IP Library › Granted Patent US 8,462,508
Granted Patent B2
US 8,462,508 · App. 11/742,540 · Granted Jun 11, 2013

Heat sink with surface-formed vapor chamber base

Inventors: Robert J. Lankston, II (Roseville, CA); Christopher G. Malone (Loomis, CA); Stephen D. Cromwell (Penryn, CA)
Assignee: Hewlett-Packard Development Company, L.P.
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Quick Facts
Patent No.
US 8,462,508
App. No.
11/742,540
Granted
Jun 11, 2013
Kind
B2
Abstract

A heat sink comprises a vapor chamber base formed in a three-dimensional arrangement that mirrors topology of underlying structures on a substrate upon which the heat sink can be mounted, and at least one fin coupled to the vapor chamber base.

Claims (62)

1. A heat sink comprising:

a vapor chamber base formed in a three-dimensional arrangement that mirrors topology of underlying structures on a substrate upon which the heat sink can be mounted, the vapor chamber base formed with a surface that encases sides and top of integrated circuits to maintain a uniform base temperature raised to extend over obstructions on the substrate; and

at least one fin coupled to the vapor chamber base.

2. The heat sink according to claim 1 further comprising:

the vapor chamber base three-dimensional arrangement configured to maintain a controlled distance between an outer edge of the vapor chamber base and the underlying topology.

3. The heat sink according to claim 1 further comprising:

the vapor chamber base three-dimensional arrangement configured to extend over obstructions while maintaining a uniform base temperature and reducing or minimizing conduction losses.

4. The heat sink according to claim 1 further comprising:

a plurality of fins bonded directly to the vapor chamber base.

5. The heat sink according to claim 1 further comprising:

the vapor chamber base formed with a thickness sufficient to rise above and clear obstructions on the underlying topology.

6. The heat sink according to claim 1 further comprising:

the vapor chamber base formed with a thickness sufficient to raise above and clear obstructions on the underlying topology and extending to a planar surface opposite the underlying topology; and

a plurality of fins coupled to the planar surface.

7. The heat sink according to claim 1 further comprising:

the vapor chamber base further comprising:

a shell formed in a three-dimensional arrangement that mirrors topology of underlying structures and has thickness sufficient to raise above and clear obstructions on the underlying topology; and

a planar lid configured for coupling to the shell.

8. The heat sink according to claim 7 further comprising:

the shell configured with a relatively small planar area at a surface for mounting adjacent the underlying structures and expanding laterally as distance from the underlying structures increases.

9. The heat sink according to claim 7 further comprising:

the shell configured with an interior cavity that forms a chamber within the vapor chamber base;

the planar lid configured for attachment to the shell whereby the chamber is a sealed, inner vapor chamber;

a wicking material for placement in the vapor chamber to enable fluid transport from the lid to a heat source; and

fluid for injection into the vapor chamber.

10. The heat sink according to claim 9 further comprising:

a support structure formed in the chamber configured to increase strength and facilitate fluid transport of the vapor chamber base.

11. A method for constructing a heat sink comprising:

determining a topology of a substrate and components mounted on the substrate;

forming a vapor chamber base in a three-dimensional arrangement that mirrors the topology, the vapor chamber base formed with a surface that encases sides and top of integrated circuits to maintain a uniform base temperature raised to extend over obstructions on the substrate; and

coupling at least one fin to the vapor chamber base.

12. The method according to claim 11 further comprising:

forming the vapor chamber base three-dimensional arrangement to extend over obstructions while maintaining a uniform base temperature and reducing or minimizing conduction losses.

13. The method according to claim 11 further comprising:

bonding a plurality of fins directly to the vapor chamber base.

14. The method according to claim 11 further comprising:

forming the vapor chamber base with a thickness sufficient to rise above and clear obstructions on the underlying topology and extend to a planar surface opposite the underlying topology.

15. The method according to claim 11 further comprising:

forming a shell formed in a three-dimensional arrangement that mirrors topology of underlying structures and having thickness sufficient to raise above and clear obstructions on the underlying topology;

forming a planar lid in a configuration for coupling to the shell.

16. The method according to claim 15 further comprising:

forming the shell with a relatively small planar area at a surface for mounting adjacent the underlying structures and expanding laterally as distance from the underlying structures increases.

17. The method according to claim 15 further comprising:

forming the shell with an interior cavity that forms a chamber within the vapor chamber base;

forming a support structure in the chamber in a configuration that increases strength and facilitates fluid transport of the vapor chamber base;

forming the planar lid for attachment to the shell whereby the chamber is a sealed, inner vapor chamber;

placing a wicking material in the vapor chamber for fluid transport from the lid to a heat source; and

injecting fluid into the vapor chamber.

18. An electronic system comprising:

an electronic assembly comprising a substrate and at least one component mounted on the substrate; and

a heat sink configured for mounting on the electronic assembly comprising:

a vapor chamber base formed in a three-dimensional arrangement that mirrors topology of components on the substrate upon which the heat sink is mounted, the vapor chamber base formed with a surface that encases sides and top of integrated circuits to maintain a uniform base temperature raised to extend over obstructions on the substrate; and

at least one fin coupled to the vapor chamber base.

19. The electronic system according to claim 18 further comprising:

a plurality of fins bonded directly to the vapor chamber base.

20. The electronic system according to claim 18 further comprising:

the vapor chamber base further comprising:

a shell formed in a three-dimensional arrangement that mirrors topology of underlying structures and has thickness sufficient to raise above and clear obstructions on the underlying topology, the shell configured with a relatively small planar area at a surface for mounting adjacent the underlying structures and expanding laterally as distance from the underlying structures increases, the shell configured with an interior cavity that forms a chamber within the vapor chamber base;

a support structure formed in the chamber configured to increase strength and facilitate fluid transport of the vapor chamber base;

a planar lid configured for attachment to the shell whereby the chamber is a sealed, inner vapor chamber;

a wicking material for placement in the vapor chamber to enable fluid transport from the lid to a heat source; and

fluid for injection into the vapor chamber.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 9, 2015
From: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
To: HEWLETT PACKARD ENTERPRISE DEVELOPMENT LP
Reel/Frame 037079/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 29, 2007
From: LANKSTON II, ROBERT J.; MALONE, CHRISTOPHER G.; CROMWELL, STEPHEN D.
To: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Reel/Frame 019779/0887 →
Continuity (1)
Related Publication 20080266800A1 · Oct 30, 2008