Organometallic precursors for use in chemical phase deposition processes
An organometallic precursor is provided. The precursor corresponds in structure to Formula I: Cp(R) n M(CO) 2 (X) (Formula I) wherein: M is Ru, Fe or Os; R is C 1 -C 10 -alkyl; X is C 1 -C 10 -alkyl; and n is 1, 2, 3, 4 or 5. The precursors are useful in chemical phase deposition processes, such as atomic layer deposition (ALD) and chemical vapor deposition (CVD).
1. An organometallic complex represented by Formula I:
Cp(R) n M(CO) 2 (X) (Formula I)
wherein:
M is Ru or Os;
R is C 1 -C 10 -alkyl;
X is C 1 -C 10 -alkyl; and
n is 1, 2, 3 or 4.
2. The organometallic complex of claim 1 ,
wherein:
M is Ru;
R is selected from the group consisting of methyl, ethyl, propyl and butyl;
X is selected from the group consisting of methyl, ethyl, propyl and butyl; and
n is 1, 2, 3, or 4.
3. The organometallic complex of claim 1 ,
wherein:
M is Os;
R is selected from the group consisting of methyl, ethyl, propyl and butyl;
X is selected from the group consisting of methyl, ethyl, propyl and butyl; and
n is 1, 2, 3, or 4.
4. The organometallic complex of claim 1 ,
wherein:
X is selected from the group consisting of methyl, ethyl and propyl;
R is selected from the group consisting of methyl, ethyl and propyl; and
n is 2, 3, or 4.
5. The organometallic complex of claim 1 ,
wherein:
M is Ru;
X is methyl or ethyl;
R is methyl or ethyl; and
n is 1.
6. The organometallic complex of claim 1 ,
wherein:
M is Os;
X is methyl or ethyl;
R is methyl or ethyl; and
n is 1.
7. The organometallic complex of claim 1 , wherein butyl is selected from the group consisting of n-butyl, sec-butyl, iso-butyl and tert-butyl.
8. The organometallic complex of claim 1 , wherein propyl is selected from the group consisting of n-propyl and iso-propyl.
9. The organometallic complex of claim 1 , wherein the complex is selected from the group consisting of:
(methylcyclopentadienyl)ruthenium(methyl)(dicarbonyl);
(ethylcyclopentadienyl)ruthenium(methyl)(dicarbonyl);
(propylcyclopentadienyl)ruthenium(methyl)(dicarbonyl);
(butylcyclopentadienyl)ruthenium(methyl)(dicarbonyl);
(methylcyclopentadienyl)ruthenium(ethyl)(dicarbonyl);
(ethylcyclopentadienyl)ruthenium(ethyl)(dicarbonyl);
(propylcyclopentadienyl)ruthenium(ethyl)(dicarbonyl);
(butylcyclopentadienyl)ruthenium(ethyl)(dicarbonyl);
(methylcyclopentadienyl)osmium(methyl)(dicarbonyl);
(ethylcyclopentadienyl)osmium(methyl)(dicarbonyl);
(propylcyclopentadienyl)osmium(methyl)(dicarbonyl);
(butylcyclopentadienyl)osmium(methyl)(dicarbonyl);
(methylcyclopentadienyl)osmium(ethyl)(dicarbonyl);
(ethylcyclopentadienyl)osmium(ethyl)(dicarbonyl);
(propylcyclopentadienyl)osmium(ethyl)(dicarbonyl); and
(butylcyclopentadienyl)osmium(ethyl)(dicarbonyl).