Current-perpendicular-to-plane (CPP) read sensor with ferromagnetic buffer and seed layers
A current-perpendicular-to-plane (CPP) tunneling magnetoresistance (TMR) or giant magnetoresistance (GMR) read sensor with ferromagnetic buffer and seed layers is proposed for high-resolution magnetic recording. The ferromagnetic buffer layer is preferably formed of an amorphous Co—X (where X is Hf, Y, Zr, etc.) film. It provides the CPP read sensor with microstructural discontinuity from a ferromagnetic lower shield, thus facilitating the CPP read sensor to grow freely with preferred crystalline textures, and with ferromagnetic continuity to the ferromagnetic lower shield, thus acting as a portion of the ferromagnetic lower shield.
1. A read sensor comprising:
a buffer layer formed of a ferromagnetic, amorphous film;
a seed layer formed of a ferromagnetic, polycrystalline film on the buffer layer; and
a pinning layer formed of an antiferromagnetic, polycrystalline film on the seed layer;
wherein the buffer layer contains cobalt (Co) with a content ranging from 70 to 94 at % and X with a content ranging from 6 to 30 at %, where X is hafnium (Hf), zirconium (Zr), yttrium (Y) or boron (B), and has a thickness ranging from 0.6 to 4 nm.
2. The read sensor as in claim 1 , wherein the seed layer exhibits a face-centered-cubic (fcc) structure with a lattice constant nearly equivalent to that of the pinning layer, and does not exchange-couple with the pinning layer.
3. The read sensor as in claim 1 , wherein the pinning layer contains iridium (Ir) with a content ranging from 16 to 24 at % and manganese (Mn) with a content ranging from 76 to 84 at %, and has a thickness ranging from 4 to 8 nm.
4. The read sensor as in claim 1 , further comprising
a keeper layer structure formed of ferromagnetic films on the pinning layer;
an antiparallel-coupling layer formed of a nonmagnetic film on the keeper layer structure;
a reference layer structure formed of ferromagnetic films on the antiparallel-coupling layer;
a barrier or spacer layer formed of a nonmagnetic film on the reference layer structure;
a sense layer structure formed of ferromagnetic films on the barrier or spacer layer; and
a cap layer structure formed of nonmagnetic films on the sense layer structure.
5. A method of evaluating thermal properties of the read sensor as in claim 1 by detecting two peaks of anisotropy magnetoresistance coefficients from resistance responses as a function of baking temperatures.
6. A read sensor comprising:
a buffer layer formed of a ferromagnetic, amorphous film;
a seed layer formed of a ferromagnetic, polycrystalline film on the buffer layer; and
a pinning layer formed of an antiferromagnetic, polycrystalline film on the seed layer;
wherein the seed layer contains nickel (Ni) with a content ranging from 64 to 80 at % and X with a content ranging from 20 to 36 at %, where X is platinum (Pt), palladium (Pd), rhodium (Rh) or ruthenium (Ru), and has a thickness ranging from 2 to 20 nm.
7. A read head including a read sensor comprising
a buffer layer formed of a ferromagnetic, amorphous film;
a seed layer formed of a ferromagnetic, polycrystalline film on the buffer layer; and
a pinning layer formed of an antiferromagnetic, polycrystalline film on the seed layer;
wherein the buffer layer contains cobalt (Co) with a content ranging from 70 to 94 at % and X with a content ranging from 6 to 30 at %, where X is hafnium (Hf), zirconium (Zr), yttrium (Y) or boron (B), and has a thickness ranging from 0.6 to 4 nm.
8. A read head as in claim 7 further including
a lower shield formed of a ferromagnetic, polycrystalline film beneath the read sensor; and
an upper shield formed of a ferromagnetic, polycrystalline film on the read sensor.
9. A read head as in claim 7 further including
an insulation layer in each of two side regions adjacent to the read sensor; and
a longitudinal bias stack on the insulation layer in each of the two side regions.
10. The read head as in claim 7 , wherein:
the read sensor has first and second sides;
the buffer layer is formed over a lower shield; and
the buffer layer extends into beyond the first and second sides of the read sensor and acts as a portion of the lower shield.
11. The read head as in claim 7 , wherein the seed layer exhibits a face-centered-cubic (fcc) structure with a lattice constant nearly equivalent to that of the pinning layer, and does not exchange-couple with the pinning layer.
12. The read head as in claim 7 , wherein:
the read sensor has first and second sides;
the buffer layer is formed over a lower shield; and
the seed layer extends beyond the first and second sides of the read sensor and acts as a portion of the lower shield.
13. The read head as in claim 7 , wherein the upper surface of the seed layer defines the lower bound of a read gap.
14. The read head as in claim 7 , wherein the pinning layer contains iridium (Ir) with a content ranging from 16 to 24 at % and manganese (Mn) with a content ranging from 76 to 84 at %, and has a thickness ranging from 4 to 8 nm.
15. The read sensor as in claim 7 , further comprising
a keeper layer structure formed of ferromagnetic films on the pinning layer;
an antiparallel-coupling layer formed of a nonmagnetic film on the keeper layer structure;
a reference layer structure formed of ferromagnetic films on the antiparallel-coupling layer;
a barrier or spacer layer formed of a nonmagnetic film on the reference layer structure;
a sense layer structure formed of ferromagnetic films on the barrier or spacer layer; and
a cap layer structure formed of nonmagnetic films on the sense layer structure.
16. A read head including a read sensor comprising
a buffer layer formed of a ferromagnetic, amorphous film;
a seed layer formed of a ferromagnetic, polycrystalline film on the buffer layer; and
a pinning layer formed of an antiferromagnetic, polycrystalline film on the seed layer;
wherein the seed layer contains nickel (Ni) with a content ranging from 64 to 80 at % and X with a content ranging from 20 to 36 at %, where X is platinum (Pt), palladium (Pd), rhodium (Rh) or ruthenium (Ru), and has a thickness ranging from 2 to 20 nm.