of the reticle set on an object plane onto the substrate set on an image plane,

wherein the projection optical system includes:

a first lens whose refractive index increases by ultraviolet irradiation; and

a second lens whose refractive index decreases by the ultraviolet irradiation,

wherein at least one pupil is formed between the object plane and the image plane, and

letting TT be a distance between a first intersection as an intersection of the object plane and an optical axis of the projection optical system, and a second intersection as an intersection of the image plane and the optical axis,

a distance DP 1 between a first central position as a central position of a thickness of the first lens on the optical axis and a pupil position at a shortest distance from the first central position satisfies

DP 1≦ TT/ 8, and

a distance DP 2 between a second central position as a central position of a thickness of the second lens on the optical axis and the pupil position satisfies

DP 2≦ TT/ 8.

15. An optical system for projecting a pattern of an object plane onto an image plane, comprising:

a first lens whose refractive index increases by ultraviolet irradiation; and

a second lens whose refractive index decreases by the ultraviolet irradiation,

wherein letting TT be a distance between a first intersection as an intersection of the object plane and an optical axis of the optical system, and a second intersection as an intersection of the image plane and the optical axis,

a distance D 1 between a first central position as a central position of a thickness of the first lens on the optical axis and an intersection position of one of the first intersection and the second intersection which is closer to the first central position satisfies

D 1≦ TT/ 8.

16. The system according to claim 15 , wherein

a distance D 2 between a second central position as a central position of a thickness of the second lens on the optical axis and the intersection position satisfies

D 2≦ TT/ 8.

17. The system according to claim 15 , wherein the first and second lenses are cemented.

18. An optical system for projecting a pattern of an object plane onto an image plane, comprising:

a first lens whose refractive index increases by ultraviolet irradiation; and

a second lens whose refractive index decreases by the ultraviolet irradiation,

wherein at least one intermediate image is formed between the object plane and the image plane, and

letting TT be a distance between a first intersection as an intersection of the object plane and an optical axis of the optical system, and a second intersection as an intersection of the image plane and the optical axis,

a distance DC 1 between a first central position as a central position of a thickness of the first lens on the optical axis and an intermediate image position of one of the at least one intermediate image which is closest to the first central position satisfies

DC 1≦ TT/ 6.

19. The system according to claim 18 , wherein

a distance DC 2 between a second central position as a central position of a thickness of the second lens on the optical axis and the intermediate image position satisfies

DC 2≦ TT/ 6.