IP Library › Granted Patent US 8,478,021
Granted Patent B2
US 8,478,021 · App. 13/142,316 · Granted Jul 2, 2013

Charged beam device

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,478,021
App. No.
13/142,316
Granted
Jul 2, 2013
Kind
B2
Abstract

In order to provide a charged beam device capable of obtaining a precise image of a sample surface pattern while improving the accuracy of automatic focus/astigmatism correction, there are provided an electron gun ( 1 ), a deflection control portion ( 8 ) which allows an electron beam to scan, a focus control portion ( 10 ) and an astigmatism correction portion ( 3 ) for the electron beam, an image processing portion ( 11 ), and a switching portion ( 9 ) which switches scan conditions when obtaining pattern information of the sample ( 1001 ) surface and scan conditions when performing the automatic focus/astigmatism correction, and a scan speed and scan procedures are switched between when obtaining the pattern information and when performing the automatic focus/astigmatism correction.

Claims (42)

1. A charged beam device comprising:

a charged beam generator;

a deflection control portion which allows a charged beam generated by the charged beam generator to scan;

a focus control portion and an astigmatism correction portion for the charged beam; and

an image processing portion which processes an image of surface information of a sample when irradiating the charged beam onto the sample, wherein

there is further provided a switch portion which switches scan conditions for the charged beam when obtaining pattern information of the sample surface and scan conditions for the charged beam when performing both or either of focus correction and astigmatism correction, and a scan speed in the scan conditions for the charged beam when performing both or either of the focus correction and the astigmatism correction is set at a value larger than that in the scan conditions for the charged beam when obtaining the pattern information of the sample surface.

2. The charged beam device according to claim 1 , wherein

a total dose amount of the charged beam to obtain one image processed by the image processing portion is equally set between when obtaining the pattern information of the sample surface and when performing both or either of the focus correction and the astigmatism correction.

3. The charged beam device according to claim 1 , wherein

the total dose amount of the charged beam to obtain one image processed by the image processing portion when performing both or either of the focus correction and the astigmatism correction is set smaller than that when obtaining the pattern information of the sample surface.

4. The charged beam device according to claim 3 , wherein

the total dose amount of the charged beam is set using the number of frames configuring the one image.

5. The charged beam device according to claim 1 , wherein

the amount of current of the charged beam when performing both or either of the focus correction and the astigmatism correction is set at a value larger than that when obtaining the pattern information of the sample surface.

6. The charged beam device according to claim 1 , wherein

the charged beam is set to be tilted relative to the sample surface when performing both or either of the focus correction and the astigmatism correction.

7. A charged beam device comprising:

a charged beam generator;

a deflection control portion which allows a charged beam generated by the charged beam generator to scan;

a focus control portion and an astigmatism correction portion for the charged beam; and

an image processing portion which processes an image of surface information of a sample when irradiating the charged beam onto the sample, wherein

there is further provided a switch portion which switches scan conditions for the charged beam when obtaining pattern information of the sample surface and scan conditions for the charged beam when performing both or either of focus correction and astigmatism correction, and a scan line interval in the scan conditions for the charged beam when performing both or either of the focus correction and the astigmatism correction is set in such a manner that scanning is performed at the integral multiple (excluding 1) of the scan line interval for scanning, and then the scanning is performed by returning to a skipped position for scanning.

8. The charged beam device according to claim 7 , wherein

the total dose amount of the charged beam to obtain one image processed by the image processing portion when performing both or either of the focus correction and the astigmatism correction is set smaller than that when obtaining the pattern information of the sample surface.

9. The charged beam device according to claim 7 , wherein

the total dose amount of the charged beam is set using the number of frames configuring the one image.

10. The charged beam device according to claim 7 , wherein

the amount of current of the charged beam when performing both or either of the focus correction and the astigmatism correction is set at a value larger than that when obtaining the pattern information of the sample surface.

11. The charged beam device according to claim 7 , wherein

the charged beam is set to be tilted relative to the sample surface when performing both or either of the focus correction and the astigmatism correction.

12. A charged beam device comprising:

a charged beam generator;

a deflection control portion which allows a charged beam generated by the charged beam generator to scan;

a focus control portion and an astigmatism correction portion for the charged beam; and

an image processing portion which processes an image of surface information of a sample when irradiating the charged beam onto the sample, wherein

there is further provided a switch portion which switches scan conditions for the charged beam when obtaining pattern information of the sample surface and scan conditions for the charged beam when performing both or either of focus correction and astigmatism correction, a scan speed in the scan conditions for the charged beam when performing both or either of the focus correction and the astigmatism correction is set at a value larger than that in the scan conditions for the charged beam when obtaining the pattern information of the sample surface, and a scan line interval in the scan conditions for the charged beam when performing both or either of the focus correction and the astigmatism correction is set in such a manner that scanning is performed at the integral multiple (excluding 1) of the scan line interval for scanning, and then the scanning is performed by returning to a skipped position for scanning.

13. The charged beam device according to claim 12 , wherein

the total dose amount of the charged beam to obtain one image processed by the image processing portion when performing both or either of the focus correction and the astigmatism correction is set smaller than that when obtaining the pattern information of the sample surface.

14. The charged beam device according to claim 12 , wherein

the amount of current of the charged beam when performing both or either of the focus correction and the astigmatism correction is set at a value larger than that when obtaining the pattern information of the sample surface.

15. The charged beam device according to claim 12 , wherein

the charged beam is set to be tilted relative to the sample surface when performing both or either of the focus correction and the astigmatism correction.

Assignments (1)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →