Particle beam microscope
A particle beam microscope comprises a magnetic lens 3 having an optical axis 53 and a pole piece 21 . An object 5 to be examined is mounted at a point of intersection 51 between an optical axis 53 and the object plane 19 . First and second X-ray detectors 33 have first and second radiation-sensitive substrates 35 arranged such that a first elevation angle β 1 between a first straight line 55 1 extending through the point of intersection 51 and a center of the first substrate 35 1 and the object plane 19 differs from a second elevation angle β 2 between a second straight line 55 2 extending through the point of intersection 51 and a center of the second substrate 35 2 and the object plane 19 by more than 14°.
1. A particle beam microscope having a beam path, the microscope comprising:
a magnetic lens having an optical axis and at least one front pole piece arranged in the beam path along the optical axis at a distance upstream of an object plane;
an object holder, which is configured for mounting an object to be inspected at a point of intersection between the optical axis and the object plane;
a vacuum enclosure defining a vacuum space and having an opening, wherein the front pole piece of the magnetic lens and the object are located within the vacuum space; and
an X-ray detection unit;
wherein the X-ray detection unit comprises:
a detector mount;
a first X-ray detector mounted on the detector mount and having a first radiation-sensitive substrate;
a second X-ray detector mounted on a detector mount and having a second radiation-sensitive substrate;
a flange mounted on and sealed against the vacuum enclosure, wherein the flange carries the detector mount such that at least one of a portion of the flange and the detector mount extend through the opening of the vacuum enclosure;
wherein the first and second X-ray detectors are arranged such that a first elevation angle between a first straight line extending through the point of intersection and a center of the first substrate and the object plane differs from a second elevation angle between a second straight line extending through the point of intersection and a center of the second substrate and the object plane by more than 14°; and
wherein the flange and the opening have a diameter such that the X-ray detection unit can be removed from the particle beam microscope without dismantling the vacuum enclosure.
2. The particle beam microscope according to claim 1 , wherein a central axis of the flange is oriented towards the point of intersection between the optical axis and the object plane.
3. The particle beam microscope according to claim 2 , wherein a central axis of the flange intersects the point of intersection between the optical axis and the object plane.
4. The particle beam microscope according to claim 1 , wherein the first elevation angle is within a range from −45° to −7° and the second elevation angle is within a range from +7° to +45°.
5. The particle beam microscope according to claim 4 , wherein a distance of the first and second radiation-sensitive substrates from the point of intersection is between 12 mm and 20 mm.
6. The particle beam microscope according to claim 5 , wherein a distance of the first and second radiation-sensitive substrates from the point of intersection is less than 12 mm.
7. The particle beam microscope according to claim 1 , wherein the X-ray detection unit further comprises: a third X-ray detector mounted on the detector mount and having a third radiation-sensitive substrate, and a fourth X-ray detector mounted on the detector mount and having a fourth radiation-sensitive substrate.
8. The particle beam microscope according to claim 7 , wherein the third and first X-ray detectors are arranged such that a first circumferential angle about the optical axis between a third straight line extending through the point of intersection and a center of the third substrate and the first straight line is greater than 14°; and
wherein the fourth and second X-ray detectors are arranged such that a second circumferential angle about the optical axis between a fourth straight line extending through the point of intersection and a center of the fourth substrate and the second straight line is greater than 14°.
9. The particle beam microscope according to claim 8 , wherein a third elevation angle between the third straight line and the object plane is equal to the first elevation angle; and
wherein a fourth elevation angle between the fourth straight line and the object plane is equal to the second elevation angle.
10. The particle beam microscope according to claim 1 , wherein the detector mount is displaceable relative to the flange such that the first and second X-ray detectors are displaceable from a measuring position near the point of intersection to a parking position farther away from the point of intersection.
11. The particle beam microscope according to claim 10 , further comprising a displaceable shutter plate which is arranged between the first and second radiation-sensitive substrates and the point of intersection when the first and second X-ray detectors are positioned in the parking position, and which is not arranged between the first and second radiation-sensitive substrates and the point of intersection when the first and second X-ray detectors are positioned in the measuring position.
12. The particle beam microscope according to claim 10 , wherein a distance of the first and second radiation-sensitive substrates from the point of intersection is between 12 mm and 20 mm when the first and second X-ray detectors are positioned in the measuring position.
13. The particle beam microscope according to claim 10 , wherein a distance of the first and second radiation-sensitive substrates from the point of intersection is less than 12 mm when the first and second X-ray detectors are positioned in the measuring position.
14. The particle beam microscope according to claim 1 , wherein the first and second substrates each have a substrate area of greater than 5 mm 2 .
15. The particle beam microscope according to claim 1 , wherein the first and second radiation-sensitive substrates each have a substrate area of less than 50 mm 2 .
16. The particle beam microscope according to claim 1 , wherein the first and second X-ray detectors are silicon drift detectors.
17. The particle beam microscope according to claim 1 , wherein the first and second X-ray detectors comprises at least one Peltier element configured to cool the radiation-sensitive substrate.
18. The particle beam microscope according to claim 1 , wherein the magnetic lens comprises a rear pole piece arranged in the beam path downstream of the object plane at a distance of less than 50 mm from the object plane.
19. The particle beam microscope according to claim 1 , wherein the microscope comprises plural X-ray detection units distributed about the optical axis;
wherein the vacuum enclosure has plural openings; and
wherein at least one of a portion of the flange and the detector mount of each of the plural X-ray detection units extend through one of the plural openings of the vacuum enclosure.